JP2002202606A5 - - Google Patents
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- Publication number
- JP2002202606A5 JP2002202606A5 JP2000402245A JP2000402245A JP2002202606A5 JP 2002202606 A5 JP2002202606 A5 JP 2002202606A5 JP 2000402245 A JP2000402245 A JP 2000402245A JP 2000402245 A JP2000402245 A JP 2000402245A JP 2002202606 A5 JP2002202606 A5 JP 2002202606A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- hydrogen atom
- alkyl group
- general formula
- chain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 54
- 125000000217 alkyl group Chemical group 0.000 description 46
- 125000006165 cyclic alkyl group Chemical group 0.000 description 25
- 125000000753 cycloalkyl group Chemical group 0.000 description 17
- 125000003118 aryl group Chemical group 0.000 description 16
- 125000004093 cyano group Chemical group *C#N 0.000 description 15
- 239000002253 acid Substances 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 13
- 125000003710 aryl alkyl group Chemical group 0.000 description 12
- -1 propylene glycol monoalkyl ether Chemical class 0.000 description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
- 125000003342 alkenyl group Chemical group 0.000 description 8
- 125000001188 haloalkyl group Chemical group 0.000 description 8
- 125000005843 halogen group Chemical group 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000002947 alkylene group Chemical group 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 125000005647 linker group Chemical group 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical group C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 4
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- 125000000732 arylene group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 125000006574 non-aromatic ring group Chemical group 0.000 description 4
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 125000002993 cycloalkylene group Chemical group 0.000 description 3
- 125000004185 ester group Chemical group 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 125000000101 thioether group Chemical group 0.000 description 3
- 0 CC(C(C)C(*1)=O)C1=O Chemical compound CC(C(C)C(*1)=O)C1=O 0.000 description 2
- 229930188620 butyrolactone Natural products 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000402245A JP2002202606A (ja) | 2000-12-28 | 2000-12-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214510A JP2008299351A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214509A JP2008299350A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000402245A JP2002202606A (ja) | 2000-12-28 | 2000-12-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214510A JP2008299351A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214509A JP2008299350A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008214509A Division JP2008299350A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214510A Division JP2008299351A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002202606A JP2002202606A (ja) | 2002-07-19 |
| JP2002202606A5 true JP2002202606A5 (enExample) | 2006-01-12 |
Family
ID=55182154
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000402245A Pending JP2002202606A (ja) | 2000-12-28 | 2000-12-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214510A Pending JP2008299351A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214509A Pending JP2008299350A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008214510A Pending JP2008299351A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2008214509A Pending JP2008299350A (ja) | 2000-12-28 | 2008-08-22 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (3) | JP2002202606A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4347110B2 (ja) * | 2003-10-22 | 2009-10-21 | 東京応化工業株式会社 | 電子線又はｅｕｖ用ポジ型レジスト組成物 |
| JP4714488B2 (ja) * | 2004-08-26 | 2011-06-29 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7537879B2 (en) * | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| EP2478020A4 (en) | 2009-09-15 | 2015-04-15 | Mylan Group | COPOLYMERS, POLYMER PARTICLES WITH THESE COPOLYMERS AND COPOLYMER BINDER FOR RADIATION-SENSITIVE COATING COMPOSITIONS FOR NEGATIVELY WORKING RADIATION-SENSITIVE LITHOGRAPHIC PLASTERS |
| UA106533C2 (uk) | 2010-09-14 | 2014-09-10 | Майлен Груп | Співполімери для чутливих у близькій інфрачервоній області випромінювання композицій для покриття позитивних термічних літографічних друкарських форм |
| WO2014133048A1 (ja) * | 2013-02-27 | 2014-09-04 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法及び重合体 |
| CN110494514A (zh) * | 2017-04-10 | 2019-11-22 | 默克专利有限公司 | 有机功能材料的制剂 |
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2000
- 2000-12-28 JP JP2000402245A patent/JP2002202606A/ja active Pending
-
2008
- 2008-08-22 JP JP2008214510A patent/JP2008299351A/ja active Pending
- 2008-08-22 JP JP2008214509A patent/JP2008299350A/ja active Pending