JP5305568B2 - 露光装置及びケミカルフィルタ寿命検知方法 - Google Patents
露光装置及びケミカルフィルタ寿命検知方法 Download PDFInfo
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- JP5305568B2 JP5305568B2 JP2006142035A JP2006142035A JP5305568B2 JP 5305568 B2 JP5305568 B2 JP 5305568B2 JP 2006142035 A JP2006142035 A JP 2006142035A JP 2006142035 A JP2006142035 A JP 2006142035A JP 5305568 B2 JP5305568 B2 JP 5305568B2
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- Prior art keywords
- chemical filter
- exposure apparatus
- optical component
- transmittance
- light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
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- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
Claims (4)
- 空調系に備えられ気中の不純物の濃度を下げるためのケミカルフィルタと、
前記ケミカルフィルタの下流に備えられた他のケミカルフィルタと、
前記ケミカルフィルタの下流且つ前記他のケミカルフィルタの上流の気体に曝されるよう配置された光学部品と、
前記光学部品に、前記不純物と光反応を起こす露光工程と同じ波長の光を照射する照射手段と、
前記光学部品を透過する光の透過率を測定する測定手段と、
を具備することを特徴とする露光装置。 - 空調系に備えられ気中の不純物の濃度を下げるためのケミカルフィルタと、
前記ケミカルフィルタの下流の気体に曝されるよう配置された光学部品と、
前記ケミカルフィルタの下流の気体を前記光学部品の表面にポンプによって導く手段と、
前記光学部品に、前記不純物と光反応を起こす露光工程と同じ波長の光を照射する照射手段と、
前記光学部品を透過する光の透過率を測定する測定手段と、
を具備することを特徴とする露光装置。 - 空調系に備えられ気中の不純物の濃度を下げるための複数のケミカルフィルタと、
前記各ケミカルフィルタの下流の気体に曝されるようそれぞれ配置された複数の光学部品と、
前記各ケミカルフィルタの下流の気体を前記複数の光学部品の表面にポンプによって導く手段と、
前記複数の光学部品に、前記不純物と光反応を起こす露光工程と同じ波長の光を照射する照射手段と、
前記複数の光学部品を透過する光の各透過率を測定する測定手段と、
を具備することを特徴とする露光装置。 - 露光装置の空調系に備えられ気中の不純物の濃度を下げるためのケミカルフィルタの下流の気体であって且つポンプによって導かれた気体に曝されるよう配置された光学部品に、前記不純物と光反応を起こす露光工程と同じ波長の光を照射し、
前記光学部品を透過する光の透過率を測定することで前記ケミカルフィルタの寿命を検知することを特徴とするケミカルフィルタ寿命検知方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006142035A JP5305568B2 (ja) | 2006-05-22 | 2006-05-22 | 露光装置及びケミカルフィルタ寿命検知方法 |
US11/802,291 US20070268467A1 (en) | 2006-05-22 | 2007-05-22 | Exposure apparatus and semiconductor device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006142035A JP5305568B2 (ja) | 2006-05-22 | 2006-05-22 | 露光装置及びケミカルフィルタ寿命検知方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007311722A JP2007311722A (ja) | 2007-11-29 |
JP5305568B2 true JP5305568B2 (ja) | 2013-10-02 |
Family
ID=38711665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006142035A Expired - Fee Related JP5305568B2 (ja) | 2006-05-22 | 2006-05-22 | 露光装置及びケミカルフィルタ寿命検知方法 |
Country Status (2)
Country | Link |
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US (1) | US20070268467A1 (ja) |
JP (1) | JP5305568B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110001952A1 (en) * | 2008-09-25 | 2011-01-06 | Eran & Jan, Inc | Resist exposure and contamination testing apparatus for EUV lithography |
JP7093214B2 (ja) * | 2018-04-02 | 2022-06-29 | キヤノン株式会社 | インプリント装置の管理方法、インプリント装置、平坦化層形成装置の管理方法、および、物品製造方法 |
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JP3448670B2 (ja) * | 1993-09-02 | 2003-09-22 | 株式会社ニコン | 露光装置及び素子製造方法 |
JP3365571B2 (ja) * | 1993-11-10 | 2003-01-14 | 株式会社ニコン | 光学式計測装置及び露光装置 |
US5685895A (en) * | 1994-08-10 | 1997-11-11 | Nikon Corporation | Air cleaning apparatus used for an exposure apparatus |
JP3433844B2 (ja) * | 1994-08-10 | 2003-08-04 | 株式会社ニコン | 露光装置用のフィルタ装置及び投影露光装置 |
KR100542414B1 (ko) * | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
JPH09270385A (ja) * | 1996-03-29 | 1997-10-14 | Nikon Corp | 露光装置の環境制御装置 |
IL132432A0 (en) * | 1997-04-18 | 2001-03-19 | Nikon Corp | An exposure apparatus exposure method using the same and method of manufacture of circuit device |
WO1998048452A1 (fr) * | 1997-04-18 | 1998-10-29 | Nikon Corporation | Procede et dispositif de commande de l'exposition, procede et dispositif d'exposition, et procede de fabrication dudit dispositif |
AU7552498A (en) * | 1997-06-10 | 1998-12-30 | Nikon Corporation | Optical device, method of cleaning the same, projection aligner, and method of producing the same |
JPH1131647A (ja) * | 1997-07-11 | 1999-02-02 | Oki Electric Ind Co Ltd | 投影露光装置 |
WO1999010917A1 (fr) * | 1997-08-26 | 1999-03-04 | Nikon Corporation | Dispositif d'alignement, procede d'exposition, procede de regulation de la pression d'un systeme optique de projection, et procede de montage du dispositif d'alignement |
AU1175799A (en) * | 1997-11-21 | 1999-06-15 | Nikon Corporation | Projection aligner and projection exposure method |
JPH11204396A (ja) * | 1998-01-08 | 1999-07-30 | Canon Inc | 半導体製造システムおよびデバイス製造方法 |
AU2962099A (en) * | 1998-04-07 | 1999-10-25 | Nikon Corporation | Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same |
EP1083777A4 (en) * | 1998-05-29 | 2004-03-05 | Nippon Kogaku Kk | LASER EXCITED PLASMA LIGHT SOURCE, LIGHTING DEVICE AND MANUFACTURING METHOD THEREOF |
KR20020036952A (ko) * | 1999-05-27 | 2002-05-17 | 시마무라 테루오 | 노광장치 및 디바이스 제조방법, 그리고 노광장치의환경제어방법 |
JP2000346817A (ja) * | 1999-06-07 | 2000-12-15 | Nikon Corp | 測定装置、照射装置および露光方法 |
US6571057B2 (en) * | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
JP3869999B2 (ja) * | 2000-03-30 | 2007-01-17 | キヤノン株式会社 | 露光装置および半導体デバイス製造方法 |
JP2001345263A (ja) * | 2000-03-31 | 2001-12-14 | Nikon Corp | 露光装置及び露光方法、並びにデバイス製造方法 |
JP2002158170A (ja) * | 2000-09-08 | 2002-05-31 | Nikon Corp | 露光装置及びデバイス製造方法 |
JP2002217095A (ja) * | 2000-11-14 | 2002-08-02 | Canon Inc | 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置 |
JP2005101018A (ja) * | 2001-02-19 | 2005-04-14 | Nikon Corp | 露光システム、露光装置及びデバイス製造方法 |
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JP4510433B2 (ja) * | 2003-12-03 | 2010-07-21 | キヤノン株式会社 | 露光装置及び洗浄方法 |
US7196342B2 (en) * | 2004-03-10 | 2007-03-27 | Cymer, Inc. | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source |
JP2006134974A (ja) * | 2004-11-04 | 2006-05-25 | Canon Inc | 露光装置、判定方法及びデバイス製造方法 |
US7405417B2 (en) * | 2005-12-20 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus having a monitoring device for detecting contamination |
US7541603B2 (en) * | 2006-09-27 | 2009-06-02 | Asml Netherlands B.V. | Radiation system and lithographic apparatus comprising the same |
US8054446B2 (en) * | 2008-08-21 | 2011-11-08 | Carl Zeiss Smt Gmbh | EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface |
-
2006
- 2006-05-22 JP JP2006142035A patent/JP5305568B2/ja not_active Expired - Fee Related
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2007
- 2007-05-22 US US11/802,291 patent/US20070268467A1/en not_active Abandoned
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US20070268467A1 (en) | 2007-11-22 |
JP2007311722A (ja) | 2007-11-29 |
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