JP3962296B2 - 強誘電体メモリ装置及びその製造方法 - Google Patents
強誘電体メモリ装置及びその製造方法 Download PDFInfo
- Publication number
- JP3962296B2 JP3962296B2 JP2002224451A JP2002224451A JP3962296B2 JP 3962296 B2 JP3962296 B2 JP 3962296B2 JP 2002224451 A JP2002224451 A JP 2002224451A JP 2002224451 A JP2002224451 A JP 2002224451A JP 3962296 B2 JP3962296 B2 JP 3962296B2
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- Prior art keywords
- film
- hydrogen barrier
- barrier film
- ferroelectric
- line direction
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2002224451A JP3962296B2 (ja) | 2001-09-27 | 2002-08-01 | 強誘電体メモリ装置及びその製造方法 |
Applications Claiming Priority (3)
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JP2001296855 | 2001-09-27 | ||
JP2001-296855 | 2001-09-27 | ||
JP2002224451A JP3962296B2 (ja) | 2001-09-27 | 2002-08-01 | 強誘電体メモリ装置及びその製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004355243A Division JP4351990B2 (ja) | 2001-09-27 | 2004-12-08 | 強誘電体メモリ装置及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003174145A JP2003174145A (ja) | 2003-06-20 |
JP2003174145A5 JP2003174145A5 (enrdf_load_stackoverflow) | 2005-05-26 |
JP3962296B2 true JP3962296B2 (ja) | 2007-08-22 |
Family
ID=26623091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002224451A Expired - Lifetime JP3962296B2 (ja) | 2001-09-27 | 2002-08-01 | 強誘電体メモリ装置及びその製造方法 |
Country Status (1)
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JP (1) | JP3962296B2 (enrdf_load_stackoverflow) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4636834B2 (ja) * | 2002-11-13 | 2011-02-23 | パナソニック株式会社 | 半導体装置及びその製造方法 |
TWI229935B (en) | 2002-11-13 | 2005-03-21 | Matsushita Electric Ind Co Ltd | Semiconductor device and method for fabricating the same |
JP4549947B2 (ja) * | 2003-05-27 | 2010-09-22 | パナソニック株式会社 | 半導体装置 |
JP3935475B2 (ja) | 2004-03-18 | 2007-06-20 | 松下電器産業株式会社 | 半導体装置及びその製造方法 |
US8552484B2 (en) | 2004-07-02 | 2013-10-08 | Fujitsu Semiconductor Limited | Semiconductor device and method for fabricating the same |
JP4042730B2 (ja) | 2004-09-02 | 2008-02-06 | セイコーエプソン株式会社 | 強誘電体メモリおよびその製造方法 |
JP2006108152A (ja) * | 2004-09-30 | 2006-04-20 | Oki Electric Ind Co Ltd | 半導体記憶装置 |
JP4422644B2 (ja) | 2005-03-30 | 2010-02-24 | 富士通マイクロエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP2006302987A (ja) * | 2005-04-18 | 2006-11-02 | Nec Electronics Corp | 半導体装置およびその製造方法 |
JP4756915B2 (ja) * | 2005-05-31 | 2011-08-24 | Okiセミコンダクタ株式会社 | 強誘電体メモリ装置及びその製造方法 |
KR100973703B1 (ko) | 2005-06-17 | 2010-08-04 | 후지쯔 세미컨덕터 가부시키가이샤 | 반도체 장치 및 그 제조 방법 |
JP4557903B2 (ja) * | 2006-02-10 | 2010-10-06 | パナソニック株式会社 | 半導体装置及びその製造方法 |
-
2002
- 2002-08-01 JP JP2002224451A patent/JP3962296B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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JP2003174145A (ja) | 2003-06-20 |
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