JP2023528099A5 - - Google Patents

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Publication number
JP2023528099A5
JP2023528099A5 JP2021572617A JP2021572617A JP2023528099A5 JP 2023528099 A5 JP2023528099 A5 JP 2023528099A5 JP 2021572617 A JP2021572617 A JP 2021572617A JP 2021572617 A JP2021572617 A JP 2021572617A JP 2023528099 A5 JP2023528099 A5 JP 2023528099A5
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JP2021572617A
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JP2023528099A (ja
JP7666782B2 (ja
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Priority claimed from PCT/CN2020/092806 external-priority patent/WO2021237552A1/zh
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JP2021572617A 2020-05-28 2021-03-15 フォトマスク、露光方法及びタッチパネル Active JP7666782B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CNPCT/CN2020/092806 2020-05-28
PCT/CN2020/092806 WO2021237552A1 (zh) 2020-05-28 2020-05-28 掩膜板、曝光方法和触控面板
PCT/CN2021/080801 WO2021238342A1 (zh) 2020-05-28 2021-03-15 掩模版、曝光方法和触控面板

Publications (3)

Publication Number Publication Date
JP2023528099A JP2023528099A (ja) 2023-07-04
JP2023528099A5 true JP2023528099A5 (https=) 2024-03-21
JP7666782B2 JP7666782B2 (ja) 2025-04-22

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JP2021572617A Active JP7666782B2 (ja) 2020-05-28 2021-03-15 フォトマスク、露光方法及びタッチパネル

Country Status (5)

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US (2) US12050397B2 (https=)
EP (1) EP4009103A4 (https=)
JP (1) JP7666782B2 (https=)
CN (1) CN114127631B (https=)
WO (2) WO2021237552A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115047708A (zh) * 2022-07-01 2022-09-13 安徽精卓光显技术有限责任公司 一种四边形网格光罩及利用四边形网格光罩制备导电膜模具的方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
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JPS6318352A (ja) * 1986-07-11 1988-01-26 Agency Of Ind Science & Technol 分割露光用マスク
US5364718A (en) * 1988-09-06 1994-11-15 Fujitsu Limited Method of exposing patttern of semiconductor devices and stencil mask for carrying out same
JPH05136020A (ja) * 1991-11-11 1993-06-01 Fujitsu Ltd 半導体装置の露光方法
KR100253580B1 (ko) * 1996-10-02 2000-04-15 김영환 스티칭 노광 공정에 사용되는 마스크
JP2007318352A (ja) 2006-05-24 2007-12-06 Asahi Kasei Electronics Co Ltd 磁電変換スイッチ
JP2010113268A (ja) 2008-11-10 2010-05-20 Kyodo Printing Co Ltd シールド材の製造方法及びフォトマスク
JP5497340B2 (ja) * 2009-05-29 2014-05-21 富士フイルム株式会社 パターン露光方法及び導電膜の製造方法
JP2011044465A (ja) * 2009-08-19 2011-03-03 Renesas Electronics Corp パターン露光方法
CN103853380B (zh) * 2012-12-03 2017-04-12 Lg伊诺特有限公司 电极构件及包括该电极构件的触屏
CN102981356A (zh) * 2012-12-14 2013-03-20 京东方科技集团股份有限公司 一种减小掩膜版拼接误差的方法
US20140307178A1 (en) * 2013-04-12 2014-10-16 Shenzhen O-Film Tech Co., Ltd Touch screen sensing module, manufacturing method thereof and display device
TW201512917A (zh) * 2013-09-23 2015-04-01 Wintek Corp 觸控面板
US9335876B2 (en) * 2014-03-18 2016-05-10 Stmicroelectronics Asia Pacific Pte Ltd Cross-shaped touchscreen pattern
CN104808451B (zh) 2015-05-15 2017-07-18 合肥京东方光电科技有限公司 一种对位曝光方法
CN105136020B (zh) 2015-05-29 2017-11-10 北方民族大学 一种对比式抗干扰微动阶梯平面反射镜激光干涉仪及标定方法和测量方法
CN106200254B (zh) * 2016-07-11 2019-06-25 京东方科技集团股份有限公司 掩膜版及掩膜曝光系统、拼接曝光方法、基板
DE102017105402A1 (de) 2017-03-14 2018-09-20 Infineon Technologies Ag Retikel und belichtungsverfahren, das eine projektion eines retikelmusters in benachbarte belichtungsfelder einschliesst
KR102547257B1 (ko) * 2017-07-25 2023-06-23 도판 인사츠 가부시키가이샤 노광 장치 및 노광 방법
CN107957821B (zh) * 2018-01-02 2021-04-20 京东方科技集团股份有限公司 触控基板及其制备方法、显示装置
CN108761995A (zh) * 2018-06-21 2018-11-06 京东方科技集团股份有限公司 掩模板、曝光方法和触控面板
CN110515484A (zh) 2019-07-12 2019-11-29 深圳市翰博士科技有限公司 一种防止莫瑞效应的触控面板及其制作方法
KR102916614B1 (ko) * 2019-08-12 2026-01-22 엘지디스플레이 주식회사 터치 디스플레이 장치
CN210573180U (zh) * 2019-12-04 2020-05-19 京东方科技集团股份有限公司 掩模板
CN111025842B (zh) * 2019-12-26 2023-06-20 云谷（固安）科技有限公司 掩膜板、拼接曝光方法及基板

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