DE69806824T2 - Verfahren zur Herstellung von Überzügen auf Elektronikteilen - Google Patents
Verfahren zur Herstellung von Überzügen auf ElektronikteilenInfo
- Publication number
- DE69806824T2 DE69806824T2 DE69806824T DE69806824T DE69806824T2 DE 69806824 T2 DE69806824 T2 DE 69806824T2 DE 69806824 T DE69806824 T DE 69806824T DE 69806824 T DE69806824 T DE 69806824T DE 69806824 T2 DE69806824 T2 DE 69806824T2
- Authority
- DE
- Germany
- Prior art keywords
- coatings
- production
- electronic parts
- electronic
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
- H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78940597A | 1997-02-07 | 1997-02-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69806824D1 DE69806824D1 (de) | 2002-09-05 |
DE69806824T2 true DE69806824T2 (de) | 2003-02-27 |
Family
ID=25147553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69806824T Expired - Fee Related DE69806824T2 (de) | 1997-02-07 | 1998-01-29 | Verfahren zur Herstellung von Überzügen auf Elektronikteilen |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0857705B1 (de) |
DE (1) | DE69806824T2 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI129480B (en) * | 2018-08-10 | 2022-03-15 | Pibond Oy | Silanol-containing organic-inorganic hybrid coatings for high-resolution patterning |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5238787A (en) * | 1991-04-22 | 1993-08-24 | Dow Corning Corporation | Photodelineable coatings from hydrogen silsesquioxane resin |
JP3174416B2 (ja) * | 1992-12-10 | 2001-06-11 | ダウ・コ−ニング・コ−ポレ−ション | 酸化ケイ素膜の形成方法 |
US5458912A (en) * | 1993-03-08 | 1995-10-17 | Dow Corning Corporation | Tamper-proof electronic coatings |
-
1998
- 1998-01-29 EP EP98300663A patent/EP0857705B1/de not_active Expired - Lifetime
- 1998-01-29 DE DE69806824T patent/DE69806824T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0857705A1 (de) | 1998-08-12 |
DE69806824D1 (de) | 2002-09-05 |
EP0857705B1 (de) | 2002-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69611391T2 (de) | Verfahren zur Herstellung von Xylol | |
DE59404573D1 (de) | Verfahren zur Herstellung von Mehrschichtlackierungen | |
DE69704964T2 (de) | Verfahren zur Herstellung von Acryloxypropylsilane | |
DE69823823D1 (de) | Verfahren zur Herstellung von beschichtete structurelle Gegenstände | |
DE69738355D1 (de) | Verfahren zur Herstellung von Beschichtungen | |
DE69418698T2 (de) | Verfahren zur Herstellung von Leiterplatten | |
DE59904603D1 (de) | Verfahren zur Herstellung von Schaltungsanordnungen | |
DE69705161D1 (de) | Verfahren zur Herstellung von Bisphenol | |
DE69408551D1 (de) | Verfahren zur Herstellung von bemaltem Silikon-Elastomer | |
DE69510596D1 (de) | Verfahren zur Herstellung von Organooxysilane | |
DE69411646D1 (de) | Verfahren zur Herstellung von Druckschablonen | |
DE59810937D1 (de) | Verfahren zur Herstellung von zylindrischen Beschichtungsträgern | |
DE59813367D1 (de) | Verfahren zur Herstellung von Druckerzeugnissen | |
DE69412553T2 (de) | Verfahren zur Herstellung von Druckschablonen | |
ATE204023T1 (de) | Enzymatische verfahren zur herstellung von (s)- cyanhydrinen | |
DE69822353D1 (de) | Verfahren zur Herstellung von Polybutylenterephthalat | |
DE69822281D1 (de) | Verfahren zur Herstellung von funktionellen Beschichtungen auf Gegenständen | |
DE69805742D1 (de) | Verfahren zur Herstellung von korrosionsbeständigen Bauteile | |
DE69803236D1 (de) | Verfahren zur Herstellung von Kupferphthalocyanin | |
DE69611331T2 (de) | Verfahren zur Herstellung von S-Phenyl-L-Cystein | |
DE69735750D1 (de) | Verfahren zur Herstellung von Leiterplatten | |
DE69603243D1 (de) | Verfahren zur Herstellung von Ethenylamiden | |
DE69723190D1 (de) | Verfahren zur Herstellung von Metallphthalocyanin | |
DE69806824T2 (de) | Verfahren zur Herstellung von Überzügen auf Elektronikteilen | |
DE59813937D1 (de) | Verfahren zur herstellung von biotin |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |