JP3797505B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP3797505B2
JP3797505B2 JP04600097A JP4600097A JP3797505B2 JP 3797505 B2 JP3797505 B2 JP 3797505B2 JP 04600097 A JP04600097 A JP 04600097A JP 4600097 A JP4600097 A JP 4600097A JP 3797505 B2 JP3797505 B2 JP 3797505B2
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JP
Japan
Prior art keywords
group
acid
different
same
substituent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP04600097A
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English (en)
Japanese (ja)
Other versions
JPH10239847A5 (enExample
JPH10239847A (ja
Inventor
利明 青合
健一郎 佐藤
史郎 丹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP04600097A priority Critical patent/JP3797505B2/ja
Priority to KR1019980005036A priority patent/KR100538968B1/ko
Priority to US09/025,451 priority patent/US6042991A/en
Publication of JPH10239847A publication Critical patent/JPH10239847A/ja
Priority to US09/497,281 priority patent/US6416925B1/en
Publication of JPH10239847A5 publication Critical patent/JPH10239847A5/ja
Application granted granted Critical
Publication of JP3797505B2 publication Critical patent/JP3797505B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP04600097A 1997-02-18 1997-02-28 ポジ型感光性組成物 Expired - Fee Related JP3797505B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP04600097A JP3797505B2 (ja) 1997-02-28 1997-02-28 ポジ型感光性組成物
KR1019980005036A KR100538968B1 (ko) 1997-02-18 1998-02-18 포지티브감광성조성물
US09/025,451 US6042991A (en) 1997-02-18 1998-02-18 Positive working photosensitive composition
US09/497,281 US6416925B1 (en) 1997-02-18 2000-02-02 Positive working photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04600097A JP3797505B2 (ja) 1997-02-28 1997-02-28 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH10239847A JPH10239847A (ja) 1998-09-11
JPH10239847A5 JPH10239847A5 (enExample) 2004-10-07
JP3797505B2 true JP3797505B2 (ja) 2006-07-19

Family

ID=12734825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04600097A Expired - Fee Related JP3797505B2 (ja) 1997-02-18 1997-02-28 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3797505B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999061956A1 (en) * 1998-05-25 1999-12-02 Daicel Chemical Industries, Ltd. Compounds for photoresist and resin composition for photoresist
JP3810957B2 (ja) * 1998-08-06 2006-08-16 株式会社東芝 レジスト用樹脂、レジスト組成物およびそれを用いたパターン形成方法
US6303266B1 (en) 1998-09-24 2001-10-16 Kabushiki Kaisha Toshiba Resin useful for resist, resist composition and pattern forming process using the same
JP3353292B2 (ja) * 1999-03-29 2002-12-03 日本電気株式会社 化学増幅系レジスト
US6479211B1 (en) * 1999-05-26 2002-11-12 Fuji Photo Film Co., Ltd. Positive photoresist composition for far ultraviolet exposure
US6692888B1 (en) * 1999-10-07 2004-02-17 Shipley Company, L.L.C. Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
JP4393010B2 (ja) * 2001-04-10 2010-01-06 富士通マイクロエレクトロニクス株式会社 化学増幅レジスト組成物及びそれを用いたパターン形成方法
DE10131670A1 (de) 2001-06-29 2003-01-16 Infineon Technologies Ag Fotoresists mit Reaktionsankern für eine chemische Nachverstärkung von Resiststrukturen für Belichtungen bei 157 nm
JP2004315791A (ja) * 2003-03-28 2004-11-11 Tokyo Ohka Kogyo Co Ltd ジカルボン酸モノエステル化合物およびその製造方法ならびに重合体
JP5215228B2 (ja) * 2009-04-16 2013-06-19 株式会社ダイセル フォトレジスト用樹脂組成物の製造法
JP5986825B2 (ja) * 2012-06-29 2016-09-06 株式会社ダイセル 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
JP5986826B2 (ja) * 2012-06-29 2016-09-06 株式会社ダイセル 高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法
KR102076529B1 (ko) 2012-06-29 2020-02-13 주식회사 다이셀 고분자 화합물, 포토레지스트용 수지 조성물, 및 반도체의 제조 방법

Also Published As

Publication number Publication date
JPH10239847A (ja) 1998-09-11

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