JP2024535334A5 - - Google Patents
Info
- Publication number
- JP2024535334A5 JP2024535334A5 JP2024518191A JP2024518191A JP2024535334A5 JP 2024535334 A5 JP2024535334 A5 JP 2024535334A5 JP 2024518191 A JP2024518191 A JP 2024518191A JP 2024518191 A JP2024518191 A JP 2024518191A JP 2024535334 A5 JP2024535334 A5 JP 2024535334A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- contact
- reaction gas
- acid
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163247885P | 2021-09-24 | 2021-09-24 | |
| US63/247,885 | 2021-09-24 | ||
| PCT/US2022/044336 WO2023049237A1 (en) | 2021-09-24 | 2022-09-22 | High resolution latent image processing, contrast enhancement and thermal development; apparatuses for processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024535334A JP2024535334A (ja) | 2024-09-30 |
| JP2024535334A5 true JP2024535334A5 (enExample) | 2025-06-30 |
Family
ID=85705897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024518191A Pending JP2024535334A (ja) | 2021-09-24 | 2022-09-22 | 高解像度の潜像加工、コントラスト増強及び熱現像、加工のための装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20230100995A1 (enExample) |
| EP (1) | EP4405755A4 (enExample) |
| JP (1) | JP2024535334A (enExample) |
| KR (1) | KR20240058159A (enExample) |
| CN (1) | CN117980833A (enExample) |
| TW (2) | TWI842101B (enExample) |
| WO (1) | WO2023049237A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113227909B (zh) | 2018-12-20 | 2025-07-04 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| TWI837391B (zh) | 2019-06-26 | 2024-04-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| US11621172B2 (en) | 2020-07-01 | 2023-04-04 | Applied Materials, Inc. | Vapor phase thermal etch solutions for metal oxo photoresists |
| US12416863B2 (en) | 2020-07-01 | 2025-09-16 | Applied Materials, Inc. | Dry develop process of photoresist |
| EP4078292A4 (en) | 2020-07-07 | 2023-11-22 | Lam Research Corporation | Integrated dry processes for patterning radiation photoresist patterning |
| US20230107357A1 (en) | 2020-11-13 | 2023-04-06 | Lam Research Corporation | Process tool for dry removal of photoresist |
| JP7681106B2 (ja) | 2020-12-08 | 2025-05-21 | ラム リサーチ コーポレーション | 有機蒸気によるフォトレジストの現像 |
| KR20240160248A (ko) | 2022-07-01 | 2024-11-08 | 램 리써치 코포레이션 | 에칭 정지 억제를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상 |
| JP2024017893A (ja) * | 2022-07-28 | 2024-02-08 | 東京エレクトロン株式会社 | 基板処理方法、プログラム及び基板処理装置 |
| US20240201586A1 (en) * | 2022-12-20 | 2024-06-20 | Intel Corporation | Precursors and methods for producing tin-based photoresist |
| US12474640B2 (en) | 2023-03-17 | 2025-11-18 | Lam Research Corporation | Integration of dry development and etch processes for EUV patterning in a single process chamber |
| KR20250069677A (ko) * | 2023-07-27 | 2025-05-19 | 램 리써치 코포레이션 | 금속-함유 포토레지스트에 대한 올-인-원 건식 현상 |
| WO2025264623A1 (en) * | 2024-06-18 | 2025-12-26 | Inpria Corporation | Alkylsulfonic acid developer compositions and patterning methods for organometallic oxide photoresists |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06151338A (ja) * | 1992-11-06 | 1994-05-31 | Sumitomo Metal Ind Ltd | 気相成長装置 |
| JP3403373B2 (ja) * | 2000-05-26 | 2003-05-06 | 松下電器産業株式会社 | 有機膜のエッチング方法、半導体装置の製造方法及びパターンの形成方法 |
| US6534235B1 (en) * | 2000-10-31 | 2003-03-18 | Kansai Research Institute, Inc. | Photosensitive resin composition and process for forming pattern |
| JP2004128118A (ja) * | 2002-10-01 | 2004-04-22 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
| JP6081904B2 (ja) * | 2013-11-29 | 2017-02-15 | 東京エレクトロン株式会社 | 現像処理装置、現像処理方法、プログラム及びコンピュータ記憶媒体 |
| US9855579B2 (en) * | 2014-02-12 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company | Spin dispenser module substrate surface protection system |
| US10468249B2 (en) * | 2015-09-28 | 2019-11-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Patterning process of a semiconductor structure with a middle layer |
| KR20260059663A (ko) * | 2015-10-13 | 2026-04-30 | 인프리아 코포레이션 | 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝 |
| CA2975104A1 (en) * | 2017-08-02 | 2019-02-02 | Seastar Chemicals Inc. | Organometallic compounds and methods for the deposition of high purity tin oxide |
| TWI778248B (zh) * | 2018-04-05 | 2022-09-21 | 美商英培雅股份有限公司 | 錫十二聚物及具有強euv吸收的輻射可圖案化塗層 |
| TWI911141B (zh) * | 2018-06-30 | 2026-01-11 | 美商應用材料股份有限公司 | 含錫之前驅物及沉積含錫薄膜之方法 |
| JP7213642B2 (ja) * | 2018-09-05 | 2023-01-27 | 東京エレクトロン株式会社 | レジスト膜の製造方法 |
| CN113227909B (zh) * | 2018-12-20 | 2025-07-04 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| EP3953767A4 (en) * | 2019-04-12 | 2023-06-07 | Inpria Corporation | ORGANOMETALLIC PHOTORESIN DEVELOPER COMPOSITIONS AND METHODS OF TREATMENT |
| TWI837391B (zh) * | 2019-06-26 | 2024-04-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| CN114270266A (zh) * | 2019-06-28 | 2022-04-01 | 朗姆研究公司 | 具有多个图案化辐射吸收元素和/或竖直组成梯度的光致抗蚀剂 |
| CN118020031A (zh) * | 2021-07-29 | 2024-05-10 | 朗姆研究公司 | 含金属光致抗蚀剂的再加工 |
-
2022
- 2022-09-22 JP JP2024518191A patent/JP2024535334A/ja active Pending
- 2022-09-22 KR KR1020247012024A patent/KR20240058159A/ko active Pending
- 2022-09-22 EP EP22873564.3A patent/EP4405755A4/en active Pending
- 2022-09-22 WO PCT/US2022/044336 patent/WO2023049237A1/en not_active Ceased
- 2022-09-22 CN CN202280063304.5A patent/CN117980833A/zh active Pending
- 2022-09-22 US US17/950,685 patent/US20230100995A1/en active Pending
- 2022-09-23 TW TW111136067A patent/TWI842101B/zh active
- 2022-09-23 TW TW113114020A patent/TW202431035A/zh unknown
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