JP2009258506A5 - - Google Patents
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- Publication number
- JP2009258506A5 JP2009258506A5 JP2008109335A JP2008109335A JP2009258506A5 JP 2009258506 A5 JP2009258506 A5 JP 2009258506A5 JP 2008109335 A JP2008109335 A JP 2008109335A JP 2008109335 A JP2008109335 A JP 2008109335A JP 2009258506 A5 JP2009258506 A5 JP 2009258506A5
- Authority
- JP
- Japan
- Prior art keywords
- resin
- resist composition
- negative resist
- acid
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000011347 resin Substances 0.000 claims 7
- 229920005989 resin Polymers 0.000 claims 7
- 229920002120 photoresistant polymer Polymers 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 238000007654 immersion Methods 0.000 claims 1
- 125000000686 lactone group Chemical group 0.000 claims 1
- 239000003505 polymerization initiator Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008109335A JP2009258506A (ja) | 2008-04-18 | 2008-04-18 | ネガ型レジスト組成物およびレジストパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008109335A JP2009258506A (ja) | 2008-04-18 | 2008-04-18 | ネガ型レジスト組成物およびレジストパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009258506A JP2009258506A (ja) | 2009-11-05 |
| JP2009258506A5 true JP2009258506A5 (enExample) | 2011-04-07 |
Family
ID=41386002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008109335A Abandoned JP2009258506A (ja) | 2008-04-18 | 2008-04-18 | ネガ型レジスト組成物およびレジストパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009258506A (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5137673B2 (ja) * | 2008-04-26 | 2013-02-06 | 日本化薬株式会社 | Ｍｅｍｓ用感光性樹脂組成物及びその硬化物 |
| JP2010271401A (ja) * | 2009-05-19 | 2010-12-02 | Nippon Kayaku Co Ltd | レジスト組成物 |
| EP2531890B1 (en) | 2010-02-05 | 2019-08-28 | Canon Kabushiki Kaisha | Photosensitive resin composition, method for producing structure, and liquid discharge head |
| RU2495468C1 (ru) * | 2010-02-05 | 2013-10-10 | Кэнон Кабусики Кайся | Негативная фоточувствительная полимерная композиция, способ формирования паттерна и головка для выбрасывания жидкости |
| JP5505066B2 (ja) * | 2010-04-28 | 2014-05-28 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、表示素子の層間絶縁膜、保護膜及びスペーサーならびにそれらの形成方法 |
| JP5692035B2 (ja) * | 2011-12-15 | 2015-04-01 | 信越化学工業株式会社 | パターン形成方法及びレジスト組成物 |
| JP5817744B2 (ja) * | 2013-01-17 | 2015-11-18 | 信越化学工業株式会社 | パターン形成方法、レジスト組成物、高分子化合物及び単量体 |
| JP6303549B2 (ja) * | 2013-02-19 | 2018-04-04 | Jsr株式会社 | ネガ型感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子 |
| JP6065862B2 (ja) | 2013-04-10 | 2017-01-25 | 信越化学工業株式会社 | パターン形成方法、レジスト組成物、高分子化合物及び単量体 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04330445A (ja) * | 1991-02-08 | 1992-11-18 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| JP3045820B2 (ja) * | 1991-07-02 | 2000-05-29 | 岡本化学工業株式会社 | アルカリ現像型感光性組成物 |
| JP3859352B2 (ja) * | 1998-04-16 | 2006-12-20 | 富士通株式会社 | ネガ型レジスト組成物およびレジストパターンの形成方法 |
| JP2000056459A (ja) * | 1998-08-05 | 2000-02-25 | Fujitsu Ltd | レジスト組成物 |
| KR100557609B1 (ko) * | 1999-02-22 | 2006-03-10 | 주식회사 하이닉스반도체 | 신규의 포토레지스트 가교제 및 이를 이용한 포토레지스트 조성물 |
| JP3766245B2 (ja) * | 1999-12-16 | 2006-04-12 | 株式会社ルネサステクノロジ | パタン形成方法および半導体装置の製造方法 |
| JP2002187912A (ja) * | 2000-12-20 | 2002-07-05 | Toppan Printing Co Ltd | プロペニルエーテル基含有重合体 |
| JP3822101B2 (ja) * | 2001-12-26 | 2006-09-13 | 株式会社ルネサステクノロジ | 感放射線組成物及びパタン形成方法及び半導体装置の製造方法 |
-
2008
- 2008-04-18 JP JP2008109335A patent/JP2009258506A/ja not_active Abandoned
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