JP3595791B2 - 半導体製造装置 - Google Patents

半導体製造装置 Download PDF

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Publication number
JP3595791B2
JP3595791B2 JP2001352565A JP2001352565A JP3595791B2 JP 3595791 B2 JP3595791 B2 JP 3595791B2 JP 2001352565 A JP2001352565 A JP 2001352565A JP 2001352565 A JP2001352565 A JP 2001352565A JP 3595791 B2 JP3595791 B2 JP 3595791B2
Authority
JP
Japan
Prior art keywords
filter
air
chamber
chemical
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001352565A
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English (en)
Japanese (ja)
Other versions
JP2003151892A5 (enExample
JP2003151892A (ja
Inventor
一志 中野
貴吉 荒川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001352565A priority Critical patent/JP3595791B2/ja
Priority to EP02257942A priority patent/EP1312985B1/en
Priority to US10/298,549 priority patent/US6924877B2/en
Publication of JP2003151892A publication Critical patent/JP2003151892A/ja
Publication of JP2003151892A5 publication Critical patent/JP2003151892A5/ja
Application granted granted Critical
Publication of JP3595791B2 publication Critical patent/JP3595791B2/ja
Priority to US11/186,953 priority patent/US7186285B2/en
Priority to US11/668,666 priority patent/US20070119131A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
    • B01D46/12—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces in multiple arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
    • B01D46/0036—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions by adsorption or absorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/52—Particle separators, e.g. dust precipitators, using filters embodying folded corrugated or wound sheet material
    • B01D46/521—Particle separators, e.g. dust precipitators, using filters embodying folded corrugated or wound sheet material using folded, pleated material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0446—Means for feeding or distributing gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/102—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/20—Organic adsorbents
    • B01D2253/206—Ion exchange resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/30—Physical properties of adsorbents
    • B01D2253/34—Specific shapes
    • B01D2253/342—Monoliths
    • B01D2253/3425—Honeycomb shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2267/00—Multiple filter elements specially adapted for separating dispersed particles from gases or vapours
    • B01D2267/40—Different types of filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0438—Cooling or heating systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0454—Controlling adsorption
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
    • F24F8/10—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering
    • F24F8/15—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by separation, e.g. by filtering by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2001352565A 2001-11-19 2001-11-19 半導体製造装置 Expired - Fee Related JP3595791B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001352565A JP3595791B2 (ja) 2001-11-19 2001-11-19 半導体製造装置
EP02257942A EP1312985B1 (en) 2001-11-19 2002-11-18 Semiconductor manufacturing apparatus
US10/298,549 US6924877B2 (en) 2001-11-19 2002-11-19 Chemical filter arrangement for a semiconductor manufacturing apparatus
US11/186,953 US7186285B2 (en) 2001-11-19 2005-07-22 Chemical filter arrangement for a semiconductor manufacturing apparatus
US11/668,666 US20070119131A1 (en) 2001-11-19 2007-01-30 Chemical filter arrangement for asemiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001352565A JP3595791B2 (ja) 2001-11-19 2001-11-19 半導体製造装置

Publications (3)

Publication Number Publication Date
JP2003151892A JP2003151892A (ja) 2003-05-23
JP2003151892A5 JP2003151892A5 (enExample) 2004-07-15
JP3595791B2 true JP3595791B2 (ja) 2004-12-02

Family

ID=19164721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001352565A Expired - Fee Related JP3595791B2 (ja) 2001-11-19 2001-11-19 半導体製造装置

Country Status (3)

Country Link
US (3) US6924877B2 (enExample)
EP (1) EP1312985B1 (enExample)
JP (1) JP3595791B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3595791B2 (ja) * 2001-11-19 2004-12-02 キヤノン株式会社 半導体製造装置
WO2004108252A1 (ja) * 2003-06-03 2004-12-16 Nikon Corporation フィルタ装置及び露光装置並びにデバイスの製造方法
IL156836A (en) * 2003-07-09 2008-08-07 Beth El Zikhron Ya Aqov Ind Lt System and method for protection/isolation against infections
JP4759272B2 (ja) * 2005-01-13 2011-08-31 ルネサスエレクトロニクス株式会社 露光装置
US7833305B1 (en) * 2005-04-19 2010-11-16 Studer Ronald M Filter device
JP4781049B2 (ja) * 2005-08-30 2011-09-28 キヤノン株式会社 露光装置およびデバイス製造方法
JP5305568B2 (ja) * 2006-05-22 2013-10-02 株式会社東芝 露光装置及びケミカルフィルタ寿命検知方法
US10842535B2 (en) 2007-02-14 2020-11-24 William R. Krause Flexible spine components having multiple slots
WO2008100590A1 (en) * 2007-02-14 2008-08-21 Flex Technology Inc Flexible spine components
JP5145541B2 (ja) * 2007-03-30 2013-02-20 ニチアス株式会社 保管装置
JP2009206239A (ja) * 2008-02-27 2009-09-10 Orion Mach Co Ltd 恒温空気供給装置
WO2010146462A2 (en) * 2009-06-19 2010-12-23 Entegris, Inc. Filter pleat structure
CN103180887B (zh) * 2010-07-22 2016-11-09 克拉克空气过滤产品有限公司 结合有防水过滤器的自助式服务终端机
US8603217B2 (en) * 2011-02-01 2013-12-10 Universal Laser Systems, Inc. Recirculating filtration systems for material processing systems and associated methods of use and manufacture
CN102841508B (zh) * 2011-06-23 2014-09-17 上海微电子装备有限公司 分流式气浴风道
CN102889249B (zh) * 2012-10-30 2015-07-15 深圳市华星光电技术有限公司 一种风机滤器单元和无尘室空气净化系统
US9155988B2 (en) 2013-03-14 2015-10-13 Universal Laser Systems, Inc. Multi-stage air filtration systems and associated apparatuses and methods
CN104117256A (zh) * 2013-04-28 2014-10-29 陈卫星 化工气体有毒烟尘水解中和法
US12357136B2 (en) 2020-11-19 2025-07-15 Milwaukee Electric Tool Corporation Portable dust extractor

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3364838A (en) * 1966-02-01 1968-01-23 Gen Electric Cabinet for mounting, enclosing and cooling electrical apparatus
US4609459A (en) * 1983-04-01 1986-09-02 Hendrix Steel & Fabricating Co. Inc. Fitted filter member
US4737173A (en) * 1986-07-03 1988-04-12 Amway Corporation Room air treatment system
US5626820A (en) * 1988-12-12 1997-05-06 Kinkead; Devon A. Clean room air filtering
US4963170A (en) * 1989-12-04 1990-10-16 Global Consumer Services, Inc. Inflow and outflow HEPA vent filter for asbestos work areas
JP3094055B2 (ja) 1993-05-18 2000-10-03 東京エレクトロン株式会社 フィルタ装置及びレジスト処理システム
KR100242530B1 (ko) 1993-05-18 2000-02-01 히가시 데쓰로 필터장치
US5685895A (en) * 1994-08-10 1997-11-11 Nikon Corporation Air cleaning apparatus used for an exposure apparatus
US6297871B1 (en) * 1995-09-12 2001-10-02 Nikon Corporation Exposure apparatus
JP3426077B2 (ja) 1996-02-13 2003-07-14 株式会社荏原製作所 空気浄化装置
KR100542414B1 (ko) * 1996-03-27 2006-05-10 가부시키가이샤 니콘 노광장치및공조장치
US6063170A (en) * 1996-05-20 2000-05-16 Air-A-Medic Corporation Air filtration system
JPH10106939A (ja) * 1996-10-01 1998-04-24 Canon Inc 露光システムおよび基板搬送方法
US5922095A (en) * 1997-03-20 1999-07-13 Acoustiflo, Llc Air handling system for buildings and clean rooms
JP3711376B2 (ja) 1997-04-07 2005-11-02 野村マイクロ・サイエンス株式会社 気体清浄化方法および気体清浄化装置
JPH11111593A (ja) 1997-10-01 1999-04-23 Canon Inc 環境制御装置
US6102977A (en) * 1998-06-18 2000-08-15 Seh America, Inc. Make-up air handler and method for supplying boron-free outside air to clean rooms
JP2000068193A (ja) * 1998-08-18 2000-03-03 Canon Inc 露光方法およびデバイス製造方法
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
US6432177B1 (en) * 2000-09-12 2002-08-13 Donaldson Company, Inc. Air filter assembly for low temperature catalytic processes
JP2002093688A (ja) * 2000-09-19 2002-03-29 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2002147811A (ja) * 2000-11-08 2002-05-22 Sharp Corp クリーンルーム
US6602307B2 (en) * 2001-05-29 2003-08-05 Kanalflakt Inc. Bypass air filer
JP3595791B2 (ja) * 2001-11-19 2004-12-02 キヤノン株式会社 半導体製造装置
US6849107B1 (en) * 2002-12-16 2005-02-01 Fred Huffman Air filtration system
HK1063576A2 (en) * 2004-06-23 2004-11-26 John Manufacturing Ltd Multi-function optoelectronic air purifier
US20060130662A1 (en) * 2004-12-17 2006-06-22 Mario Digrato Air filter and method of filtering air in central heating and air conditioning system

Also Published As

Publication number Publication date
US20030095242A1 (en) 2003-05-22
US7186285B2 (en) 2007-03-06
EP1312985A2 (en) 2003-05-21
US6924877B2 (en) 2005-08-02
US20070119131A1 (en) 2007-05-31
JP2003151892A (ja) 2003-05-23
US20050268581A1 (en) 2005-12-08
EP1312985B1 (en) 2012-08-01
EP1312985A3 (en) 2004-01-07

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