JP2000010287A5 - - Google Patents
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- Publication number
- JP2000010287A5 JP2000010287A5 JP1998250050A JP25005098A JP2000010287A5 JP 2000010287 A5 JP2000010287 A5 JP 2000010287A5 JP 1998250050 A JP1998250050 A JP 1998250050A JP 25005098 A JP25005098 A JP 25005098A JP 2000010287 A5 JP2000010287 A5 JP 2000010287A5
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- photosensitive resin
- positive photosensitive
- acid
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 claims 9
- 239000002253 acid Substances 0.000 claims 8
- 150000001875 compounds Chemical class 0.000 claims 5
- -1 nitrogen-containing basic compound Chemical class 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000004094 surface-active agent Substances 0.000 claims 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25005098A JP3922673B2 (ja) | 1998-04-22 | 1998-09-03 | ポジ型感光性樹脂組成物及びパターン形成方法 |
| EP99107339.6A EP0952489B1 (en) | 1998-04-22 | 1999-04-21 | Positive photosensitive resin composition |
| US09/295,329 US6806022B1 (en) | 1998-04-22 | 1999-04-21 | Positive photosensitive resin composition |
| KR1019990014184A KR100601078B1 (ko) | 1998-04-22 | 1999-04-21 | 포지티브 감광성 수지 조성물 |
| US10/315,182 US6846610B2 (en) | 1998-04-22 | 2002-12-10 | Positive photosensitive resin composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11221998 | 1998-04-22 | ||
| JP10-112219 | 1998-04-22 | ||
| JP25005098A JP3922673B2 (ja) | 1998-04-22 | 1998-09-03 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000010287A JP2000010287A (ja) | 2000-01-14 |
| JP2000010287A5 true JP2000010287A5 (enExample) | 2005-02-24 |
| JP3922673B2 JP3922673B2 (ja) | 2007-05-30 |
Family
ID=26451442
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25005098A Expired - Lifetime JP3922673B2 (ja) | 1998-04-22 | 1998-09-03 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3922673B2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3802732B2 (ja) * | 2000-05-12 | 2006-07-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| JP2002097219A (ja) * | 2000-09-21 | 2002-04-02 | Sumitomo Chem Co Ltd | 金属含量の低減されたポリ（メタ）アクリレート類の製造方法 |
| JP4190167B2 (ja) * | 2000-09-26 | 2008-12-03 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4199914B2 (ja) * | 2000-11-29 | 2008-12-24 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4225699B2 (ja) | 2001-03-12 | 2009-02-18 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| EP1324134B1 (en) * | 2001-12-27 | 2010-10-20 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
| JP4347110B2 (ja) * | 2003-10-22 | 2009-10-21 | 東京応化工業株式会社 | 電子線又はｅｕｖ用ポジ型レジスト組成物 |
| EP1720072B1 (en) | 2005-05-01 | 2019-06-05 | Rohm and Haas Electronic Materials, L.L.C. | Compositons and processes for immersion lithography |
| EP1806621A1 (en) * | 2006-01-08 | 2007-07-11 | Rohm and Haas Electronic Materials LLC | Coating compositions for photoresists |
| JP4857138B2 (ja) * | 2006-03-23 | 2012-01-18 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
| EP2420892A1 (en) | 2006-10-30 | 2012-02-22 | Rohm and Haas Electronic Materials LLC | Compositions and processes for immersion lithography |
| EP2056162B1 (en) | 2007-11-05 | 2016-05-04 | Rohm and Haas Electronic Materials LLC | Process for immersion lithography |
-
1998
- 1998-09-03 JP JP25005098A patent/JP3922673B2/ja not_active Expired - Lifetime
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