JP2025519455A - 酸化性ハロゲン供与環境における有機金属レジストのガスに基づく現像 - Google Patents

酸化性ハロゲン供与環境における有機金属レジストのガスに基づく現像 Download PDF

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Publication number
JP2025519455A
JP2025519455A JP2024571953A JP2024571953A JP2025519455A JP 2025519455 A JP2025519455 A JP 2025519455A JP 2024571953 A JP2024571953 A JP 2024571953A JP 2024571953 A JP2024571953 A JP 2024571953A JP 2025519455 A JP2025519455 A JP 2025519455A
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JP
Japan
Prior art keywords
development
gas
developing
carbon
substrate
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Pending
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JP2024571953A
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English (en)
Japanese (ja)
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JP2025519455A5 (enExample
Inventor
シェッペル，ペーテル デ
ジェイ カルディノー，ブライアン
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Inpria Corp
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Inpria Corp
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Publication of JP2025519455A publication Critical patent/JP2025519455A/ja
Publication of JP2025519455A5 publication Critical patent/JP2025519455A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2024571953A 2022-06-06 2023-06-05 酸化性ハロゲン供与環境における有機金属レジストのガスに基づく現像 Pending JP2025519455A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202263349187P 2022-06-06 2022-06-06
US63/349,187 2022-06-06
PCT/US2023/024395 WO2023239628A1 (en) 2022-06-06 2023-06-05 Gas-based development of organometallic resist in an oxidizing halogen-donating environment

Publications (2)

Publication Number Publication Date
JP2025519455A true JP2025519455A (ja) 2025-06-26
JP2025519455A5 JP2025519455A5 (enExample) 2026-05-11

Family

ID=89118795

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024571953A Pending JP2025519455A (ja) 2022-06-06 2023-06-05 酸化性ハロゲン供与環境における有機金属レジストのガスに基づく現像

Country Status (6)

Country Link
US (1) US20230408916A1 (enExample)
EP (1) EP4537162A4 (enExample)
JP (1) JP2025519455A (enExample)
KR (1) KR20250020467A (enExample)
TW (1) TW202407473A (enExample)
WO (1) WO2023239628A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250271755A1 (en) * 2024-02-28 2025-08-28 Inpria Corporation Controlled environment processing, rest steps, and baking processes for metal oxide-based resist patterning

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260059663A (ko) * 2015-10-13 2026-04-30 인프리아 코포레이션 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝
CN113227909B (zh) * 2018-12-20 2025-07-04 朗姆研究公司 抗蚀剂的干式显影
TWI837391B (zh) * 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
EP4651192A3 (en) * 2020-01-15 2026-03-04 Lam Research Corporation Underlayer for photoresist adhesion and dose reduction
EP4115242A4 (en) * 2020-03-02 2024-03-13 Inpria Corporation PROCESSING ENVIRONMENT FOR THE FORMATION OF INORGANIC RESERVE PATTERNS
JP7774611B2 (ja) * 2020-07-17 2025-11-21 ラム リサーチ コーポレーション 被膜を形成するための方法

Also Published As

Publication number Publication date
US20230408916A1 (en) 2023-12-21
WO2023239628A1 (en) 2023-12-14
EP4537162A4 (en) 2026-04-29
EP4537162A1 (en) 2025-04-16
TW202407473A (zh) 2024-02-16
KR20250020467A (ko) 2025-02-11

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