JP3858995B2 - 光導波路装置の製造方法 - Google Patents

光導波路装置の製造方法 Download PDF

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Publication number
JP3858995B2
JP3858995B2 JP2003011709A JP2003011709A JP3858995B2 JP 3858995 B2 JP3858995 B2 JP 3858995B2 JP 2003011709 A JP2003011709 A JP 2003011709A JP 2003011709 A JP2003011709 A JP 2003011709A JP 3858995 B2 JP3858995 B2 JP 3858995B2
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JP
Japan
Prior art keywords
substrate
optical waveguide
region
optical
core
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003011709A
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English (en)
Japanese (ja)
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JP2004086129A5 (enExample
JP2004086129A (ja
Inventor
由幸 古村
一行 速水
裕佳里 寺川
速美 細川
敏幸 高橋
誠良 樋口
佳孝 多田羅
成留 安田
洋人 野澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Corp filed Critical Omron Corp
Priority to JP2003011709A priority Critical patent/JP3858995B2/ja
Priority to TW092117659A priority patent/TWI227342B/zh
Priority to KR1020030044106A priority patent/KR100559645B1/ko
Priority to CNB031481280A priority patent/CN1246712C/zh
Priority to US10/611,684 priority patent/US7013055B2/en
Publication of JP2004086129A publication Critical patent/JP2004086129A/ja
Priority to KR1020050032420A priority patent/KR100766686B1/ko
Priority to US11/313,171 priority patent/US7174081B2/en
Priority to US11/312,663 priority patent/US7113683B2/en
Publication of JP2004086129A5 publication Critical patent/JP2004086129A5/ja
Priority to KR1020060023531A priority patent/KR100713498B1/ko
Application granted granted Critical
Publication of JP3858995B2 publication Critical patent/JP3858995B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4246—Bidirectionally operating package structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G02B1/046—Light guides characterised by the core material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/125—Bends, branchings or intersections
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/30—Optical coupling means for use between fibre and thin-film device
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F55/00—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto
    • H10F55/10—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the radiation-sensitive semiconductor devices control the electric light source, e.g. image converters, image amplifiers or image storage devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035—Materials
    • G02B2006/12069—Organic material

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Integrated Circuits (AREA)
  • Optical Couplings Of Light Guides (AREA)
JP2003011709A 2002-07-02 2003-01-20 光導波路装置の製造方法 Expired - Fee Related JP3858995B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2003011709A JP3858995B2 (ja) 2002-07-02 2003-01-20 光導波路装置の製造方法
TW092117659A TWI227342B (en) 2002-07-02 2003-06-27 Light waveguide device, manufacturing method thereof, and optical communication apparatus
KR1020030044106A KR100559645B1 (ko) 2002-07-02 2003-07-01 광도파로 장치 및 광도파로 장치의 제조 방법
CNB031481280A CN1246712C (zh) 2002-07-02 2003-07-01 光波导装置、光波导装置的制造方法以及光通信装置
US10/611,684 US7013055B2 (en) 2002-07-02 2003-07-01 Optical waveguide device, manufacturing method thereof, and optical communication apparatus
KR1020050032420A KR100766686B1 (ko) 2002-07-02 2005-04-19 광도파로 장치, 광도파로 장치의 제조 방법 및 광통신용 장치
US11/313,171 US7174081B2 (en) 2002-07-02 2005-12-20 Optical waveguide device, manufacturing method thereof and optical communication apparatus
US11/312,663 US7113683B2 (en) 2002-07-02 2005-12-20 Optical waveguide device, manufacturing method thereof and optical communication apparatus
KR1020060023531A KR100713498B1 (ko) 2002-07-02 2006-03-14 광도파로 장치 및 광도파로 장치의 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002194017 2002-07-02
JP2003011709A JP3858995B2 (ja) 2002-07-02 2003-01-20 光導波路装置の製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2006143195A Division JP2006259769A (ja) 2002-07-02 2006-05-23 光導波路装置及びその製造方法並びに光通信装置
JP2006143201A Division JP2006227655A (ja) 2002-07-02 2006-05-23 光導波路装置の製造方法

Publications (3)

Publication Number Publication Date
JP2004086129A JP2004086129A (ja) 2004-03-18
JP2004086129A5 JP2004086129A5 (enExample) 2006-03-09
JP3858995B2 true JP3858995B2 (ja) 2006-12-20

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JP2003011709A Expired - Fee Related JP3858995B2 (ja) 2002-07-02 2003-01-20 光導波路装置の製造方法

Country Status (5)

Country Link
US (3) US7013055B2 (enExample)
JP (1) JP3858995B2 (enExample)
KR (3) KR100559645B1 (enExample)
CN (1) CN1246712C (enExample)
TW (1) TWI227342B (enExample)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7195941B2 (en) * 2003-03-26 2007-03-27 Intel Corporation Optical devices and methods to construct the same
JP2005266179A (ja) * 2004-03-17 2005-09-29 Omron Corp 光導波路装置及び光導波路装置の製造方法並びに光導波路装置の中間体
JP4440697B2 (ja) * 2004-04-22 2010-03-24 浜松ホトニクス株式会社 光導波路基板及びその製造方法
JP4558400B2 (ja) * 2004-07-23 2010-10-06 新光電気工業株式会社 半導体装置
US7282311B2 (en) * 2004-08-19 2007-10-16 Infinera Corporation Method of forming an integrated optical circuit
US7251398B2 (en) * 2004-08-26 2007-07-31 Interuniversitair Microelektronica Centrum (Imec) Method for providing an optical interface and devices according to such methods
JP2006126568A (ja) * 2004-10-29 2006-05-18 Fuji Xerox Co Ltd 高分子光導波路デバイスの製造方法
KR100630091B1 (ko) * 2004-10-29 2006-09-27 삼성전자주식회사 광학 필터 및 광학 필터의 제작 방법과 그를 이용한 평면광도파로 소자
JP2006171173A (ja) * 2004-12-14 2006-06-29 Omron Corp 光モジュール及びその製造方法
JP4704125B2 (ja) * 2005-06-22 2011-06-15 浜松ホトニクス株式会社 光デバイス
US7570679B2 (en) * 2006-02-22 2009-08-04 Optical Communication Products, Inc. Wide temperature range uncooled transceiver module for uncontrolled environments
JP2008015336A (ja) * 2006-07-07 2008-01-24 Fujitsu Ltd 回路基板及び半導体デバイスの光結合方法
JP5055882B2 (ja) * 2006-08-02 2012-10-24 富士ゼロックス株式会社 光導波路モジュール及びその製造方法
US20080031584A1 (en) * 2006-08-02 2008-02-07 National Semiconductor Corporation Apparatus and method for a singulation of polymer waveguides using photolithography
CN101523264A (zh) * 2006-08-10 2009-09-02 松下电工株式会社 光电变换装置
KR100801278B1 (ko) 2006-08-29 2008-02-04 삼성전기주식회사 하이브리드형 광도파로 센서
US7553215B2 (en) * 2007-08-24 2009-06-30 Panasonic Electric Works Co, Ltd. Process of forming a deflection mirror in a light waveguide
US7599596B1 (en) * 2008-03-13 2009-10-06 Kotura, Inc. Optical receiver for use with range of signal strengths
US20110074054A1 (en) * 2008-06-04 2011-03-31 Kozo Tajiri Process for producing an optical waveguide and stamp for use in the production process
US20100095707A1 (en) * 2008-10-21 2010-04-22 Qualcomm Mems Technologies,Inc. Fabricating optical waveguides
KR101059621B1 (ko) * 2008-12-09 2011-08-25 삼성전기주식회사 광도파로용 인쇄회로기판 및 그 제조방법
US8755655B2 (en) * 2009-09-22 2014-06-17 Oracle America, Inc. Edge-coupled optical proximity communication
KR101074689B1 (ko) * 2009-11-02 2011-10-19 삼성전기주식회사 광기판 및 그 제조방법
WO2011065384A1 (ja) * 2009-11-25 2011-06-03 シチズンホールディングス株式会社 光デバイス
US8507322B2 (en) 2010-06-24 2013-08-13 Akihiro Chida Semiconductor substrate and method for manufacturing semiconductor device
WO2012134025A1 (ko) * 2011-03-25 2012-10-04 Lee Seo Young 광도파로 및 그 제조방법
TWI463204B (zh) * 2011-11-18 2014-12-01 Universal Microelectronics Co Ltd 光機總成及其製作方法
US8895429B2 (en) * 2013-03-05 2014-11-25 Eastman Kodak Company Micro-channel structure with variable depths
CN105044839A (zh) * 2013-03-29 2015-11-11 南京邮电大学 微机电可调氮化物光波导器件的制备方法
US9244223B2 (en) * 2013-11-08 2016-01-26 Taiwan Semiconductor Manufacturing Company, Ltd. Light coupling formation in a waveguide layer
JP2016004224A (ja) * 2014-06-19 2016-01-12 富士通株式会社 光学モジュール、光学モジュールの製造方法及び光学装置
EP3174169B1 (en) * 2014-07-25 2019-04-24 Mitsuboshi Diamond Industrial Co., Ltd. Optical fiber cooling device and laser oscillator
KR101925476B1 (ko) * 2015-11-25 2018-12-05 주식회사 옵텔라 광학 모듈 및 이를 포함하는 광학 엔진
WO2017132834A1 (zh) * 2016-02-02 2017-08-10 华为技术有限公司 单纤双向组件
US9933570B2 (en) * 2016-03-01 2018-04-03 Futurewei Technologies, Inc. Integration of V-grooves on silicon-on-insulator (SOI) platform for direct fiber coupling
JP6694206B2 (ja) * 2016-04-12 2020-05-13 日東電工株式会社 光コネクタ部材およびそれを用いた光コネクタキット、並びにそれによって得られる光配線
JP6678510B2 (ja) * 2016-05-11 2020-04-08 古河電気工業株式会社 光導波路素子
US9772458B1 (en) * 2016-09-12 2017-09-26 Yottahn, Inc. Optical module for optical fibers and method of manufacturing the same
CN109994461B (zh) * 2017-12-30 2021-10-08 苏州旭创科技有限公司 光学组件、光模块及其封装方法
CN108494478A (zh) * 2018-03-30 2018-09-04 昂纳信息技术（深圳）有限公司 一种实现监测发射功率的sr4器件和一种监测方法
US10877213B2 (en) * 2018-06-20 2020-12-29 Hisense Broadband Multimedia Technologies Co., Ltd. Optical module
US11886001B2 (en) * 2019-12-20 2024-01-30 Snap Inc. Optical waveguide fabrication process

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04107403A (ja) * 1990-08-28 1992-04-08 Brother Ind Ltd 光導波路アレイ及びその製造方法
JP3031385B2 (ja) 1991-03-11 2000-04-10 日本電信電話株式会社 フレキシブル光導波路基板及びその製造方法
JPH05224076A (ja) * 1992-02-07 1993-09-03 Sumitomo Electric Ind Ltd 光結合装置とその製造方法
JP3484543B2 (ja) * 1993-03-24 2004-01-06 富士通株式会社 光結合部材の製造方法及び光装置
JPH08262249A (ja) 1995-03-23 1996-10-11 Fujikura Ltd 光導波路素子の形成方法
JP2818132B2 (ja) * 1995-05-08 1998-10-30 東芝機械株式会社 光導波路の製造方法
US5745631A (en) * 1996-01-26 1998-04-28 Irvine Sensors Corporation Self-aligning optical beam system
US6355198B1 (en) * 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
JP3448627B2 (ja) * 1996-09-12 2003-09-22 日本航空電子工業株式会社 光モジュールおよびその製造方法
KR100263195B1 (ko) * 1996-09-16 2000-08-01 윤종용 광도파로 소자의 제작 방법
DE19642088A1 (de) * 1996-10-12 1998-04-16 Bosch Gmbh Robert Verfahren zur Herstellung eines mikrostrukturierten Körpers, eines Gußrahmens und eines integriert-optischen Bauteils
KR100211039B1 (ko) * 1996-12-20 1999-07-15 이계철 광스위치-광섬유 광결합 장치
US6061487A (en) * 1997-04-30 2000-05-09 Nok Corporation Optical waveguide circuit, optical branched waveguide circuit, and optical modulator
JPH11145487A (ja) 1997-11-12 1999-05-28 Nippon Telegr & Teleph Corp <Ntt> 光モジュールの製造方法及び製造装置
AR018448A1 (es) * 1998-06-04 2001-11-14 Pirelli Cavi E Sistemi Spa Metodo para fabricar una estructura de guia de ondas opticas difundida en un substrato, guia de ondas opticas difundida obtenida y dispositivooptico que la contiene
JP2000047055A (ja) * 1998-07-28 2000-02-18 Japan Aviation Electronics Industry Ltd 光導波路デバイスおよびその製造方法
JP2000199827A (ja) * 1998-10-27 2000-07-18 Sony Corp 光導波装置およびその製造方法
CA2274193A1 (en) * 1999-01-11 2000-07-11 Hamid Hatami-Hanza Method for making integrated and composite optical devices utilizing prefabrication optical fibers and such devices
JP3628547B2 (ja) 1999-04-16 2005-03-16 日本電信電話株式会社 電気・光機能モジュール
JP2000321452A (ja) * 1999-05-11 2000-11-24 Oki Electric Ind Co Ltd 光導波路素子及び光導波路素子の製造方法
JP2001042150A (ja) * 1999-07-30 2001-02-16 Canon Inc 光導波路、その作製方法、およびこれを用いた光インタコネクション装置
US6445857B1 (en) * 1999-09-21 2002-09-03 Matsushita Electric Industrial Co., Ltd. Optical waveguide part, its manufacturing method, connection member, optical part, method for connecting optical waveguide part, and optical element
JP3774598B2 (ja) * 1999-09-30 2006-05-17 株式会社日立製作所 ポリマ導波路基板の製造方法およびポリマ導波路基板
JP2001154051A (ja) 1999-11-29 2001-06-08 Oki Printed Circuit Kk 光導波路の製造方法
JP3681947B2 (ja) 2000-03-13 2005-08-10 日本電信電話株式会社 光導波路の製造方法
JP4060023B2 (ja) * 2000-03-28 2008-03-12 沖電気工業株式会社 光導波路送受信モジュール
US6266250B1 (en) * 2000-04-26 2001-07-24 Multiplex Technology, Inc. Electronics component mounting system
JP2001350051A (ja) 2000-06-06 2001-12-21 Nippon Telegr & Teleph Corp <Ntt> 光導波路モジュール及びその製造方法
JP5218713B2 (ja) * 2000-07-28 2013-06-26 住友ベークライト株式会社 光学導波管を形成するためのポリマー組成物；それらから形成される光学導波管；およびそれを作製するための方法
US6766082B2 (en) * 2000-10-18 2004-07-20 Nippon Telegraph And Telephone Corporation Waveguide-type optical device and manufacturing method therefor
WO2002048765A1 (en) 2000-12-14 2002-06-20 Bookham Technology Plc Integrated optical devices
WO2002050585A1 (en) 2000-12-21 2002-06-27 Cquint Communications Corporation Multi-layer dispersion-engineered waveguides and resonators
US6885781B2 (en) * 2002-05-03 2005-04-26 Fujitsu Limited Thin film electro-optical deflector device and a method of fabrication of such a device

Also Published As

Publication number Publication date
US7013055B2 (en) 2006-03-14
US20060104587A1 (en) 2006-05-18
KR20060029657A (ko) 2006-04-06
US7174081B2 (en) 2007-02-06
TWI227342B (en) 2005-02-01
KR100713498B1 (ko) 2007-05-02
CN1477410A (zh) 2004-02-25
CN1246712C (zh) 2006-03-22
KR20050045966A (ko) 2005-05-17
KR100559645B1 (ko) 2006-03-10
KR100766686B1 (ko) 2007-10-15
TW200407571A (en) 2004-05-16
KR20040004106A (ko) 2004-01-13
JP2004086129A (ja) 2004-03-18
US20060110098A1 (en) 2006-05-25
US7113683B2 (en) 2006-09-26
US20040184702A1 (en) 2004-09-23

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