TWI710185B - 用於在雷射腔室中調諧放電效能之設備 - Google Patents

用於在雷射腔室中調諧放電效能之設備 Download PDF

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Publication number
TWI710185B
TWI710185B TW108101459A TW108101459A TWI710185B TW I710185 B TWI710185 B TW I710185B TW 108101459 A TW108101459 A TW 108101459A TW 108101459 A TW108101459 A TW 108101459A TW I710185 B TWI710185 B TW I710185B
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TW
Taiwan
Prior art keywords
electrode
conductive elements
capacitors
length
row
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TW108101459A
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English (en)
Chinese (zh)
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TW201941508A (zh
Inventor
思齊 羅
理查 卡爾 烏傑茲道司奇
徐爽
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美商希瑪有限責任公司
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Publication of TW201941508A publication Critical patent/TW201941508A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • General Physics & Mathematics (AREA)
TW108101459A 2018-01-17 2019-01-15 用於在雷射腔室中調諧放電效能之設備 TWI710185B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201862618168P 2018-01-17 2018-01-17
US62/618,168 2018-01-17
US201862666310P 2018-05-03 2018-05-03
US62/666,310 2018-05-03

Publications (2)

Publication Number Publication Date
TW201941508A TW201941508A (zh) 2019-10-16
TWI710185B true TWI710185B (zh) 2020-11-11

Family

ID=67301522

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108101459A TWI710185B (zh) 2018-01-17 2019-01-15 用於在雷射腔室中調諧放電效能之設備

Country Status (6)

Country Link
US (1) US11349273B2 (https=)
JP (3) JP7169359B2 (https=)
KR (1) KR102445660B1 (https=)
CN (1) CN111656626B (https=)
TW (1) TWI710185B (https=)
WO (1) WO2019143433A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
CN116472652A (zh) * 2020-12-23 2023-07-21 极光先进雷射株式会社 放电电极、阳极的制造方法和电子器件的制造方法
WO2025153874A1 (en) * 2024-01-17 2025-07-24 Cymer, Llc Capacitor system for a radiation source of a lithographic apparatus

Citations (2)

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JPH02103972A (ja) * 1988-10-13 1990-04-17 Toshiba Corp パルスレーザ発振装置
US20060227839A1 (en) * 2005-03-31 2006-10-12 Cymer, Inc. Gas discharge laser output light beam parameter control

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JPS62181482A (ja) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> エキシマレ−ザ−装置
JPS62243379A (ja) * 1986-04-15 1987-10-23 Mitsubishi Electric Corp 気体パルス・レ−ザ装置
US5048041A (en) * 1988-01-15 1991-09-10 Cymer Laser Technologies Compact excimer laser
JPH0690048A (ja) 1990-10-12 1994-03-29 Coherent Inc パルス波ｃｏ２レーザー
JP2921969B2 (ja) * 1990-11-20 1999-07-19 株式会社東芝 ガスレーザ装置
JPH05167158A (ja) * 1991-12-16 1993-07-02 Komatsu Ltd エキシマレーザ装置
RU2064720C1 (ru) 1992-10-06 1996-07-27 Научно-производственное внедренческое предприятие "Лазерная лаборатория" Газовый лазер
US5686789A (en) * 1995-03-14 1997-11-11 Osram Sylvania Inc. Discharge device having cathode with micro hollow array
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JP3399517B2 (ja) * 1999-12-08 2003-04-21 ウシオ電機株式会社 紫外線を放出するガスレーザ装置
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JPH02103972A (ja) * 1988-10-13 1990-04-17 Toshiba Corp パルスレーザ発振装置
US20060227839A1 (en) * 2005-03-31 2006-10-12 Cymer, Inc. Gas discharge laser output light beam parameter control

Also Published As

Publication number Publication date
JP2021510926A (ja) 2021-04-30
JP7169359B2 (ja) 2022-11-10
JP7528178B2 (ja) 2024-08-05
KR102445660B1 (ko) 2022-09-20
JP2024153725A (ja) 2024-10-29
KR20200096650A (ko) 2020-08-12
TW201941508A (zh) 2019-10-16
JP7762769B2 (ja) 2025-10-30
US20210066880A1 (en) 2021-03-04
JP2023009091A (ja) 2023-01-19
WO2019143433A1 (en) 2019-07-25
CN111656626B (zh) 2023-07-14
CN111656626A (zh) 2020-09-11
US11349273B2 (en) 2022-05-31

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