JP2024099520A5 - - Google Patents
Info
- Publication number
- JP2024099520A5 JP2024099520A5 JP2024051402A JP2024051402A JP2024099520A5 JP 2024099520 A5 JP2024099520 A5 JP 2024099520A5 JP 2024051402 A JP2024051402 A JP 2024051402A JP 2024051402 A JP2024051402 A JP 2024051402A JP 2024099520 A5 JP2024099520 A5 JP 2024099520A5
- Authority
- JP
- Japan
- Prior art keywords
- groups
- metal
- silicon
- irradiated
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20185677A FI129480B (en) | 2018-08-10 | 2018-08-10 | Silanol-containing organic-inorganic hybrid coatings for high resolution patterning |
| FI20185677 | 2018-08-10 | ||
| JP2021531196A JP7833764B2 (ja) | 2018-08-10 | 2019-08-12 | 高解像度パターニングのためのシラノール含有有機‐非有機ハイブリッドコーティング |
| PCT/FI2019/050584 WO2020030855A2 (en) | 2018-08-10 | 2019-08-12 | Silanol-containing organic-inorganic hybrid coatings for high resolution patterning |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021531196A Division JP7833764B2 (ja) | 2018-08-10 | 2019-08-12 | 高解像度パターニングのためのシラノール含有有機‐非有機ハイブリッドコーティング |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024099520A JP2024099520A (ja) | 2024-07-25 |
| JP2024099520A5 true JP2024099520A5 (https=) | 2026-04-10 |
Family
ID=67874467
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021531196A Active JP7833764B2 (ja) | 2018-08-10 | 2019-08-12 | 高解像度パターニングのためのシラノール含有有機‐非有機ハイブリッドコーティング |
| JP2024051402A Pending JP2024099520A (ja) | 2018-08-10 | 2024-03-27 | 高解像度パターニングのためのシラノール含有有機‐非有機ハイブリッドコーティング |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021531196A Active JP7833764B2 (ja) | 2018-08-10 | 2019-08-12 | 高解像度パターニングのためのシラノール含有有機‐非有機ハイブリッドコーティング |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US12596304B2 (https=) |
| EP (1) | EP3834041A2 (https=) |
| JP (2) | JP7833764B2 (https=) |
| KR (1) | KR102861965B1 (https=) |
| CN (1) | CN113015940B (https=) |
| FI (1) | FI129480B (https=) |
| SG (1) | SG11202101348VA (https=) |
| TW (1) | TWI845539B (https=) |
| WO (1) | WO2020030855A2 (https=) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10796912B2 (en) | 2017-05-16 | 2020-10-06 | Lam Research Corporation | Eliminating yield impact of stochastics in lithography |
| KR102678588B1 (ko) | 2018-11-14 | 2024-06-27 | 램 리써치 코포레이션 | 차세대 리소그래피에서 유용한 하드 마스크들을 제조하기 위한 방법들 |
| US12211691B2 (en) | 2018-12-20 | 2025-01-28 | Lam Research Corporation | Dry development of resists |
| TW202514246A (zh) | 2019-03-18 | 2025-04-01 | 美商蘭姆研究公司 | 基板處理方法與設備 |
| US12062538B2 (en) | 2019-04-30 | 2024-08-13 | Lam Research Corporation | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
| TWI910974B (zh) | 2019-06-26 | 2026-01-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| JP7618601B2 (ja) | 2019-06-28 | 2025-01-21 | ラム リサーチ コーポレーション | 複数のパターニング放射吸収元素および／または垂直組成勾配を備えたフォトレジスト |
| CN114200776A (zh) | 2020-01-15 | 2022-03-18 | 朗姆研究公司 | 用于光刻胶粘附和剂量减少的底层 |
| US11669012B2 (en) * | 2020-02-21 | 2023-06-06 | Applied Materials, Inc. | Maskless lithography method to fabricate topographic substrate |
| CN115244664A (zh) | 2020-02-28 | 2022-10-25 | 朗姆研究公司 | 用于减少euv图案化缺陷的多层硬掩模 |
| WO2022010809A1 (en) | 2020-07-07 | 2022-01-13 | Lam Research Corporation | Integrated dry processes for patterning radiation photoresist patterning |
| JP2023535349A (ja) * | 2020-07-17 | 2023-08-17 | ラム リサーチ コーポレーション | 感光性ハイブリッド膜の形成方法 |
| CN114063389B (zh) | 2020-07-31 | 2026-04-07 | 华为技术有限公司 | 图案化材料和图案化薄膜 |
| WO2022103764A1 (en) | 2020-11-13 | 2022-05-19 | Lam Research Corporation | Process tool for dry removal of photoresist |
| US12577466B2 (en) | 2020-12-08 | 2026-03-17 | Lam Research Corporation | Photoresist development with organic vapor |
| KR102521626B1 (ko) * | 2021-12-20 | 2023-04-14 | 전남대학교산학협력단 | 주석 함유 실세스퀴옥산계 고분자 화합물 및 이를 포함하는 포토레지스트 조성물 |
| EP4490575A1 (en) * | 2022-03-10 | 2025-01-15 | TotalEnergies One Tech | Photoactivable hybrid organic-inorganic sol-gel resin for 3d printing |
| JP2023143802A (ja) * | 2022-03-25 | 2023-10-06 | 信越化学工業株式会社 | ケイ素含有メタルハードマスク形成用組成物及びパターン形成方法 |
| KR102725782B1 (ko) | 2022-07-01 | 2024-11-05 | 램 리써치 코포레이션 | 에칭 정지 억제 (etch stop deterrence) 를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상 |
| CN115290677B (zh) * | 2022-08-03 | 2023-08-22 | 广东聚德机械有限公司 | 一种基材的留白检测方法及涂布系统 |
| KR102847264B1 (ko) * | 2022-12-26 | 2025-08-18 | 전남대학교산학협력단 | 사이클로 실록산 기반의 고해상도 패터닝 조성물 |
| KR102894992B1 (ko) * | 2022-12-27 | 2025-12-10 | 전남대학교산학협력단 | 주석-사이클로 실록산 화합물 및 이를 포함하는 포토레지스트 조성물 |
| WO2024196643A1 (en) | 2023-03-17 | 2024-09-26 | Lam Research Corporation | Integration of dry development and etch processes for euv patterning in a single process chamber |
| KR20250034920A (ko) | 2023-07-27 | 2025-03-11 | 램 리써치 코포레이션 | 금속-함유 포토레지스트에 대한 올-인-원 건식 현상 |
| US20250062123A1 (en) * | 2023-08-17 | 2025-02-20 | Applied Materials, Inc. | Treatments for thin films used in photolithography |
| FI20236200A1 (en) * | 2023-10-27 | 2025-04-28 | Pibond Oy | Solution-processable organometallic complexes and their use |
| CN120122387B (zh) * | 2025-05-15 | 2025-07-18 | 华东理工大学 | 一种分子层沉积制备的可擦除有机无机杂化图案化薄膜 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4310678A (en) | 1980-12-02 | 1982-01-12 | Dow Corning Corporation | Liquid copolymeric organopolysiloxanes comprising SiO2 and method therefor |
| US4753855A (en) * | 1986-12-04 | 1988-06-28 | Dow Corning Corporation | Multilayer ceramic coatings from metal oxides for protection of electronic devices |
| US5085893A (en) | 1989-07-28 | 1992-02-04 | Dow Corning Corporation | Process for forming a coating on a substrate using a silsesquioxane resin |
| US4999397A (en) | 1989-07-28 | 1991-03-12 | Dow Corning Corporation | Metastable silane hydrolyzates and process for their preparation |
| US5010159A (en) * | 1989-09-01 | 1991-04-23 | Dow Corning Corporation | Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol |
| US5238787A (en) | 1991-04-22 | 1993-08-24 | Dow Corning Corporation | Photodelineable coatings from hydrogen silsesquioxane resin |
| JP3499032B2 (ja) * | 1995-02-02 | 2004-02-23 | ダウ コーニング アジア株式会社 | 放射線硬化性組成物、その硬化方法及びパターン形成方法 |
| JP3529953B2 (ja) * | 1996-09-03 | 2004-05-24 | 株式会社東芝 | 絶縁膜パターンの形成方法および感光性組成物 |
| US5776235A (en) * | 1996-10-04 | 1998-07-07 | Dow Corning Corporation | Thick opaque ceramic coatings |
| DE69806824T2 (de) * | 1997-02-07 | 2003-02-27 | Dow Corning Corp., Midland | Verfahren zur Herstellung von Überzügen auf Elektronikteilen |
| US5707681A (en) | 1997-02-07 | 1998-01-13 | Dow Corning Corporation | Method of producing coatings on electronic substrates |
| TWI299744B (en) * | 2001-06-22 | 2008-08-11 | Fuji Corp | Phthalocyanine compound, ink, ink for ink-jet recording, ink-jet recording method and method for improving resistance of color-imaging material to ozone gas |
| US20040058090A1 (en) | 2001-09-14 | 2004-03-25 | Carlo Waldfried | Low temperature UV pretreating of porous low-k materials |
| US7625687B2 (en) | 2003-07-03 | 2009-12-01 | Dow Corning Corporation | Silsesquioxane resin |
| WO2006049720A1 (en) * | 2004-11-02 | 2006-05-11 | Dow Corning Corporation | Resist composition |
| JP4553835B2 (ja) * | 2005-12-14 | 2010-09-29 | 信越化学工業株式会社 | 反射防止膜材料、及びこれを用いたパターン形成方法、基板 |
| JP5388331B2 (ja) * | 2006-09-29 | 2014-01-15 | 旭化成イーマテリアルズ株式会社 | ポリオルガノシロキサン組成物 |
| JP5149512B2 (ja) | 2007-02-02 | 2013-02-20 | 東レ・ダウコーニング株式会社 | 液状硬化性組成物、コーテイング方法、無機質基板および半導体装置 |
| TWI434891B (zh) * | 2007-02-22 | 2014-04-21 | 賽倫斯股份有限公司 | 積體電路用高矽含量矽氧烷聚合物 |
| JP4793592B2 (ja) * | 2007-11-22 | 2011-10-12 | 信越化学工業株式会社 | 金属酸化物含有膜形成用組成物、金属酸化物含有膜、金属酸化物含有膜形成基板及びこれを用いたパターン形成方法 |
| KR101690159B1 (ko) * | 2008-12-10 | 2016-12-27 | 다우 코닝 코포레이션 | 변환가능한 반사방지 코팅 |
| EP2373722A4 (en) * | 2008-12-10 | 2013-01-23 | Dow Corning | SILSESQUIOXAN RESINS |
| CN102439523B (zh) * | 2009-07-23 | 2015-01-07 | 道康宁公司 | 用于双重图案化的方法和材料 |
| US8163658B2 (en) * | 2009-08-24 | 2012-04-24 | International Business Machines Corporation | Multiple patterning using improved patternable low-k dielectric materials |
| US9093279B2 (en) * | 2011-07-20 | 2015-07-28 | Nissan Chemical Industries, Ltd. | Thin film forming composition for lithography containing titanium and silicon |
| EP2776511A1 (en) * | 2011-11-08 | 2014-09-17 | Dow Corning Corporation | Organopolysiloxane compositions and surface modification of cured silicone elastomers |
| JP5842841B2 (ja) | 2013-02-18 | 2016-01-13 | 信越化学工業株式会社 | パターン形成方法 |
| US9632411B2 (en) * | 2013-03-14 | 2017-04-25 | Applied Materials, Inc. | Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor |
| TWI490653B (zh) * | 2013-09-10 | 2015-07-01 | Chi Mei Corp | 正型感光性樹脂組成物及其圖案形成方法 |
| PL411195A1 (pl) | 2015-02-11 | 2015-11-09 | Uniwersytet Im. Adama Mickiewicza W Poznaniu | (Dimetylowinylogermoksy) heptapodstawione silseskwioksany oraz sposób ich otrzymywania |
| US9899218B2 (en) * | 2015-06-04 | 2018-02-20 | Shin-Etsu Chemical Co., Ltd. | Resist under layer film composition and patterning process |
| CN109415513B (zh) | 2016-06-16 | 2022-02-25 | 美国陶氏有机硅公司 | 富含硅的倍半硅氧烷树脂 |
| TW202238274A (zh) * | 2020-11-27 | 2022-10-01 | 日商日產化學股份有限公司 | 含有矽之阻劑下層膜形成用組成物 |
| EP4649356A1 (en) * | 2023-02-13 | 2025-11-19 | Brewer Science, Inc. | Underlayer and methods for euv lithography |
-
2018
- 2018-08-10 FI FI20185677A patent/FI129480B/en active IP Right Grant
-
2019
- 2019-08-08 TW TW108128318A patent/TWI845539B/zh active
- 2019-08-12 WO PCT/FI2019/050584 patent/WO2020030855A2/en not_active Ceased
- 2019-08-12 EP EP19765286.0A patent/EP3834041A2/en active Pending
- 2019-08-12 CN CN201980066944.XA patent/CN113015940B/zh active Active
- 2019-08-12 SG SG11202101348VA patent/SG11202101348VA/en unknown
- 2019-08-12 US US17/267,521 patent/US12596304B2/en active Active
- 2019-08-12 KR KR1020217007284A patent/KR102861965B1/ko active Active
- 2019-08-12 JP JP2021531196A patent/JP7833764B2/ja active Active
-
2024
- 2024-03-27 JP JP2024051402A patent/JP2024099520A/ja active Pending
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