JP2000047385A5 - - Google Patents

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Publication number
JP2000047385A5
JP2000047385A5 JP1998170197A JP17019798A JP2000047385A5 JP 2000047385 A5 JP2000047385 A5 JP 2000047385A5 JP 1998170197 A JP1998170197 A JP 1998170197A JP 17019798 A JP17019798 A JP 17019798A JP 2000047385 A5 JP2000047385 A5 JP 2000047385A5
Authority
JP
Japan
Prior art keywords
acid
resin composition
photosensitive resin
positive photosensitive
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998170197A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000047385A (ja
JP3832790B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP17019798A priority Critical patent/JP3832790B2/ja
Priority claimed from JP17019798A external-priority patent/JP3832790B2/ja
Publication of JP2000047385A publication Critical patent/JP2000047385A/ja
Publication of JP2000047385A5 publication Critical patent/JP2000047385A5/ja
Application granted granted Critical
Publication of JP3832790B2 publication Critical patent/JP3832790B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP17019798A 1998-05-26 1998-06-17 ポジ型感光性樹脂組成物 Expired - Lifetime JP3832790B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17019798A JP3832790B2 (ja) 1998-05-26 1998-06-17 ポジ型感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP14443698 1998-05-26
JP10-144436 1998-05-26
JP17019798A JP3832790B2 (ja) 1998-05-26 1998-06-17 ポジ型感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2000047385A JP2000047385A (ja) 2000-02-18
JP2000047385A5 true JP2000047385A5 (enExample) 2005-02-24
JP3832790B2 JP3832790B2 (ja) 2006-10-11

Family

ID=26475846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17019798A Expired - Lifetime JP3832790B2 (ja) 1998-05-26 1998-06-17 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JP3832790B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3430028B2 (ja) * 1998-09-08 2003-07-28 松下電器産業株式会社 パターン形成方法
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
JP3874092B2 (ja) 2001-12-26 2007-01-31 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP3912516B2 (ja) 2002-08-09 2007-05-09 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP4511383B2 (ja) 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2013190497A (ja) * 2012-03-12 2013-09-26 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、およびそれを用いたパターン形成方法

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