KR102445660B1 - 레이저 챔버에서 방전 성능을 튜닝하기 위한 장치 - Google Patents

레이저 챔버에서 방전 성능을 튜닝하기 위한 장치 Download PDF

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KR102445660B1
KR102445660B1 KR1020207020894A KR20207020894A KR102445660B1 KR 102445660 B1 KR102445660 B1 KR 102445660B1 KR 1020207020894 A KR1020207020894 A KR 1020207020894A KR 20207020894 A KR20207020894 A KR 20207020894A KR 102445660 B1 KR102445660 B1 KR 102445660B1
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electrode
conductive elements
capacitors
extending
gap
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KR20200096650A (ko
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에드워드 쓰치 뤄
리차드 칼 우야즈도브스키
솽 쉬
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사이머 엘엘씨
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • General Physics & Mathematics (AREA)
KR1020207020894A 2018-01-17 2018-12-17 레이저 챔버에서 방전 성능을 튜닝하기 위한 장치 Active KR102445660B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862618168P 2018-01-17 2018-01-17
US62/618,168 2018-01-17
US201862666310P 2018-05-03 2018-05-03
US62/666,310 2018-05-03
PCT/US2018/065959 WO2019143433A1 (en) 2018-01-17 2018-12-17 Apparatus for tuning discharge performance in a laser chamber

Publications (2)

Publication Number Publication Date
KR20200096650A KR20200096650A (ko) 2020-08-12
KR102445660B1 true KR102445660B1 (ko) 2022-09-20

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KR1020207020894A Active KR102445660B1 (ko) 2018-01-17 2018-12-17 레이저 챔버에서 방전 성능을 튜닝하기 위한 장치

Country Status (6)

Country Link
US (1) US11349273B2 (https=)
JP (3) JP7169359B2 (https=)
KR (1) KR102445660B1 (https=)
CN (1) CN111656626B (https=)
TW (1) TWI710185B (https=)
WO (1) WO2019143433A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
CN116472652A (zh) * 2020-12-23 2023-07-21 极光先进雷射株式会社 放电电极、阳极的制造方法和电子器件的制造方法
WO2025153874A1 (en) * 2024-01-17 2025-07-24 Cymer, Llc Capacitor system for a radiation source of a lithographic apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060221540A1 (en) * 2005-03-31 2006-10-05 Shinji Himori Capacitive coupling plasma processing apparatus

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136447A1 (de) * 1981-09-14 1983-03-24 Kraftwerk Union AG, 4330 Mülheim Laser des te-typs, insbesondere hochenergielaser
JPS62181482A (ja) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> エキシマレ−ザ−装置
JPS62243379A (ja) * 1986-04-15 1987-10-23 Mitsubishi Electric Corp 気体パルス・レ−ザ装置
US5048041A (en) * 1988-01-15 1991-09-10 Cymer Laser Technologies Compact excimer laser
JPH02103972A (ja) 1988-10-13 1990-04-17 Toshiba Corp パルスレーザ発振装置
JPH0690048A (ja) 1990-10-12 1994-03-29 Coherent Inc パルス波ｃｏ２レーザー
JP2921969B2 (ja) * 1990-11-20 1999-07-19 株式会社東芝 ガスレーザ装置
JPH05167158A (ja) * 1991-12-16 1993-07-02 Komatsu Ltd エキシマレーザ装置
RU2064720C1 (ru) 1992-10-06 1996-07-27 Научно-производственное внедренческое предприятие "Лазерная лаборатория" Газовый лазер
US5686789A (en) * 1995-03-14 1997-11-11 Osram Sylvania Inc. Discharge device having cathode with micro hollow array
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6785316B1 (en) * 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
JP3399517B2 (ja) * 1999-12-08 2003-04-21 ウシオ電機株式会社 紫外線を放出するガスレーザ装置
MY120869A (en) * 2000-01-26 2005-11-30 Matsushita Electric Industrial Co Ltd Plasma treatment apparatus and method
JP2001274493A (ja) * 2000-03-27 2001-10-05 Nidek Co Ltd ガスレーザ装置
US7132123B2 (en) 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6914919B2 (en) 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6377595B1 (en) * 2000-09-08 2002-04-23 Komatsu Ltd. Peaking capacitor layout
DE20110048U1 (de) * 2001-06-18 2001-08-16 Lambda Physik AG, 37079 Göttingen Gasentladungslaser mit Mitteln zur Entfernung von Gasverunreinigungen
US7095774B2 (en) 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
JP4484144B2 (ja) 2004-07-06 2010-06-16 株式会社小松製作所 放電励起ガスレーザ装置
US7471708B2 (en) 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
JP4728872B2 (ja) * 2005-05-19 2011-07-20 パナソニック株式会社 電動圧縮機
JP2007027331A (ja) * 2005-07-14 2007-02-01 Canon Inc 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
US7706424B2 (en) 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
MY163624A (en) 2009-12-31 2017-10-13 Specscan Sdn Bhd Low inductance integrel capacitor assembly
US9106210B2 (en) * 2013-03-14 2015-08-11 Analog Devices, Inc. Low-distortion programmable capacitor array
WO2016143105A1 (ja) * 2015-03-11 2016-09-15 ギガフォトン株式会社 エキシマレーザチャンバ装置
JP6162768B2 (ja) * 2015-10-05 2017-07-12 ファナック株式会社 補助電極を備えたガスレーザ発振器

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060221540A1 (en) * 2005-03-31 2006-10-05 Shinji Himori Capacitive coupling plasma processing apparatus

Also Published As

Publication number Publication date
TWI710185B (zh) 2020-11-11
JP2021510926A (ja) 2021-04-30
JP7169359B2 (ja) 2022-11-10
JP7528178B2 (ja) 2024-08-05
JP2024153725A (ja) 2024-10-29
KR20200096650A (ko) 2020-08-12
TW201941508A (zh) 2019-10-16
JP7762769B2 (ja) 2025-10-30
US20210066880A1 (en) 2021-03-04
JP2023009091A (ja) 2023-01-19
WO2019143433A1 (en) 2019-07-25
CN111656626B (zh) 2023-07-14
CN111656626A (zh) 2020-09-11
US11349273B2 (en) 2022-05-31

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