JP2652010B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物

Info

Publication number
JP2652010B2
JP2652010B2 JP61234768A JP23476886A JP2652010B2 JP 2652010 B2 JP2652010 B2 JP 2652010B2 JP 61234768 A JP61234768 A JP 61234768A JP 23476886 A JP23476886 A JP 23476886A JP 2652010 B2 JP2652010 B2 JP 2652010B2
Authority
JP
Japan
Prior art keywords
acid
resin
weight
cresol
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61234768A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6388546A (ja
Inventor
耕太郎 山末
彰 永島
晋 長尾
利男 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd, Fuji Photo Film Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP61234768A priority Critical patent/JP2652010B2/ja
Priority to DE19873733421 priority patent/DE3733421A1/de
Publication of JPS6388546A publication Critical patent/JPS6388546A/ja
Application granted granted Critical
Publication of JP2652010B2 publication Critical patent/JP2652010B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
JP61234768A 1986-10-02 1986-10-02 ポジ型感光性組成物 Expired - Lifetime JP2652010B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61234768A JP2652010B2 (ja) 1986-10-02 1986-10-02 ポジ型感光性組成物
DE19873733421 DE3733421A1 (de) 1986-10-02 1987-10-02 Positiv arbeitende lichtempfindliche zusammensetzung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61234768A JP2652010B2 (ja) 1986-10-02 1986-10-02 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
JPS6388546A JPS6388546A (ja) 1988-04-19
JP2652010B2 true JP2652010B2 (ja) 1997-09-10

Family

ID=16976057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61234768A Expired - Lifetime JP2652010B2 (ja) 1986-10-02 1986-10-02 ポジ型感光性組成物

Country Status (2)

Country Link
JP (1) JP2652010B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3733421A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2734545B2 (ja) * 1988-08-22 1998-03-30 大日本インキ化学工業株式会社 ポジ型フォトレジスト組成物
JP2566169B2 (ja) * 1989-12-28 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2557748B2 (ja) * 1990-09-07 1996-11-27 日本電信電話株式会社 ポジ型レジスト材料
JP2919142B2 (ja) * 1990-12-27 1999-07-12 株式会社東芝 感光性組成物およびそれを用いたパターン形成方法
DE69602211T2 (de) * 1995-01-12 1999-08-19 Fuji Photo Film Co. Lichtempfindliche Flachdruckplatte
JP6135743B2 (ja) * 2015-11-10 2017-05-31 日立化成株式会社 ポジ型感光性樹脂組成物及び感光性フィルム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
DE3733421C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-09-03
JPS6388546A (ja) 1988-04-19
DE3733421A1 (de) 1988-04-07

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