JP2000321771A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2000321771A5 JP2000321771A5 JP1999127296A JP12729699A JP2000321771A5 JP 2000321771 A5 JP2000321771 A5 JP 2000321771A5 JP 1999127296 A JP1999127296 A JP 1999127296A JP 12729699 A JP12729699 A JP 12729699A JP 2000321771 A5 JP2000321771 A5 JP 2000321771A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl group
- hydrogen atom
- alkylene
- divalent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 5
- 125000002947 alkylene group Chemical group 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000000732 arylene group Chemical group 0.000 claims 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 125000003368 amide group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000004185 ester group Chemical group 0.000 claims 2
- 125000001033 ether group Chemical group 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
- 125000000565 sulfonamide group Chemical group 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 125000000101 thioether group Chemical group 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12729699A JP3890390B2 (ja) | 1999-05-07 | 1999-05-07 | ポジ型レジスト組成物 |
| US09/563,436 US6596458B1 (en) | 1999-05-07 | 2000-05-03 | Positive-working photoresist composition |
| TW089108532A TW546548B (en) | 1999-05-07 | 2000-05-04 | Positive-working photoresist composition |
| KR1020000025558A KR100645847B1 (ko) | 1999-05-07 | 2000-05-08 | 포지티브-작용 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12729699A JP3890390B2 (ja) | 1999-05-07 | 1999-05-07 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000321771A JP2000321771A (ja) | 2000-11-24 |
| JP2000321771A5 true JP2000321771A5 (enExample) | 2005-07-07 |
| JP3890390B2 JP3890390B2 (ja) | 2007-03-07 |
Family
ID=14956463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12729699A Expired - Fee Related JP3890390B2 (ja) | 1999-05-07 | 1999-05-07 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3890390B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4186497B2 (ja) * | 2001-04-12 | 2008-11-26 | 東レ株式会社 | ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法 |
| JP4772288B2 (ja) | 2003-06-05 | 2011-09-14 | 東京応化工業株式会社 | ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法 |
| JP4439270B2 (ja) | 2003-06-18 | 2010-03-24 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4188265B2 (ja) | 2003-10-23 | 2008-11-26 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| JP4731200B2 (ja) | 2005-05-10 | 2011-07-20 | 丸善石油化学株式会社 | 半導体リソグラフィー用共重合体の製造方法 |
| JP5371794B2 (ja) * | 2009-08-27 | 2013-12-18 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物、及びそれを用いたパターン形成方法 |
-
1999
- 1999-05-07 JP JP12729699A patent/JP3890390B2/ja not_active Expired - Fee Related