JP3825336B2 - ナノカーボンの製造方法及びナノカーボンの製造装置 - Google Patents

ナノカーボンの製造方法及びナノカーボンの製造装置 Download PDF

Info

Publication number
JP3825336B2
JP3825336B2 JP2002044554A JP2002044554A JP3825336B2 JP 3825336 B2 JP3825336 B2 JP 3825336B2 JP 2002044554 A JP2002044554 A JP 2002044554A JP 2002044554 A JP2002044554 A JP 2002044554A JP 3825336 B2 JP3825336 B2 JP 3825336B2
Authority
JP
Japan
Prior art keywords
electrode
nanocarbon
soot
arc
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002044554A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002348108A5 (enExample
JP2002348108A (ja
Inventor
浩史 滝川
美彦 日比
茂生 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Futaba Corp
Original Assignee
Futaba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Futaba Corp filed Critical Futaba Corp
Priority to JP2002044554A priority Critical patent/JP3825336B2/ja
Priority to TW091104104A priority patent/TW594931B/zh
Priority to KR1020020012949A priority patent/KR100664347B1/ko
Priority to CNB021183554A priority patent/CN1280187C/zh
Priority to US10/094,622 priority patent/US6827823B2/en
Publication of JP2002348108A publication Critical patent/JP2002348108A/ja
Publication of JP2002348108A5 publication Critical patent/JP2002348108A5/ja
Application granted granted Critical
Publication of JP3825336B2 publication Critical patent/JP3825336B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/152—Fullerenes
    • C01B32/154—Preparation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/16—Preparation
    • C01B32/162—Preparation characterised by catalysts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0816—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes involving moving electrodes
    • B01J2219/082—Sliding electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0837—Details relating to the material of the electrodes
    • B01J2219/0839—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0869—Feeding or evacuating the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0875—Gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0879—Solid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0892—Materials to be treated involving catalytically active material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00—Structure or properties of carbon nanotubes
    • C01B2202/02—Single-walled nanotubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30446—Field emission cathodes characterised by the emitter material
    • H01J2201/30453—Carbon types
    • H01J2201/30469—Carbon nanotubes (CNTs)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/02—Manufacture of cathodes
    • H01J2209/022—Cold cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/47—Generating plasma using corona discharges
    • H05H1/471—Pointed electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/50—Production of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
    • Y10S977/844—Growth by vaporization or dissociation of carbon source using a high-energy heat source, e.g. electric arc, laser, plasma, e-beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Composite Materials (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP2002044554A 2001-03-12 2002-02-21 ナノカーボンの製造方法及びナノカーボンの製造装置 Expired - Fee Related JP3825336B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2002044554A JP3825336B2 (ja) 2001-03-12 2002-02-21 ナノカーボンの製造方法及びナノカーボンの製造装置
TW091104104A TW594931B (en) 2001-03-12 2002-03-06 Method for preparing nano-carbon and nano-carbon prepared by such method and composite material or mixed material containing nano-carbon and metal fine particle, apparatus for preparing nano-carbon, method for patterning nano-carbon and nano carbon
KR1020020012949A KR100664347B1 (ko) 2001-03-12 2002-03-11 나노카본의 제조방법 및 그 방법을 이용하여 제조된나노카본 및 나노카본과 금속미립자를 포함하는 복합재료또는 혼합재료, 나노카본의 제조장치, 나노카본의 패턴화방법 및 그 방법을 이용하여 패턴화된 나노카본기재 및 그패턴화된 나노카본기재를 이용한 전자방출원
CNB021183554A CN1280187C (zh) 2001-03-12 2002-03-12 制备纳米碳的方法、纳米碳、含其的材料及制备设备
US10/094,622 US6827823B2 (en) 2001-03-12 2002-03-12 Nano-carbon and composite material or mixed material containing nano-carbon and metal fine particle and methods for producing and patterning the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001068413 2001-03-12
JP2001-68413 2001-03-12
JP2002044554A JP3825336B2 (ja) 2001-03-12 2002-02-21 ナノカーボンの製造方法及びナノカーボンの製造装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006134204A Division JP4339870B2 (ja) 2001-03-12 2006-05-12 ナノカーボンの製造方法及びナノカーボンの製造装置

Publications (3)

Publication Number Publication Date
JP2002348108A JP2002348108A (ja) 2002-12-04
JP2002348108A5 JP2002348108A5 (enExample) 2005-09-02
JP3825336B2 true JP3825336B2 (ja) 2006-09-27

Family

ID=26611041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002044554A Expired - Fee Related JP3825336B2 (ja) 2001-03-12 2002-02-21 ナノカーボンの製造方法及びナノカーボンの製造装置

Country Status (5)

Country Link
US (1) US6827823B2 (enExample)
JP (1) JP3825336B2 (enExample)
KR (1) KR100664347B1 (enExample)
CN (1) CN1280187C (enExample)
TW (1) TW594931B (enExample)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3842159B2 (ja) * 2002-03-26 2006-11-08 株式会社半導体エネルギー研究所 ドーピング装置
JP4338355B2 (ja) * 2002-05-10 2009-10-07 東京エレクトロン株式会社 プラズマ処理装置
US20040134631A1 (en) * 2003-01-15 2004-07-15 Crooks Evon Llewellyn Smoking article wrapping materials comprising ultrafine particles
JP3997930B2 (ja) 2003-02-27 2007-10-24 富士ゼロックス株式会社 カーボンナノチューブの製造装置および製造方法
US20040173229A1 (en) * 2003-03-05 2004-09-09 Crooks Evon Llewellyn Smoking article comprising ultrafine particles
JP4394383B2 (ja) * 2003-06-18 2010-01-06 独立行政法人科学技術振興機構 単層カーボンナノホーン吸着材およびその製造方法
US7125308B2 (en) * 2003-12-18 2006-10-24 Nano-Proprietary, Inc. Bead blast activation of carbon nanotube cathode
JP4863329B2 (ja) * 2004-01-26 2012-01-25 双葉電子工業株式会社 蛍光表示管
US20080031795A1 (en) * 2004-03-26 2008-02-07 Luna Innovations Incorporated Method of Making Multiple Carbonaceous Nanomaterials
KR101102441B1 (ko) * 2004-04-16 2012-01-05 학교법인 동의학원 산화 인듐이 부착된 카본을 제조하는 방법
JP4652860B2 (ja) * 2004-04-27 2011-03-16 大陽日酸株式会社 クリプトン又はキセノンの回収方法
US20050274390A1 (en) * 2004-06-15 2005-12-15 Banerjee Chandra K Ultra-fine particle catalysts for carbonaceous fuel elements
KR101046976B1 (ko) * 2004-10-19 2011-07-07 삼성에스디아이 주식회사 전자 방출원 형성용 조성물, 이를 이용한 전자 방출원제조 방법 및 전자 방출원
WO2006051989A1 (ja) * 2004-11-15 2006-05-18 Ideal Star Inc. アルカリ金属内包フラーレン類の分離剤、フラーレン類からのアルカリ金属とその化合物の除去方法、アルカリ金属内包フラーレン類の精製方法及び製造方法並びにそれらのシステム
KR100712416B1 (ko) * 2004-12-13 2007-04-27 광주과학기술원 오스뮴 클러스터로 작용화된 탄소나노튜브 및 그 제조방법
JP4680612B2 (ja) * 2005-01-24 2011-05-11 株式会社不二越 カーボンオニオンの製造方法
JP4696598B2 (ja) * 2005-03-04 2011-06-08 Ｊｆｅエンジニアリング株式会社 カーボンナノチューブ
JP4693463B2 (ja) * 2005-04-05 2011-06-01 本荘ケミカル株式会社 二層カーボンナノチューブを製造するための触媒とこれを用いる二層カーボンナノチューブの製造方法
US7444934B2 (en) * 2005-05-24 2008-11-04 Micron Technology, Inc. Supercritical fluid-assisted direct write for printing integrated circuits
JP2007048907A (ja) * 2005-08-09 2007-02-22 National Institute For Materials Science 電気二重層キャパシタ用電極およびこれを用いたキャパシタ
US9220301B2 (en) 2006-03-16 2015-12-29 R.J. Reynolds Tobacco Company Smoking article
KR100777113B1 (ko) * 2006-12-07 2007-11-19 한국전자통신연구원 미세패터닝이 가능한 고 신뢰성의 ｃｎｔ 에미터 제조 방법
TWI332427B (en) * 2007-11-21 2010-11-01 Univ Nat Taiwan Ocean Welding method for sc-zirconium based bulk metallic glass
US8262942B2 (en) * 2008-02-07 2012-09-11 The George Washington University Hollow carbon nanosphere based secondary cell electrodes
KR101054963B1 (ko) * 2008-09-23 2011-08-05 현대하이스코 주식회사 금형 코팅 방법 및 이를 위한 이동식 코팅 장치
TWI407805B (zh) * 2009-01-16 2013-09-01 北京富納特創新科技有限公司 熱致發聲裝置之製備方法
DE102009048397A1 (de) * 2009-10-06 2011-04-07 Plasmatreat Gmbh Atmosphärendruckplasmaverfahren zur Herstellung oberflächenmodifizierter Partikel und von Beschichtungen
US8945789B2 (en) * 2011-03-18 2015-02-03 Ngk Insulators, Ltd. Solid oxide fuel cell
KR20140038411A (ko) 2011-04-15 2014-03-28 가부시키가이샤 간쿄우 에네루기 나노 기쥬츠 겡큐쇼 카본 나노 재료 제조 장치 및 그 이용
JP5242840B1 (ja) * 2011-10-14 2013-07-24 日本碍子株式会社 燃料電池セル
JP2013228378A (ja) * 2012-03-28 2013-11-07 Nippon Soken Inc カーボンスーツ発生装置
US9839896B2 (en) * 2012-06-12 2017-12-12 The George Washington University System and method for mass production of graphene platelets in arc plasma
US9021985B2 (en) 2012-09-12 2015-05-05 Asm Ip Holdings B.V. Process gas management for an inductively-coupled plasma deposition reactor
JP6449610B2 (ja) * 2013-10-07 2019-01-09 株式会社Ｓｏｋｅｎ カーボンスーツ発生装置およびカーボンスーツ発生方法
CN104129775B (zh) * 2014-07-16 2015-12-30 苏州大学 一种内嵌钪氧化物团簇富勒烯的制备方法
US10553390B2 (en) * 2016-07-19 2020-02-04 Denka Company Limited Electron source and production method therefor
US10813257B2 (en) * 2016-09-05 2020-10-20 Nec Corporation Electromagnetic wave absorbing material
US10584072B2 (en) * 2017-05-17 2020-03-10 Eden Innovations Ltd. Methods and systems for making nanocarbon particle admixtures and concrete
KR102456578B1 (ko) 2017-07-14 2022-10-20 삼성전자주식회사 하드마스크 조성물과 그 제조방법 및 하드마스크 조성물을 이용한 패턴층의 형성방법
CN110203904B (zh) * 2019-06-06 2021-07-09 东北大学 用于制备纳米结构碳材料的前体材料及方法
US11999654B2 (en) 2019-08-22 2024-06-04 Eden Innovations Ltd. Method for making concrete admixtures containing carbon nanoparticles
CN115832164B (zh) * 2021-07-27 2025-05-30 清华大学 锂离子电池电极的制备方法及制备装置
CN118343745B (zh) * 2024-05-14 2025-10-28 江西铜业技术研究院有限公司 一种直流电弧放电制备单/双壁碳纳米管的方法和系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2541434B2 (ja) * 1992-11-20 1996-10-09 日本電気株式会社 カ―ボンナノチュ―ブの製造方法
JP2699852B2 (ja) * 1993-12-28 1998-01-19 日本電気株式会社 単層カーボンナノチューブの製造法
TW353758B (en) * 1996-09-30 1999-03-01 Motorola Inc Electron emissive film and method
JP3017161B2 (ja) * 1998-03-16 2000-03-06 双葉電子工業株式会社 単層カーボンナノチューブの製造方法
JP2000277003A (ja) * 1999-03-23 2000-10-06 Futaba Corp 電子放出源の製造方法及び電子放出源
KR100335382B1 (ko) * 2000-05-23 2002-05-06 최규술 회전 전극 플라즈마 장치, 및 이를 이용한 탄소 나노체합성 방법

Also Published As

Publication number Publication date
US6827823B2 (en) 2004-12-07
US20020127351A1 (en) 2002-09-12
KR100664347B1 (ko) 2007-01-02
TW594931B (en) 2004-06-21
JP2002348108A (ja) 2002-12-04
CN1375451A (zh) 2002-10-23
KR20020072798A (ko) 2002-09-18
CN1280187C (zh) 2006-10-18

Similar Documents

Publication Publication Date Title
KR100664347B1 (ko) 나노카본의 제조방법 및 그 방법을 이용하여 제조된나노카본 및 나노카본과 금속미립자를 포함하는 복합재료또는 혼합재료, 나노카본의 제조장치, 나노카본의 패턴화방법 및 그 방법을 이용하여 패턴화된 나노카본기재 및 그패턴화된 나노카본기재를 이용한 전자방출원
KR100562975B1 (ko) 나노튜브의 제조방법 및 이 방법을 이용하여 제조된나노튜브, 나노튜브의 제조장치, 나노튜브의 패턴화 방법및 이 방법을 이용하여 패턴화된 나노튜브 기재 및 이패턴화된 나노튜브 기재를 이용한 전자방출원
KR100604459B1 (ko) 이중벽 탄소 나노튜브와 그의 제조방법 및 응용방법
Rao et al. In situ-grown carbon nanotube array with excellent field emission characteristics
Zeng et al. Synthesis and application of carbon nanotubes
JP2000277003A (ja) 電子放出源の製造方法及び電子放出源
JP3986711B2 (ja) 単層カーボンナノチューブの製造方法
JP3714364B2 (ja) カーボンナノチューブの製造装置および製造方法
TWI271381B (en) Method for preparing carbon nano-fine particle, apparatus for preparing the same, and mono layer carbon nanotube
JP2002348108A5 (enExample)
JP3764651B2 (ja) カーボンナノチューブ接合体の製造方法
JP2003277029A (ja) カーボンナノチューブ及びその製造方法
JP3602092B2 (ja) ナノカーボンの製造方法、ナノカーボンの製造装置、ナノカーボンのパターン化方法
JP4339870B2 (ja) ナノカーボンの製造方法及びナノカーボンの製造装置
JP2004189501A (ja) グラフェンシート筒の先端部の一部又は全部が破れているカーボンナノチューブの製造方法及び製造装置
JP4693463B2 (ja) 二層カーボンナノチューブを製造するための触媒とこれを用いる二層カーボンナノチューブの製造方法
Cho et al. A simple method to fabricate high-performance carbon nanotube field emitters
JP4657474B2 (ja) 炭素クラスターの製造用原料
JP3885715B2 (ja) アーク放電によるカーボンナノチューブの製造方法
MXPA00012681A (en) Free-standing and aligned carbon nanotubes and synthesis thereof

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041222

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041222

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060314

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060512

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060627

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060629

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100707

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110707

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees