JP3659965B1 - 高純度コロイダルシリカの製造方法 - Google Patents

高純度コロイダルシリカの製造方法 Download PDF

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Publication number
JP3659965B1
JP3659965B1 JP2004230610A JP2004230610A JP3659965B1 JP 3659965 B1 JP3659965 B1 JP 3659965B1 JP 2004230610 A JP2004230610 A JP 2004230610A JP 2004230610 A JP2004230610 A JP 2004230610A JP 3659965 B1 JP3659965 B1 JP 3659965B1
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JP
Japan
Prior art keywords
colloidal silica
aqueous solution
chelating agent
acid
exchange resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004230610A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006045022A (ja
Inventor
邦明 前島
慎介 宮部
昌宏 泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP2004230610A priority Critical patent/JP3659965B1/ja
Application granted granted Critical
Publication of JP3659965B1 publication Critical patent/JP3659965B1/ja
Priority to TW094122546A priority patent/TW200619139A/zh
Priority to KR1020050069221A priority patent/KR101185718B1/ko
Publication of JP2006045022A publication Critical patent/JP2006045022A/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
JP2004230610A 2004-08-06 2004-08-06 高純度コロイダルシリカの製造方法 Expired - Fee Related JP3659965B1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004230610A JP3659965B1 (ja) 2004-08-06 2004-08-06 高純度コロイダルシリカの製造方法
TW094122546A TW200619139A (en) 2004-08-06 2005-07-04 Method of manufacturing colloidal silica with high purity (I)
KR1020050069221A KR101185718B1 (ko) 2004-08-06 2005-07-29 고순도 콜로이드실리카의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004230610A JP3659965B1 (ja) 2004-08-06 2004-08-06 高純度コロイダルシリカの製造方法

Publications (2)

Publication Number Publication Date
JP3659965B1 true JP3659965B1 (ja) 2005-06-15
JP2006045022A JP2006045022A (ja) 2006-02-16

Family

ID=34698046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004230610A Expired - Fee Related JP3659965B1 (ja) 2004-08-06 2004-08-06 高純度コロイダルシリカの製造方法

Country Status (3)

Country Link
JP (1) JP3659965B1 (enExample)
KR (1) KR101185718B1 (enExample)
TW (1) TW200619139A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103771425A (zh) * 2014-01-17 2014-05-07 江西恒隆实业有限公司 利用稻壳灰制备白炭黑的生产工艺

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI681929B (zh) 2011-12-28 2020-01-11 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
CN103803559B (zh) * 2014-01-17 2015-08-19 江西恒隆实业有限公司 低水份含量的白炭黑加工工艺
JP2017171599A (ja) * 2016-03-23 2017-09-28 高化学技術株式会社 固体触媒、及びその固体触媒を用いたエチレングリコールの製造方法
JP7594864B2 (ja) * 2020-06-05 2024-12-05 株式会社フジミインコーポレーテッド アニオン変性コロイダルシリカの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5100581A (en) * 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol
JP3225553B2 (ja) * 1991-10-11 2001-11-05 日産化学工業株式会社 高純度の水性シリカゾルの製造方法
TW530029B (en) * 1999-11-17 2003-05-01 Akzo Nobel Nv A method for manufacturing of silica sols
JP2001294417A (ja) * 2000-04-12 2001-10-23 Nippon Chem Ind Co Ltd コロイダルシリカの製造方法
JP4643085B2 (ja) * 2001-09-19 2011-03-02 日本化学工業株式会社 研磨剤用高純度コロイダルシリカの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103771425A (zh) * 2014-01-17 2014-05-07 江西恒隆实业有限公司 利用稻壳灰制备白炭黑的生产工艺
CN103771425B (zh) * 2014-01-17 2015-08-19 江西恒隆实业有限公司 利用稻壳灰制备白炭黑的生产工艺

Also Published As

Publication number Publication date
JP2006045022A (ja) 2006-02-16
TW200619139A (en) 2006-06-16
TWI357887B (enExample) 2012-02-11
KR101185718B1 (ko) 2012-09-24
KR20060048901A (ko) 2006-05-18

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