TW417168B - Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices - Google Patents
Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices Download PDFInfo
- Publication number
- TW417168B TW417168B TW086107075A TW86107075A TW417168B TW 417168 B TW417168 B TW 417168B TW 086107075 A TW086107075 A TW 086107075A TW 86107075 A TW86107075 A TW 86107075A TW 417168 B TW417168 B TW 417168B
- Authority
- TW
- Taiwan
- Prior art keywords
- lens
- group
- lens group
- positive
- aforementioned
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 title description 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000002079 cooperative effect Effects 0.000 claims description 9
- 238000009434 installation Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims 2
- 239000010985 leather Substances 0.000 claims 2
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 claims 1
- 241000237502 Ostreidae Species 0.000 claims 1
- 210000000988 bone and bone Anatomy 0.000 claims 1
- 235000020636 oyster Nutrition 0.000 claims 1
- 230000035515 penetration Effects 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 239000002023 wood Substances 0.000 claims 1
- 230000004075 alteration Effects 0.000 abstract description 17
- 230000005499 meniscus Effects 0.000 description 29
- 238000010586 diagram Methods 0.000 description 21
- 235000012431 wafers Nutrition 0.000 description 19
- 238000012937 correction Methods 0.000 description 12
- 238000005286 illumination Methods 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 102100036570 Coiled-coil domain-containing protein 177 Human genes 0.000 description 1
- 241001412225 Firmiana simplex Species 0.000 description 1
- 101000715214 Homo sapiens Coiled-coil domain-containing protein 177 Proteins 0.000 description 1
- 240000004658 Medicago sativa Species 0.000 description 1
- 235000017587 Medicago sativa ssp. sativa Nutrition 0.000 description 1
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 1
- 239000003830 anthracite Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26100096 | 1996-10-01 | ||
| JP10974697A JP3757536B2 (ja) | 1996-10-01 | 1997-04-25 | 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW417168B true TW417168B (en) | 2001-01-01 |
Family
ID=26449456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW086107075A TW417168B (en) | 1996-10-01 | 1997-05-26 | Projection optical system, exposure device provided therewith and method of using such system for manufacturing devices |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5930049A (enExample) |
| JP (1) | JP3757536B2 (enExample) |
| KR (1) | KR100485376B1 (enExample) |
| TW (1) | TW417168B (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3757536B2 (ja) * | 1996-10-01 | 2006-03-22 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 |
| JP3925576B2 (ja) * | 1997-07-24 | 2007-06-06 | 株式会社ニコン | 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法 |
| JPH1195095A (ja) | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| JPH11214293A (ja) * | 1998-01-22 | 1999-08-06 | Nikon Corp | 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 |
| US6700645B1 (en) | 1998-01-22 | 2004-03-02 | Nikon Corporation | Projection optical system and exposure apparatus and method |
| DE19855157A1 (de) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projektionsobjektiv |
| US6600550B1 (en) * | 1999-06-03 | 2003-07-29 | Nikon Corporation | Exposure apparatus, a photolithography method, and a device manufactured by the same |
| DE10064685A1 (de) * | 2000-12-22 | 2002-07-04 | Zeiss Carl | Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft |
| EP1344112A2 (de) * | 2000-12-22 | 2003-09-17 | Carl Zeiss SMT AG | Projektionsobjektiv |
| DE10221386A1 (de) * | 2002-05-14 | 2003-11-27 | Zeiss Carl Smt Ag | Projektionsbelichtungssystem |
| WO2004040350A1 (ja) * | 2002-10-15 | 2004-05-13 | Matsushita Electric Industrial Co., Ltd. | ズームレンズとそれを用いた映像拡大投写システム、ビデオプロジェクター、リアプロジェクター、及びマルチビジョンシステム |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| US7791851B1 (en) | 2006-01-24 | 2010-09-07 | Cypress Semiconductor Corporation | Cascode combination of low and high voltage transistors for electrostatic discharge circuit |
| US7385793B1 (en) * | 2006-01-24 | 2008-06-10 | Cypress Semiconductor Corporation | Cascode active shunt gate oxide project during electrostatic discharge event |
| DE102007043896A1 (de) | 2007-09-14 | 2009-04-02 | Carl Zeiss Smt Ag | Mikrooptik zur Messung der Position eines Luftbildes |
| RU2433433C1 (ru) * | 2010-04-26 | 2011-11-10 | Закрытое Акционерное Общество "Импульс" | Проекционный объектив |
| JP2011237588A (ja) * | 2010-05-10 | 2011-11-24 | Sony Corp | ズームレンズ及び撮像装置 |
| JP2011252962A (ja) * | 2010-05-31 | 2011-12-15 | Olympus Imaging Corp | 結像光学系及びそれを備えた撮像装置 |
| KR101407076B1 (ko) * | 2012-05-24 | 2014-06-13 | 주식회사 비엘시스템 | 근적외선을 이용한 인쇄판 프린터용 고해상도 노광장치 |
| DE102022201001A1 (de) | 2022-01-31 | 2023-08-03 | Carl Zeiss Smt Gmbh | Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren |
| KR20240032536A (ko) * | 2022-09-02 | 2024-03-12 | 현대모비스 주식회사 | 렌즈 광학계 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3504961A (en) * | 1968-04-01 | 1970-04-07 | Perkin Elmer Corp | Modified double gauss objective |
| US3897138A (en) * | 1971-11-24 | 1975-07-29 | Canon Kk | Projection lens for mask pattern printing |
| JPS5336326B2 (enExample) * | 1972-12-26 | 1978-10-02 | ||
| JPS581763B2 (ja) * | 1978-06-19 | 1983-01-12 | 旭光学工業株式会社 | 回折限界の解像力を有する等倍複写用レンズ |
| JPS58147708A (ja) * | 1982-02-26 | 1983-09-02 | Nippon Kogaku Kk <Nikon> | 照明用光学装置 |
| US4666273A (en) * | 1983-10-05 | 1987-05-19 | Nippon Kogaku K. K. | Automatic magnification correcting system in a projection optical apparatus |
| GB2153543B (en) * | 1983-12-28 | 1988-09-01 | Canon Kk | A projection exposure apparatus |
| US4811055A (en) * | 1984-02-27 | 1989-03-07 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| US4772107A (en) * | 1986-11-05 | 1988-09-20 | The Perkin-Elmer Corporation | Wide angle lens with improved flat field characteristics |
| JPH0812329B2 (ja) * | 1986-11-06 | 1996-02-07 | 株式会社シグマ | 投影レンズ |
| US4770477A (en) * | 1986-12-04 | 1988-09-13 | The Perkin-Elmer Corporation | Lens usable in the ultraviolet |
| US4918583A (en) * | 1988-04-25 | 1990-04-17 | Nikon Corporation | Illuminating optical device |
| US5105075A (en) * | 1988-09-19 | 1992-04-14 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| JP3041939B2 (ja) * | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
| JPH04369209A (ja) * | 1991-06-17 | 1992-12-22 | Nikon Corp | 露光用照明装置 |
| US5420417A (en) * | 1991-10-08 | 1995-05-30 | Nikon Corporation | Projection exposure apparatus with light distribution adjustment |
| JP3298131B2 (ja) * | 1991-10-24 | 2002-07-02 | 株式会社ニコン | 縮小投影レンズ |
| US5335044A (en) * | 1992-02-26 | 1994-08-02 | Nikon Corporation | Projection type exposure apparatus and method of exposure |
| JPH06313845A (ja) * | 1993-04-28 | 1994-11-08 | Olympus Optical Co Ltd | 投影レンズ系 |
| JP3724517B2 (ja) * | 1995-01-18 | 2005-12-07 | 株式会社ニコン | 露光装置 |
| JP3360387B2 (ja) * | 1993-11-15 | 2002-12-24 | 株式会社ニコン | 投影光学系及び投影露光装置 |
| JP3396935B2 (ja) * | 1993-11-15 | 2003-04-14 | 株式会社ニコン | 投影光学系及び投影露光装置 |
| JPH08179204A (ja) * | 1994-11-10 | 1996-07-12 | Nikon Corp | 投影光学系及び投影露光装置 |
| JP3500745B2 (ja) * | 1994-12-14 | 2004-02-23 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3454390B2 (ja) * | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3819048B2 (ja) * | 1995-03-15 | 2006-09-06 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びに露光方法 |
| JP3624973B2 (ja) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | 投影光学系 |
| JP3757536B2 (ja) * | 1996-10-01 | 2006-03-22 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 |
-
1997
- 1997-04-25 JP JP10974697A patent/JP3757536B2/ja not_active Expired - Lifetime
- 1997-05-26 TW TW086107075A patent/TW417168B/zh not_active IP Right Cessation
- 1997-06-13 US US08/876,176 patent/US5930049A/en not_active Expired - Lifetime
- 1997-07-22 KR KR1019970034275A patent/KR100485376B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US5930049A (en) | 1999-07-27 |
| KR19980032235A (ko) | 1998-07-25 |
| JP3757536B2 (ja) | 2006-03-22 |
| KR100485376B1 (ko) | 2005-09-12 |
| JPH10161021A (ja) | 1998-06-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |