TW200619139A - Method of manufacturing colloidal silica with high purity (I) - Google Patents

Method of manufacturing colloidal silica with high purity (I)

Info

Publication number
TW200619139A
TW200619139A TW094122546A TW94122546A TW200619139A TW 200619139 A TW200619139 A TW 200619139A TW 094122546 A TW094122546 A TW 094122546A TW 94122546 A TW94122546 A TW 94122546A TW 200619139 A TW200619139 A TW 200619139A
Authority
TW
Taiwan
Prior art keywords
colloidal silica
chelating agent
high purity
aqueous solution
manufacturing
Prior art date
Application number
TW094122546A
Other languages
English (en)
Other versions
TWI357887B (zh
Inventor
Kuniaki Maejima
Shinsuke Miyabe
Masahiro Izumi
Original Assignee
Nippon Chemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Ind filed Critical Nippon Chemical Ind
Publication of TW200619139A publication Critical patent/TW200619139A/zh
Application granted granted Critical
Publication of TWI357887B publication Critical patent/TWI357887B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
TW094122546A 2004-08-06 2005-07-04 Method of manufacturing colloidal silica with high purity (I) TW200619139A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004230610A JP3659965B1 (ja) 2004-08-06 2004-08-06 高純度コロイダルシリカの製造方法

Publications (2)

Publication Number Publication Date
TW200619139A true TW200619139A (en) 2006-06-16
TWI357887B TWI357887B (zh) 2012-02-11

Family

ID=34698046

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094122546A TW200619139A (en) 2004-08-06 2005-07-04 Method of manufacturing colloidal silica with high purity (I)

Country Status (3)

Country Link
JP (1) JP3659965B1 (zh)
KR (1) KR101185718B1 (zh)
TW (1) TW200619139A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI549911B (zh) * 2011-12-28 2016-09-21 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
CN103803559B (zh) * 2014-01-17 2015-08-19 江西恒隆实业有限公司 低水份含量的白炭黑加工工艺
CN103771425B (zh) * 2014-01-17 2015-08-19 江西恒隆实业有限公司 利用稻壳灰制备白炭黑的生产工艺
JP2017171599A (ja) * 2016-03-23 2017-09-28 高化学技術株式会社 固体触媒、及びその固体触媒を用いたエチレングリコールの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5100581A (en) * 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol
JP3225553B2 (ja) * 1991-10-11 2001-11-05 日産化学工業株式会社 高純度の水性シリカゾルの製造方法
TW530029B (en) * 1999-11-17 2003-05-01 Akzo Nobel Nv A method for manufacturing of silica sols
JP2001294417A (ja) * 2000-04-12 2001-10-23 Nippon Chem Ind Co Ltd コロイダルシリカの製造方法
JP4643085B2 (ja) * 2001-09-19 2011-03-02 日本化学工業株式会社 研磨剤用高純度コロイダルシリカの製造方法

Also Published As

Publication number Publication date
KR101185718B1 (ko) 2012-09-24
JP2006045022A (ja) 2006-02-16
JP3659965B1 (ja) 2005-06-15
TWI357887B (zh) 2012-02-11
KR20060048901A (ko) 2006-05-18

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees