JP3757536B2 - 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 - Google Patents

投影光学系及びそれを備えた露光装置並びにデバイス製造方法 Download PDF

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Publication number
JP3757536B2
JP3757536B2 JP10974697A JP10974697A JP3757536B2 JP 3757536 B2 JP3757536 B2 JP 3757536B2 JP 10974697 A JP10974697 A JP 10974697A JP 10974697 A JP10974697 A JP 10974697A JP 3757536 B2 JP3757536 B2 JP 3757536B2
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JP
Japan
Prior art keywords
lens
lens group
positive
group
object side
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP10974697A
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English (en)
Japanese (ja)
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JPH10161021A5 (enExample
JPH10161021A (ja
Inventor
豊 末永
弘太郎 山口
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Nikon Corp
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Nikon Corp
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Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10974697A priority Critical patent/JP3757536B2/ja
Priority to TW086107075A priority patent/TW417168B/zh
Priority to US08/876,176 priority patent/US5930049A/en
Priority to KR1019970034275A priority patent/KR100485376B1/ko
Priority to EP19970117078 priority patent/EP0877271B1/en
Priority to DE69732023T priority patent/DE69732023T2/de
Publication of JPH10161021A publication Critical patent/JPH10161021A/ja
Publication of JPH10161021A5 publication Critical patent/JPH10161021A5/ja
Application granted granted Critical
Publication of JP3757536B2 publication Critical patent/JP3757536B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10974697A 1996-10-01 1997-04-25 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 Expired - Lifetime JP3757536B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP10974697A JP3757536B2 (ja) 1996-10-01 1997-04-25 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
TW086107075A TW417168B (en) 1996-10-01 1997-05-26 Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices
US08/876,176 US5930049A (en) 1996-10-01 1997-06-13 Projection optical system and method of using such system for manufacturing devices
KR1019970034275A KR100485376B1 (ko) 1996-10-01 1997-07-22 투영광학계와이를구비하는노광장치,및디바이스제조방법
EP19970117078 EP0877271B1 (en) 1997-04-25 1997-10-01 A projection optical system and method of using such system for manufacturing devices
DE69732023T DE69732023T2 (de) 1997-04-25 1997-10-01 Optisches Projektionssystem und Verfahren zu dessen Anwendung bei der Herstellung von Vorrichtungen

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-261000 1996-10-01
JP26100096 1996-10-01
JP10974697A JP3757536B2 (ja) 1996-10-01 1997-04-25 投影光学系及びそれを備えた露光装置並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH10161021A JPH10161021A (ja) 1998-06-19
JPH10161021A5 JPH10161021A5 (enExample) 2005-03-17
JP3757536B2 true JP3757536B2 (ja) 2006-03-22

Family

ID=26449456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10974697A Expired - Lifetime JP3757536B2 (ja) 1996-10-01 1997-04-25 投影光学系及びそれを備えた露光装置並びにデバイス製造方法

Country Status (4)

Country Link
US (1) US5930049A (enExample)
JP (1) JP3757536B2 (enExample)
KR (1) KR100485376B1 (enExample)
TW (1) TW417168B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) * 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
US6600550B1 (en) * 1999-06-03 2003-07-29 Nikon Corporation Exposure apparatus, a photolithography method, and a device manufactured by the same
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
EP1344112A2 (de) * 2000-12-22 2003-09-17 Carl Zeiss SMT AG Projektionsobjektiv
DE10221386A1 (de) * 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
WO2004040350A1 (ja) * 2002-10-15 2004-05-13 Matsushita Electric Industrial Co., Ltd. ズームレンズとそれを用いた映像拡大投写システム、ビデオプロジェクター、リアプロジェクター、及びマルチビジョンシステム
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7791851B1 (en) 2006-01-24 2010-09-07 Cypress Semiconductor Corporation Cascode combination of low and high voltage transistors for electrostatic discharge circuit
US7385793B1 (en) * 2006-01-24 2008-06-10 Cypress Semiconductor Corporation Cascode active shunt gate oxide project during electrostatic discharge event
DE102007043896A1 (de) 2007-09-14 2009-04-02 Carl Zeiss Smt Ag Mikrooptik zur Messung der Position eines Luftbildes
RU2433433C1 (ru) * 2010-04-26 2011-11-10 Закрытое Акционерное Общество "Импульс" Проекционный объектив
JP2011237588A (ja) * 2010-05-10 2011-11-24 Sony Corp ズームレンズ及び撮像装置
JP2011252962A (ja) * 2010-05-31 2011-12-15 Olympus Imaging Corp 結像光学系及びそれを備えた撮像装置
KR101407076B1 (ko) * 2012-05-24 2014-06-13 주식회사 비엘시스템 근적외선을 이용한 인쇄판 프린터용 고해상도 노광장치
DE102022201001A1 (de) 2022-01-31 2023-08-03 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
KR20240032536A (ko) * 2022-09-02 2024-03-12 현대모비스 주식회사 렌즈 광학계

Family Cites Families (28)

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Publication number Priority date Publication date Assignee Title
US3504961A (en) * 1968-04-01 1970-04-07 Perkin Elmer Corp Modified double gauss objective
US3897138A (en) * 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
JPS5336326B2 (enExample) * 1972-12-26 1978-10-02
JPS581763B2 (ja) * 1978-06-19 1983-01-12 旭光学工業株式会社 回折限界の解像力を有する等倍複写用レンズ
JPS58147708A (ja) * 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
US4666273A (en) * 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4811055A (en) * 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
US4772107A (en) * 1986-11-05 1988-09-20 The Perkin-Elmer Corporation Wide angle lens with improved flat field characteristics
JPH0812329B2 (ja) * 1986-11-06 1996-02-07 株式会社シグマ 投影レンズ
US4770477A (en) * 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
US5105075A (en) * 1988-09-19 1992-04-14 Canon Kabushiki Kaisha Projection exposure apparatus
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
US5420417A (en) * 1991-10-08 1995-05-30 Nikon Corporation Projection exposure apparatus with light distribution adjustment
JP3298131B2 (ja) * 1991-10-24 2002-07-02 株式会社ニコン 縮小投影レンズ
US5335044A (en) * 1992-02-26 1994-08-02 Nikon Corporation Projection type exposure apparatus and method of exposure
JPH06313845A (ja) * 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
JP3360387B2 (ja) * 1993-11-15 2002-12-24 株式会社ニコン 投影光学系及び投影露光装置
JP3396935B2 (ja) * 1993-11-15 2003-04-14 株式会社ニコン 投影光学系及び投影露光装置
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3819048B2 (ja) * 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法

Also Published As

Publication number Publication date
US5930049A (en) 1999-07-27
TW417168B (en) 2001-01-01
KR19980032235A (ko) 1998-07-25
KR100485376B1 (ko) 2005-09-12
JPH10161021A (ja) 1998-06-19

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