JP4328428B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4328428B2
JP4328428B2 JP31714799A JP31714799A JP4328428B2 JP 4328428 B2 JP4328428 B2 JP 4328428B2 JP 31714799 A JP31714799 A JP 31714799A JP 31714799 A JP31714799 A JP 31714799A JP 4328428 B2 JP4328428 B2 JP 4328428B2
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JP
Japan
Prior art keywords
group
alkyl group
general formula
carbon atoms
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP31714799A
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English (en)
Japanese (ja)
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JP2001133978A5 (enExample
JP2001133978A (ja
Inventor
邦彦 児玉
健一郎 佐藤
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP31714799A priority Critical patent/JP4328428B2/ja
Publication of JP2001133978A publication Critical patent/JP2001133978A/ja
Publication of JP2001133978A5 publication Critical patent/JP2001133978A5/ja
Priority to JP2009111277A priority patent/JP4742156B2/ja
Application granted granted Critical
Publication of JP4328428B2 publication Critical patent/JP4328428B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP31714799A 1999-11-08 1999-11-08 ポジ型レジスト組成物 Expired - Fee Related JP4328428B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP31714799A JP4328428B2 (ja) 1999-11-08 1999-11-08 ポジ型レジスト組成物
JP2009111277A JP4742156B2 (ja) 1999-11-08 2009-04-30 ポジ型レジスト組成物及びそれを用いたパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31714799A JP4328428B2 (ja) 1999-11-08 1999-11-08 ポジ型レジスト組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009111277A Division JP4742156B2 (ja) 1999-11-08 2009-04-30 ポジ型レジスト組成物及びそれを用いたパターン形成方法

Publications (3)

Publication Number Publication Date
JP2001133978A JP2001133978A (ja) 2001-05-18
JP2001133978A5 JP2001133978A5 (enExample) 2005-07-14
JP4328428B2 true JP4328428B2 (ja) 2009-09-09

Family

ID=18084975

Family Applications (2)

Application Number Title Priority Date Filing Date
JP31714799A Expired - Fee Related JP4328428B2 (ja) 1999-11-08 1999-11-08 ポジ型レジスト組成物
JP2009111277A Expired - Fee Related JP4742156B2 (ja) 1999-11-08 2009-04-30 ポジ型レジスト組成物及びそれを用いたパターン形成方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009111277A Expired - Fee Related JP4742156B2 (ja) 1999-11-08 2009-04-30 ポジ型レジスト組成物及びそれを用いたパターン形成方法

Country Status (1)

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JP (2) JP4328428B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833460B2 (en) * 1999-06-18 2004-12-21 E. I. Du Pont De Nemours And Company Preparation and use of gamma-butyrolactones as cross-linking agents
TWI366067B (en) 2003-09-10 2012-06-11 Fujifilm Corp Photosensitive composition and pattern forming method using the same
JP4695996B2 (ja) * 2006-02-27 2011-06-08 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
EP2460882B1 (en) 2009-07-28 2017-11-29 Mitsui Chemicals, Inc. Method for producing d-lactic acid
CN102194673B (zh) * 2009-12-15 2015-08-05 罗门哈斯电子材料有限公司 光致抗蚀剂及其使用方法
JP6020361B2 (ja) * 2012-06-26 2016-11-02 信越化学工業株式会社 高分子化合物、ポジ型レジスト材料並びにこれを用いたパターン形成方法
WO2018066594A1 (ja) 2016-10-05 2018-04-12 大阪有機化学工業株式会社 （メタ）アクリルモノマーおよびその製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11218927A (ja) * 1998-02-04 1999-08-10 Nippon Zeon Co Ltd レジスト組成物
JPH11231539A (ja) * 1998-02-17 1999-08-27 Nippon Zeon Co Ltd レジスト溶液およびその調製方法
JP3851440B2 (ja) * 1998-04-22 2006-11-29 富士写真フイルム株式会社 ポジ型感光性組成物
JP3711198B2 (ja) * 1998-04-23 2005-10-26 東京応化工業株式会社 レジストパターンの形成方法
TWI250379B (en) * 1998-08-07 2006-03-01 Az Electronic Materials Japan Chemical amplified radiation-sensitive composition which contains onium salt and generator
JP3763239B2 (ja) * 1999-01-18 2006-04-05 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP3899771B2 (ja) * 1999-03-31 2007-03-28 住友化学株式会社 化学増幅型ポジ型レジスト組成物及びスルホニウム塩
JP4277420B2 (ja) * 1999-10-18 2009-06-10 Ｊｓｒ株式会社 感放射線性樹脂組成物

Also Published As

Publication number Publication date
JP4742156B2 (ja) 2011-08-10
JP2009175757A (ja) 2009-08-06
JP2001133978A (ja) 2001-05-18

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