JP2001142215A5 - - Google Patents
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- Publication number
- JP2001142215A5 JP2001142215A5 JP1999327091A JP32709199A JP2001142215A5 JP 2001142215 A5 JP2001142215 A5 JP 2001142215A5 JP 1999327091 A JP1999327091 A JP 1999327091A JP 32709199 A JP32709199 A JP 32709199A JP 2001142215 A5 JP2001142215 A5 JP 2001142215A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- alkyl group
- hydrogen atom
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32709199A JP3936503B2 (ja) | 1999-11-17 | 1999-11-17 | ポジ型フォトレジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32709199A JP3936503B2 (ja) | 1999-11-17 | 1999-11-17 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001142215A JP2001142215A (ja) | 2001-05-25 |
| JP2001142215A5 true JP2001142215A5 (enExample) | 2005-07-14 |
| JP3936503B2 JP3936503B2 (ja) | 2007-06-27 |
Family
ID=18195201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32709199A Expired - Lifetime JP3936503B2 (ja) | 1999-11-17 | 1999-11-17 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3936503B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7192681B2 (en) | 2001-07-05 | 2007-03-20 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| JP4831277B2 (ja) * | 2001-07-13 | 2011-12-07 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
| KR101035881B1 (ko) | 2003-03-14 | 2011-05-20 | 후지필름 가부시키가이샤 | 감광성 조성물 |
| JP4494161B2 (ja) * | 2004-10-14 | 2010-06-30 | 東京応化工業株式会社 | 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法 |
| JP4533756B2 (ja) * | 2005-01-07 | 2010-09-01 | 富士フイルム株式会社 | イオン注入工程用ポジ型レジスト組成物及びそれを用いたイオン注入方法 |
| JP4712077B2 (ja) * | 2008-07-31 | 2011-06-29 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP5568354B2 (ja) | 2009-03-31 | 2014-08-06 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法 |
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1999
- 1999-11-17 JP JP32709199A patent/JP3936503B2/ja not_active Expired - Lifetime