JPH11338150A5 - - Google Patents
Info
- Publication number
- JPH11338150A5 JPH11338150A5 JP1998144437A JP14443798A JPH11338150A5 JP H11338150 A5 JPH11338150 A5 JP H11338150A5 JP 1998144437 A JP1998144437 A JP 1998144437A JP 14443798 A JP14443798 A JP 14443798A JP H11338150 A5 JPH11338150 A5 JP H11338150A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- resin composition
- photosensitive resin
- positive photosensitive
- action
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14443798A JP3824288B2 (ja) | 1998-05-26 | 1998-05-26 | ポジ型感光性樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14443798A JP3824288B2 (ja) | 1998-05-26 | 1998-05-26 | ポジ型感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11338150A JPH11338150A (ja) | 1999-12-10 |
| JPH11338150A5 true JPH11338150A5 (enExample) | 2005-02-24 |
| JP3824288B2 JP3824288B2 (ja) | 2006-09-20 |
Family
ID=15362196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14443798A Expired - Lifetime JP3824288B2 (ja) | 1998-05-26 | 1998-05-26 | ポジ型感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3824288B2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3430028B2 (ja) * | 1998-09-08 | 2003-07-28 | 松下電器産業株式会社 | パターン形成方法 |
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| JP4190167B2 (ja) * | 2000-09-26 | 2008-12-03 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4199914B2 (ja) * | 2000-11-29 | 2008-12-24 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP3874092B2 (ja) | 2001-12-26 | 2007-01-31 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| AU2003230727A1 (en) * | 2002-03-22 | 2003-10-13 | Triad Therapeutics, Inc. | Common ligand mimics: naphtoates |
| JP3912516B2 (ja) | 2002-08-09 | 2007-05-09 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| JP4511383B2 (ja) * | 2005-02-23 | 2010-07-28 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2007079552A (ja) * | 2005-08-17 | 2007-03-29 | Jsr Corp | 感放射線性樹脂組成物 |
| JP4991326B2 (ja) * | 2006-01-24 | 2012-08-01 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| TWI477909B (zh) | 2006-01-24 | 2015-03-21 | Fujifilm Corp | 正型感光性組成物及使用它之圖案形成方法 |
| EP2447773B1 (en) | 2010-11-02 | 2013-07-10 | Fujifilm Corporation | Method for producing a pattern, method for producing a MEMS structure, use of a cured film of a photosensitive composition as a sacrificial layer or as a component of a MEMS structure |
| JP5635449B2 (ja) | 2011-03-11 | 2014-12-03 | 富士フイルム株式会社 | 樹脂パターン及びその製造方法、mems構造体の製造方法、半導体素子の製造方法、並びに、メッキパターン製造方法 |
-
1998
- 1998-05-26 JP JP14443798A patent/JP3824288B2/ja not_active Expired - Lifetime
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