CN111656626B - 用于在激光器腔室中调谐放电性能的装置 - Google Patents

用于在激光器腔室中调谐放电性能的装置 Download PDF

Info

Publication number
CN111656626B
CN111656626B CN201880086650.9A CN201880086650A CN111656626B CN 111656626 B CN111656626 B CN 111656626B CN 201880086650 A CN201880086650 A CN 201880086650A CN 111656626 B CN111656626 B CN 111656626B
Authority
CN
China
Prior art keywords
electrode
conductive elements
capacitors
length
row
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201880086650.9A
Other languages
English (en)
Chinese (zh)
Other versions
CN111656626A (zh
Inventor
E·S·罗
R·C·乌亚德沃斯基
徐爽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer LLC
Original Assignee
Cymer LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer LLC filed Critical Cymer LLC
Publication of CN111656626A publication Critical patent/CN111656626A/zh
Application granted granted Critical
Publication of CN111656626B publication Critical patent/CN111656626B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • General Physics & Mathematics (AREA)
CN201880086650.9A 2018-01-17 2018-12-17 用于在激光器腔室中调谐放电性能的装置 Active CN111656626B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862618168P 2018-01-17 2018-01-17
US62/618,168 2018-01-17
US201862666310P 2018-05-03 2018-05-03
US62/666,310 2018-05-03
PCT/US2018/065959 WO2019143433A1 (en) 2018-01-17 2018-12-17 Apparatus for tuning discharge performance in a laser chamber

Publications (2)

Publication Number Publication Date
CN111656626A CN111656626A (zh) 2020-09-11
CN111656626B true CN111656626B (zh) 2023-07-14

Family

ID=67301522

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880086650.9A Active CN111656626B (zh) 2018-01-17 2018-12-17 用于在激光器腔室中调谐放电性能的装置

Country Status (6)

Country Link
US (1) US11349273B2 (https=)
JP (3) JP7169359B2 (https=)
KR (1) KR102445660B1 (https=)
CN (1) CN111656626B (https=)
TW (1) TWI710185B (https=)
WO (1) WO2019143433A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
CN116472652A (zh) * 2020-12-23 2023-07-21 极光先进雷射株式会社 放电电极、阳极的制造方法和电子器件的制造方法
WO2025153874A1 (en) * 2024-01-17 2025-07-24 Cymer, Llc Capacitor system for a radiation source of a lithographic apparatus

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181482A (ja) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> エキシマレ−ザ−装置
JPS62243379A (ja) * 1986-04-15 1987-10-23 Mitsubishi Electric Corp 気体パルス・レ−ザ装置
JPH05167158A (ja) * 1991-12-16 1993-07-02 Komatsu Ltd エキシマレーザ装置
JP2001274493A (ja) * 2000-03-27 2001-10-05 Nidek Co Ltd ガスレーザ装置
US6377595B1 (en) * 2000-09-08 2002-04-23 Komatsu Ltd. Peaking capacitor layout
CN107146999A (zh) * 2015-10-05 2017-09-08 发那科株式会社 气体激光振荡器
CN107210574A (zh) * 2015-03-11 2017-09-26 极光先进雷射株式会社 准分子激光腔室装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136447A1 (de) * 1981-09-14 1983-03-24 Kraftwerk Union AG, 4330 Mülheim Laser des te-typs, insbesondere hochenergielaser
US5048041A (en) * 1988-01-15 1991-09-10 Cymer Laser Technologies Compact excimer laser
JPH02103972A (ja) 1988-10-13 1990-04-17 Toshiba Corp パルスレーザ発振装置
JPH0690048A (ja) 1990-10-12 1994-03-29 Coherent Inc パルス波ｃｏ２レーザー
JP2921969B2 (ja) * 1990-11-20 1999-07-19 株式会社東芝 ガスレーザ装置
RU2064720C1 (ru) 1992-10-06 1996-07-27 Научно-производственное внедренческое предприятие "Лазерная лаборатория" Газовый лазер
US5686789A (en) * 1995-03-14 1997-11-11 Osram Sylvania Inc. Discharge device having cathode with micro hollow array
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6785316B1 (en) * 1999-08-17 2004-08-31 Lambda Physik Ag Excimer or molecular laser with optimized spectral purity
JP3399517B2 (ja) * 1999-12-08 2003-04-21 ウシオ電機株式会社 紫外線を放出するガスレーザ装置
MY120869A (en) * 2000-01-26 2005-11-30 Matsushita Electric Industrial Co Ltd Plasma treatment apparatus and method
US7132123B2 (en) 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6914919B2 (en) 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
DE20110048U1 (de) * 2001-06-18 2001-08-16 Lambda Physik AG, 37079 Göttingen Gasentladungslaser mit Mitteln zur Entfernung von Gasverunreinigungen
US7095774B2 (en) 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
JP4484144B2 (ja) 2004-07-06 2010-06-16 株式会社小松製作所 放電励起ガスレーザ装置
JP4704088B2 (ja) * 2005-03-31 2011-06-15 東京エレクトロン株式会社 プラズマ処理装置
US7471708B2 (en) 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
JP4728872B2 (ja) * 2005-05-19 2011-07-20 パナソニック株式会社 電動圧縮機
JP2007027331A (ja) * 2005-07-14 2007-02-01 Canon Inc 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
US7706424B2 (en) 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
MY163624A (en) 2009-12-31 2017-10-13 Specscan Sdn Bhd Low inductance integrel capacitor assembly
US9106210B2 (en) * 2013-03-14 2015-08-11 Analog Devices, Inc. Low-distortion programmable capacitor array

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181482A (ja) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> エキシマレ−ザ−装置
JPS62243379A (ja) * 1986-04-15 1987-10-23 Mitsubishi Electric Corp 気体パルス・レ−ザ装置
JPH05167158A (ja) * 1991-12-16 1993-07-02 Komatsu Ltd エキシマレーザ装置
JP2001274493A (ja) * 2000-03-27 2001-10-05 Nidek Co Ltd ガスレーザ装置
US6377595B1 (en) * 2000-09-08 2002-04-23 Komatsu Ltd. Peaking capacitor layout
CN107210574A (zh) * 2015-03-11 2017-09-26 极光先进雷射株式会社 准分子激光腔室装置
CN107146999A (zh) * 2015-10-05 2017-09-08 发那科株式会社 气体激光振荡器

Also Published As

Publication number Publication date
TWI710185B (zh) 2020-11-11
JP2021510926A (ja) 2021-04-30
JP7169359B2 (ja) 2022-11-10
JP7528178B2 (ja) 2024-08-05
KR102445660B1 (ko) 2022-09-20
JP2024153725A (ja) 2024-10-29
KR20200096650A (ko) 2020-08-12
TW201941508A (zh) 2019-10-16
JP7762769B2 (ja) 2025-10-30
US20210066880A1 (en) 2021-03-04
JP2023009091A (ja) 2023-01-19
WO2019143433A1 (en) 2019-07-25
CN111656626A (zh) 2020-09-11
US11349273B2 (en) 2022-05-31

Similar Documents

Publication Publication Date Title
JP7762769B2 (ja) レーザチャンバにおける放電性能を調整する装置
JP7644203B2 (ja) レーザチャンバ内の電極の寿命を延ばす方法及び装置
US20250125572A1 (en) Electrode with engineered surface for improved energy performance
WO2024201226A1 (en) Laser chamber preionizer having acoustic scattering surface
KR102471783B1 (ko) 연장된 수명을 갖는 레이저 챔버 전극 및 이러한 전극을 갖는 레이저
EP4690390A1 (en) Laser chamber having discharge gap with acoustic control
TW202108791A (zh) 長壽命雷射腔電極
TWI839858B (zh) 用於調節雷射電極之方法及設備
WO2025120393A1 (en) Laser chamber with discharge system having acoustic scattering surfaces
TW202534445A (zh) 用於微影設備之輻射源之電容器系統
JP2024028316A (ja) ガス放電レーザチャンバのためのアンダーカット電極
Von Bergmann 5 Specially Designed Excimer Lasers

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant