JP3890390B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP3890390B2
JP3890390B2 JP12729699A JP12729699A JP3890390B2 JP 3890390 B2 JP3890390 B2 JP 3890390B2 JP 12729699 A JP12729699 A JP 12729699A JP 12729699 A JP12729699 A JP 12729699A JP 3890390 B2 JP3890390 B2 JP 3890390B2
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JP
Japan
Prior art keywords
group
alkyl group
acid
hydrogen atom
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP12729699A
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English (en)
Japanese (ja)
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JP2000321771A5 (enExample
JP2000321771A (ja
Inventor
健一郎 佐藤
邦彦 児玉
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP12729699A priority Critical patent/JP3890390B2/ja
Priority to US09/563,436 priority patent/US6596458B1/en
Priority to TW089108532A priority patent/TW546548B/zh
Priority to KR1020000025558A priority patent/KR100645847B1/ko
Publication of JP2000321771A publication Critical patent/JP2000321771A/ja
Publication of JP2000321771A5 publication Critical patent/JP2000321771A5/ja
Application granted granted Critical
Publication of JP3890390B2 publication Critical patent/JP3890390B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP12729699A 1999-05-07 1999-05-07 ポジ型レジスト組成物 Expired - Fee Related JP3890390B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP12729699A JP3890390B2 (ja) 1999-05-07 1999-05-07 ポジ型レジスト組成物
US09/563,436 US6596458B1 (en) 1999-05-07 2000-05-03 Positive-working photoresist composition
TW089108532A TW546548B (en) 1999-05-07 2000-05-04 Positive-working photoresist composition
KR1020000025558A KR100645847B1 (ko) 1999-05-07 2000-05-08 포지티브-작용 포토레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12729699A JP3890390B2 (ja) 1999-05-07 1999-05-07 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2000321771A JP2000321771A (ja) 2000-11-24
JP2000321771A5 JP2000321771A5 (enExample) 2005-07-07
JP3890390B2 true JP3890390B2 (ja) 2007-03-07

Family

ID=14956463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12729699A Expired - Fee Related JP3890390B2 (ja) 1999-05-07 1999-05-07 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3890390B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4186497B2 (ja) * 2001-04-12 2008-11-26 東レ株式会社 ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法
JP4772288B2 (ja) 2003-06-05 2011-09-14 東京応化工業株式会社 ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法
JP4439270B2 (ja) 2003-06-18 2010-03-24 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4188265B2 (ja) 2003-10-23 2008-11-26 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP4731200B2 (ja) 2005-05-10 2011-07-20 丸善石油化学株式会社 半導体リソグラフィー用共重合体の製造方法
JP5371794B2 (ja) * 2009-08-27 2013-12-18 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物、及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
JP2000321771A (ja) 2000-11-24

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