JP3936503B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3936503B2
JP3936503B2 JP32709199A JP32709199A JP3936503B2 JP 3936503 B2 JP3936503 B2 JP 3936503B2 JP 32709199 A JP32709199 A JP 32709199A JP 32709199 A JP32709199 A JP 32709199A JP 3936503 B2 JP3936503 B2 JP 3936503B2
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Japan
Prior art keywords
group
substituent
acid
alkyl group
general formula
Prior art date
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Expired - Lifetime
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JP32709199A
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English (en)
Japanese (ja)
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JP2001142215A5 (enExample
JP2001142215A (ja
Inventor
元 中尾
健一郎 佐藤
一也 上西
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP32709199A priority Critical patent/JP3936503B2/ja
Publication of JP2001142215A publication Critical patent/JP2001142215A/ja
Publication of JP2001142215A5 publication Critical patent/JP2001142215A5/ja
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Publication of JP3936503B2 publication Critical patent/JP3936503B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP32709199A 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物 Expired - Lifetime JP3936503B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32709199A JP3936503B2 (ja) 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32709199A JP3936503B2 (ja) 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001142215A JP2001142215A (ja) 2001-05-25
JP2001142215A5 JP2001142215A5 (enExample) 2005-07-14
JP3936503B2 true JP3936503B2 (ja) 2007-06-27

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ID=18195201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32709199A Expired - Lifetime JP3936503B2 (ja) 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物

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JP (1) JP3936503B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7192681B2 (en) 2001-07-05 2007-03-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4831277B2 (ja) * 2001-07-13 2011-12-07 信越化学工業株式会社 高分子化合物、レジスト材料、及びパターン形成方法
KR101035881B1 (ko) 2003-03-14 2011-05-20 후지필름 가부시키가이샤 감광성 조성물
JP4494161B2 (ja) * 2004-10-14 2010-06-30 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP4533756B2 (ja) * 2005-01-07 2010-09-01 富士フイルム株式会社 イオン注入工程用ポジ型レジスト組成物及びそれを用いたイオン注入方法
JP4712077B2 (ja) * 2008-07-31 2011-06-29 富士フイルム株式会社 ポジ型感光性組成物
JP5568354B2 (ja) 2009-03-31 2014-08-06 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法

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Publication number Publication date
JP2001142215A (ja) 2001-05-25

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