JP2024153725A5 - - Google Patents

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Publication number
JP2024153725A5
JP2024153725A5 JP2024117596A JP2024117596A JP2024153725A5 JP 2024153725 A5 JP2024153725 A5 JP 2024153725A5 JP 2024117596 A JP2024117596 A JP 2024117596A JP 2024117596 A JP2024117596 A JP 2024117596A JP 2024153725 A5 JP2024153725 A5 JP 2024153725A5
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JP
Japan
Prior art keywords
capacitors
row
conductors
electrode
capacitance value
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JP2024117596A
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English (en)
Japanese (ja)
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JP2024153725A (ja
JP7762769B2 (ja
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Priority claimed from JP2020535037A external-priority patent/JP7169359B2/ja
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Publication of JP2024153725A5 publication Critical patent/JP2024153725A5/ja
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JP2024117596A 2018-01-17 2024-07-23 レーザチャンバにおける放電性能を調整する装置 Active JP7762769B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201862618168P 2018-01-17 2018-01-17
US62/618,168 2018-01-17
US201862666310P 2018-05-03 2018-05-03
US62/666,310 2018-05-03
JP2020535037A JP7169359B2 (ja) 2018-01-17 2018-12-17 レーザチャンバにおける放電性能を調整する装置
PCT/US2018/065959 WO2019143433A1 (en) 2018-01-17 2018-12-17 Apparatus for tuning discharge performance in a laser chamber
JP2022173043A JP7528178B2 (ja) 2018-01-17 2022-10-28 レーザチャンバにおける放電性能を調整する装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2022173043A Division JP7528178B2 (ja) 2018-01-17 2022-10-28 レーザチャンバにおける放電性能を調整する装置

Publications (3)

Publication Number Publication Date
JP2024153725A JP2024153725A (ja) 2024-10-29
JP2024153725A5 true JP2024153725A5 (https=) 2024-11-06
JP7762769B2 JP7762769B2 (ja) 2025-10-30

Family

ID=67301522

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020535037A Active JP7169359B2 (ja) 2018-01-17 2018-12-17 レーザチャンバにおける放電性能を調整する装置
JP2022173043A Active JP7528178B2 (ja) 2018-01-17 2022-10-28 レーザチャンバにおける放電性能を調整する装置
JP2024117596A Active JP7762769B2 (ja) 2018-01-17 2024-07-23 レーザチャンバにおける放電性能を調整する装置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP2020535037A Active JP7169359B2 (ja) 2018-01-17 2018-12-17 レーザチャンバにおける放電性能を調整する装置
JP2022173043A Active JP7528178B2 (ja) 2018-01-17 2022-10-28 レーザチャンバにおける放電性能を調整する装置

Country Status (6)

Country Link
US (1) US11349273B2 (https=)
JP (3) JP7169359B2 (https=)
KR (1) KR102445660B1 (https=)
CN (1) CN111656626B (https=)
TW (1) TWI710185B (https=)
WO (1) WO2019143433A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
CN116472652A (zh) * 2020-12-23 2023-07-21 极光先进雷射株式会社 放电电极、阳极的制造方法和电子器件的制造方法
WO2025153874A1 (en) * 2024-01-17 2025-07-24 Cymer, Llc Capacitor system for a radiation source of a lithographic apparatus

Family Cites Families (30)

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Publication number Priority date Publication date Assignee Title
DE3136447A1 (de) * 1981-09-14 1983-03-24 Kraftwerk Union AG, 4330 Mülheim Laser des te-typs, insbesondere hochenergielaser
JPS62181482A (ja) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> エキシマレ−ザ−装置
JPS62243379A (ja) * 1986-04-15 1987-10-23 Mitsubishi Electric Corp 気体パルス・レ−ザ装置
US5048041A (en) * 1988-01-15 1991-09-10 Cymer Laser Technologies Compact excimer laser
JPH02103972A (ja) 1988-10-13 1990-04-17 Toshiba Corp パルスレーザ発振装置
JPH0690048A (ja) 1990-10-12 1994-03-29 Coherent Inc パルス波ｃｏ２レーザー
JP2921969B2 (ja) * 1990-11-20 1999-07-19 株式会社東芝 ガスレーザ装置
JPH05167158A (ja) * 1991-12-16 1993-07-02 Komatsu Ltd エキシマレーザ装置
RU2064720C1 (ru) 1992-10-06 1996-07-27 Научно-производственное внедренческое предприятие "Лазерная лаборатория" Газовый лазер
US5686789A (en) * 1995-03-14 1997-11-11 Osram Sylvania Inc. Discharge device having cathode with micro hollow array
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6785316B1 (en) * 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
JP3399517B2 (ja) * 1999-12-08 2003-04-21 ウシオ電機株式会社 紫外線を放出するガスレーザ装置
MY120869A (en) * 2000-01-26 2005-11-30 Matsushita Electric Industrial Co Ltd Plasma treatment apparatus and method
JP2001274493A (ja) * 2000-03-27 2001-10-05 Nidek Co Ltd ガスレーザ装置
US7132123B2 (en) 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6914919B2 (en) 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6377595B1 (en) * 2000-09-08 2002-04-23 Komatsu Ltd. Peaking capacitor layout
DE20110048U1 (de) * 2001-06-18 2001-08-16 Lambda Physik AG, 37079 Göttingen Gasentladungslaser mit Mitteln zur Entfernung von Gasverunreinigungen
US7095774B2 (en) 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
JP4484144B2 (ja) 2004-07-06 2010-06-16 株式会社小松製作所 放電励起ガスレーザ装置
JP4704088B2 (ja) * 2005-03-31 2011-06-15 東京エレクトロン株式会社 プラズマ処理装置
US7471708B2 (en) 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
JP4728872B2 (ja) * 2005-05-19 2011-07-20 パナソニック株式会社 電動圧縮機
JP2007027331A (ja) * 2005-07-14 2007-02-01 Canon Inc 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
US7706424B2 (en) 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
MY163624A (en) 2009-12-31 2017-10-13 Specscan Sdn Bhd Low inductance integrel capacitor assembly
US9106210B2 (en) * 2013-03-14 2015-08-11 Analog Devices, Inc. Low-distortion programmable capacitor array
WO2016143105A1 (ja) * 2015-03-11 2016-09-15 ギガフォトン株式会社 エキシマレーザチャンバ装置
JP6162768B2 (ja) * 2015-10-05 2017-07-12 ファナック株式会社 補助電極を備えたガスレーザ発振器

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