JP2001133978A5 - - Google Patents
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- Publication number
- JP2001133978A5 JP2001133978A5 JP1999317147A JP31714799A JP2001133978A5 JP 2001133978 A5 JP2001133978 A5 JP 2001133978A5 JP 1999317147 A JP1999317147 A JP 1999317147A JP 31714799 A JP31714799 A JP 31714799A JP 2001133978 A5 JP2001133978 A5 JP 2001133978A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- resist composition
- positive resist
- alkyl group
- integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31714799A JP4328428B2 (ja) | 1999-11-08 | 1999-11-08 | ポジ型レジスト組成物 |
| JP2009111277A JP4742156B2 (ja) | 1999-11-08 | 2009-04-30 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31714799A JP4328428B2 (ja) | 1999-11-08 | 1999-11-08 | ポジ型レジスト組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009111277A Division JP4742156B2 (ja) | 1999-11-08 | 2009-04-30 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001133978A JP2001133978A (ja) | 2001-05-18 |
| JP2001133978A5 true JP2001133978A5 (enExample) | 2005-07-14 |
| JP4328428B2 JP4328428B2 (ja) | 2009-09-09 |
Family
ID=18084975
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31714799A Expired - Fee Related JP4328428B2 (ja) | 1999-11-08 | 1999-11-08 | ポジ型レジスト組成物 |
| JP2009111277A Expired - Fee Related JP4742156B2 (ja) | 1999-11-08 | 2009-04-30 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009111277A Expired - Fee Related JP4742156B2 (ja) | 1999-11-08 | 2009-04-30 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JP4328428B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6833460B2 (en) * | 1999-06-18 | 2004-12-21 | E. I. Du Pont De Nemours And Company | Preparation and use of gamma-butyrolactones as cross-linking agents |
| TWI366067B (en) | 2003-09-10 | 2012-06-11 | Fujifilm Corp | Photosensitive composition and pattern forming method using the same |
| JP4695996B2 (ja) * | 2006-02-27 | 2011-06-08 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| EP2460882B1 (en) | 2009-07-28 | 2017-11-29 | Mitsui Chemicals, Inc. | Method for producing d-lactic acid |
| CN102194673B (zh) * | 2009-12-15 | 2015-08-05 | 罗门哈斯电子材料有限公司 | 光致抗蚀剂及其使用方法 |
| JP6020361B2 (ja) * | 2012-06-26 | 2016-11-02 | 信越化学工業株式会社 | 高分子化合物、ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| WO2018066594A1 (ja) | 2016-10-05 | 2018-04-12 | 大阪有機化学工業株式会社 | （メタ）アクリルモノマーおよびその製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11218927A (ja) * | 1998-02-04 | 1999-08-10 | Nippon Zeon Co Ltd | レジスト組成物 |
| JPH11231539A (ja) * | 1998-02-17 | 1999-08-27 | Nippon Zeon Co Ltd | レジスト溶液およびその調製方法 |
| JP3851440B2 (ja) * | 1998-04-22 | 2006-11-29 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| JP3711198B2 (ja) * | 1998-04-23 | 2005-10-26 | 東京応化工業株式会社 | レジストパターンの形成方法 |
| TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| JP3763239B2 (ja) * | 1999-01-18 | 2006-04-05 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| JP3899771B2 (ja) * | 1999-03-31 | 2007-03-28 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物及びスルホニウム塩 |
| JP4277420B2 (ja) * | 1999-10-18 | 2009-06-10 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
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1999
- 1999-11-08 JP JP31714799A patent/JP4328428B2/ja not_active Expired - Fee Related
-
2009
- 2009-04-30 JP JP2009111277A patent/JP4742156B2/ja not_active Expired - Fee Related