JP2025519455A5 - - Google Patents

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Publication number
JP2025519455A5
JP2025519455A5 JP2024571953A JP2024571953A JP2025519455A5 JP 2025519455 A5 JP2025519455 A5 JP 2025519455A5 JP 2024571953 A JP2024571953 A JP 2024571953A JP 2024571953 A JP2024571953 A JP 2024571953A JP 2025519455 A5 JP2025519455 A5 JP 2025519455A5
Authority
JP
Japan
Prior art keywords
carbon
developing
gas
halogen
bond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024571953A
Other languages
English (en)
Japanese (ja)
Other versions
JP2025519455A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2023/024395 external-priority patent/WO2023239628A1/en
Publication of JP2025519455A publication Critical patent/JP2025519455A/ja
Publication of JP2025519455A5 publication Critical patent/JP2025519455A5/ja
Pending legal-status Critical Current

Links

JP2024571953A 2022-06-06 2023-06-05 酸化性ハロゲン供与環境における有機金属レジストのガスに基づく現像 Pending JP2025519455A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263349187P 2022-06-06 2022-06-06
US63/349,187 2022-06-06
PCT/US2023/024395 WO2023239628A1 (en) 2022-06-06 2023-06-05 Gas-based development of organometallic resist in an oxidizing halogen-donating environment

Publications (2)

Publication Number Publication Date
JP2025519455A JP2025519455A (ja) 2025-06-26
JP2025519455A5 true JP2025519455A5 (enExample) 2026-05-11

Family

ID=89118795

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024571953A Pending JP2025519455A (ja) 2022-06-06 2023-06-05 酸化性ハロゲン供与環境における有機金属レジストのガスに基づく現像

Country Status (6)

Country Link
US (1) US20230408916A1 (enExample)
EP (1) EP4537162A4 (enExample)
JP (1) JP2025519455A (enExample)
KR (1) KR20250020467A (enExample)
TW (1) TW202407473A (enExample)
WO (1) WO2023239628A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250271755A1 (en) * 2024-02-28 2025-08-28 Inpria Corporation Controlled environment processing, rest steps, and baking processes for metal oxide-based resist patterning

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260059663A (ko) * 2015-10-13 2026-04-30 인프리아 코포레이션 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝
CN113227909B (zh) * 2018-12-20 2025-07-04 朗姆研究公司 抗蚀剂的干式显影
TWI837391B (zh) * 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
EP4651192A3 (en) * 2020-01-15 2026-03-04 Lam Research Corporation Underlayer for photoresist adhesion and dose reduction
EP4115242A4 (en) * 2020-03-02 2024-03-13 Inpria Corporation PROCESSING ENVIRONMENT FOR THE FORMATION OF INORGANIC RESERVE PATTERNS
JP7774611B2 (ja) * 2020-07-17 2025-11-21 ラム リサーチ コーポレーション 被膜を形成するための方法

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