JP3118739B2 - 洗浄装置 - Google Patents
洗浄装置Info
- Publication number
- JP3118739B2 JP3118739B2 JP04358224A JP35822492A JP3118739B2 JP 3118739 B2 JP3118739 B2 JP 3118739B2 JP 04358224 A JP04358224 A JP 04358224A JP 35822492 A JP35822492 A JP 35822492A JP 3118739 B2 JP3118739 B2 JP 3118739B2
- Authority
- JP
- Japan
- Prior art keywords
- processing
- flow
- processed
- holes
- flow holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04358224A JP3118739B2 (ja) | 1992-12-26 | 1992-12-26 | 洗浄装置 |
US08/172,419 US5503171A (en) | 1992-12-26 | 1993-12-22 | Substrates-washing apparatus |
KR1019930030041A KR100306087B1 (ko) | 1992-12-26 | 1993-12-27 | 세정장치 |
TW082111074A TW238401B (zh) | 1992-12-26 | 1993-12-28 | |
KR1019980017969A KR19990066687A (ko) | 1992-12-26 | 1998-05-19 | 세정장치 |
KR1019980017968A KR19990066686A (ko) | 1992-12-26 | 1998-05-19 | 세정처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04358224A JP3118739B2 (ja) | 1992-12-26 | 1992-12-26 | 洗浄装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06204199A JPH06204199A (ja) | 1994-07-22 |
JP3118739B2 true JP3118739B2 (ja) | 2000-12-18 |
Family
ID=18458186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04358224A Expired - Fee Related JP3118739B2 (ja) | 1992-12-26 | 1992-12-26 | 洗浄装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3118739B2 (zh) |
KR (3) | KR100306087B1 (zh) |
TW (1) | TW238401B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3328481B2 (ja) * | 1995-10-13 | 2002-09-24 | 東京エレクトロン株式会社 | 処理方法および装置 |
KR101425813B1 (ko) * | 2012-12-24 | 2014-08-05 | 주식회사 케이씨텍 | 웨이퍼의 침지식 세정 건조 장치 |
KR102137876B1 (ko) * | 2018-08-29 | 2020-08-13 | 이한주 | 개폐식 기판 처리 장치 및 기판 처리 방법 |
-
1992
- 1992-12-26 JP JP04358224A patent/JP3118739B2/ja not_active Expired - Fee Related
-
1993
- 1993-12-27 KR KR1019930030041A patent/KR100306087B1/ko not_active IP Right Cessation
- 1993-12-28 TW TW082111074A patent/TW238401B/zh not_active IP Right Cessation
-
1998
- 1998-05-19 KR KR1019980017968A patent/KR19990066686A/ko not_active Application Discontinuation
- 1998-05-19 KR KR1019980017969A patent/KR19990066687A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR19990066686A (ko) | 1999-08-16 |
KR19990066687A (ko) | 1999-08-16 |
KR940016548A (ko) | 1994-07-23 |
KR100306087B1 (ko) | 2001-11-30 |
JPH06204199A (ja) | 1994-07-22 |
TW238401B (zh) | 1995-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |