JP2023015808A - 光源装置、露光装置、及び物品の製造方法 - Google Patents

光源装置、露光装置、及び物品の製造方法 Download PDF

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Publication number
JP2023015808A
JP2023015808A JP2021119815A JP2021119815A JP2023015808A JP 2023015808 A JP2023015808 A JP 2023015808A JP 2021119815 A JP2021119815 A JP 2021119815A JP 2021119815 A JP2021119815 A JP 2021119815A JP 2023015808 A JP2023015808 A JP 2023015808A
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JP
Japan
Prior art keywords
leds
current
light
light emission
emission amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021119815A
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English (en)
Japanese (ja)
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JP2023015808A5 (https=
Inventor
和之 春見
Kazuyuki Harumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2021119815A priority Critical patent/JP2023015808A/ja
Priority to KR1020220086362A priority patent/KR102900827B1/ko
Priority to CN202210835115.7A priority patent/CN115639728A/zh
Publication of JP2023015808A publication Critical patent/JP2023015808A/ja
Publication of JP2023015808A5 publication Critical patent/JP2023015808A5/ja
Priority to KR1020250191376A priority patent/KR20260002384A/ko
Priority to JP2026005023A priority patent/JP2026063175A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Led Device Packages (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
JP2021119815A 2021-07-20 2021-07-20 光源装置、露光装置、及び物品の製造方法 Pending JP2023015808A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2021119815A JP2023015808A (ja) 2021-07-20 2021-07-20 光源装置、露光装置、及び物品の製造方法
KR1020220086362A KR102900827B1 (ko) 2021-07-20 2022-07-13 광원 장치, 노광 장치, 및 물품의 제조 방법
CN202210835115.7A CN115639728A (zh) 2021-07-20 2022-07-15 光源装置、曝光装置以及物品的制造方法
KR1020250191376A KR20260002384A (ko) 2021-07-20 2025-12-05 광원 장치, 노광 장치, 및 물품의 제조 방법
JP2026005023A JP2026063175A (ja) 2021-07-20 2026-01-15 光源装置、露光装置、及び物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021119815A JP2023015808A (ja) 2021-07-20 2021-07-20 光源装置、露光装置、及び物品の製造方法

Related Child Applications (1)

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JP2026005023A Division JP2026063175A (ja) 2021-07-20 2026-01-15 光源装置、露光装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2023015808A true JP2023015808A (ja) 2023-02-01
JP2023015808A5 JP2023015808A5 (https=) 2024-07-09

Family

ID=84939487

Family Applications (2)

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JP2021119815A Pending JP2023015808A (ja) 2021-07-20 2021-07-20 光源装置、露光装置、及び物品の製造方法
JP2026005023A Pending JP2026063175A (ja) 2021-07-20 2026-01-15 光源装置、露光装置、及び物品の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2026005023A Pending JP2026063175A (ja) 2021-07-20 2026-01-15 光源装置、露光装置、及び物品の製造方法

Country Status (3)

Country Link
JP (2) JP2023015808A (https=)
KR (2) KR102900827B1 (https=)
CN (1) CN115639728A (https=)

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004342633A (ja) * 2003-05-13 2004-12-02 Nikon Corp 露光装置、照明装置及び露光方法
US20080315132A1 (en) * 2004-03-29 2008-12-25 Platsch Hans G Flat Uv Light Source
JP2009289622A (ja) * 2008-05-29 2009-12-10 Sharp Corp 照明装置
WO2010119872A1 (ja) * 2009-04-13 2010-10-21 パナソニック電工株式会社 Ｌｅｄユニット
JP2011146646A (ja) * 2010-01-18 2011-07-28 Panasonic Electric Works Co Ltd Ｌｅｄユニット
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
JP2011165509A (ja) * 2010-02-10 2011-08-25 Moritex Corp Ｌｅｄ照明装置
KR20130114032A (ko) * 2013-08-30 2013-10-16 (주)세미솔루션 광 발생 장치 및 그의 제어 방법
KR20170091905A (ko) * 2016-02-02 2017-08-10 조남직 노광용 광원모듈 유닛 및 그 광원모듈 유닛이 구비된 노광장치
JP2019016757A (ja) * 2017-07-11 2019-01-31 ファナック株式会社 Ｌｄモジュール冷却装置及びレーザ装置
US20190157508A1 (en) * 2016-05-17 2019-05-23 The University Of Hong Kong Light-emitting diodes (leds) with monolithically-integrated photodetectors for in situ real-time intensity monitoring
KR20200048500A (ko) * 2018-10-30 2020-05-08 주식회사 에이아이오코리아 Uv led 광원을 이용한 노광장치
JP2020122921A (ja) * 2019-01-31 2020-08-13 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8536790B2 (en) * 2008-12-26 2013-09-17 Mitsubishi Electric Corporation LED lighting device and head lamp LED lighting device
WO2012095889A1 (ja) * 2011-01-11 2012-07-19 三菱電機株式会社 Ｌｅｄ点灯装置
JP5325907B2 (ja) * 2011-02-22 2013-10-23 東京エレクトロン株式会社 局所露光装置
JP2013104934A (ja) * 2011-11-11 2013-05-30 Tokyo Electron Ltd 露光装置及び露光方法
JP2015214092A (ja) * 2014-05-12 2015-12-03 キヤノン株式会社 画像形成装置、露光器、及び画像形成方法
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
JP7210249B2 (ja) * 2018-11-30 2023-01-23 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004342633A (ja) * 2003-05-13 2004-12-02 Nikon Corp 露光装置、照明装置及び露光方法
US20080315132A1 (en) * 2004-03-29 2008-12-25 Platsch Hans G Flat Uv Light Source
JP2009289622A (ja) * 2008-05-29 2009-12-10 Sharp Corp 照明装置
WO2010119872A1 (ja) * 2009-04-13 2010-10-21 パナソニック電工株式会社 Ｌｅｄユニット
JP2011146646A (ja) * 2010-01-18 2011-07-28 Panasonic Electric Works Co Ltd Ｌｅｄユニット
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
JP2011165509A (ja) * 2010-02-10 2011-08-25 Moritex Corp Ｌｅｄ照明装置
KR20130114032A (ko) * 2013-08-30 2013-10-16 (주)세미솔루션 광 발생 장치 및 그의 제어 방법
KR20170091905A (ko) * 2016-02-02 2017-08-10 조남직 노광용 광원모듈 유닛 및 그 광원모듈 유닛이 구비된 노광장치
US20190157508A1 (en) * 2016-05-17 2019-05-23 The University Of Hong Kong Light-emitting diodes (leds) with monolithically-integrated photodetectors for in situ real-time intensity monitoring
JP2019016757A (ja) * 2017-07-11 2019-01-31 ファナック株式会社 Ｌｄモジュール冷却装置及びレーザ装置
KR20200048500A (ko) * 2018-10-30 2020-05-08 주식회사 에이아이오코리아 Uv led 광원을 이용한 노광장치
JP2020122921A (ja) * 2019-01-31 2020-08-13 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Also Published As

Publication number Publication date
KR102900827B1 (ko) 2025-12-15
CN115639728A (zh) 2023-01-24
KR20260002384A (ko) 2026-01-06
KR20230014061A (ko) 2023-01-27
JP2026063175A (ja) 2026-04-10

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