JP2000066380A5 - - Google Patents
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- Publication number
- JP2000066380A5 JP2000066380A5 JP1998229793A JP22979398A JP2000066380A5 JP 2000066380 A5 JP2000066380 A5 JP 2000066380A5 JP 1998229793 A JP1998229793 A JP 1998229793A JP 22979398 A JP22979398 A JP 22979398A JP 2000066380 A5 JP2000066380 A5 JP 2000066380A5
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- resin composition
- photosensitive resin
- positive photosensitive
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002904 solvent Substances 0.000 claims 11
- 239000011342 resin composition Substances 0.000 claims 7
- 239000002253 acid Substances 0.000 claims 5
- 229920000642 polymer Polymers 0.000 claims 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- -1 nitrogen-containing basic compound Chemical class 0.000 claims 2
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 claims 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 150000003863 ammonium salts Chemical class 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22979398A JP3922672B2 (ja) | 1998-08-14 | 1998-08-14 | ポジ型感光性樹脂組成物及びパターン形成方法 |
| EP99107339.6A EP0952489B1 (en) | 1998-04-22 | 1999-04-21 | Positive photosensitive resin composition |
| US09/295,329 US6806022B1 (en) | 1998-04-22 | 1999-04-21 | Positive photosensitive resin composition |
| KR1019990014184A KR100601078B1 (ko) | 1998-04-22 | 1999-04-21 | 포지티브 감광성 수지 조성물 |
| US10/315,182 US6846610B2 (en) | 1998-04-22 | 2002-12-10 | Positive photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22979398A JP3922672B2 (ja) | 1998-08-14 | 1998-08-14 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000066380A JP2000066380A (ja) | 2000-03-03 |
| JP2000066380A5 true JP2000066380A5 (enExample) | 2005-02-24 |
| JP3922672B2 JP3922672B2 (ja) | 2007-05-30 |
Family
ID=16897769
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22979398A Expired - Fee Related JP3922672B2 (ja) | 1998-04-22 | 1998-08-14 | ポジ型感光性樹脂組成物及びパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3922672B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3430028B2 (ja) * | 1998-09-08 | 2003-07-28 | 松下電器産業株式会社 | パターン形成方法 |
| JP2001281853A (ja) * | 2000-04-03 | 2001-10-10 | Fujifilm Arch Co Ltd | ポジ型感光性樹脂組成物 |
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| US7463338B2 (en) | 2003-07-08 | 2008-12-09 | Hoya Corporation | Container for housing a mask blank, method of housing a mask blank, and mask blank package |
| JP4347110B2 (ja) * | 2003-10-22 | 2009-10-21 | 東京応化工業株式会社 | 電子線又はｅｕｖ用ポジ型レジスト組成物 |
| JP2007071902A (ja) * | 2005-09-02 | 2007-03-22 | Fujifilm Corp | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| TW200736855A (en) * | 2006-03-22 | 2007-10-01 | Quanta Display Inc | Method of fabricating photoresist thinner |
-
1998
- 1998-08-14 JP JP22979398A patent/JP3922672B2/ja not_active Expired - Fee Related
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