KR102900827B1 - 광원 장치, 노광 장치, 및 물품의 제조 방법 - Google Patents

광원 장치, 노광 장치, 및 물품의 제조 방법

Info

Publication number
KR102900827B1
KR102900827B1 KR1020220086362A KR20220086362A KR102900827B1 KR 102900827 B1 KR102900827 B1 KR 102900827B1 KR 1020220086362 A KR1020220086362 A KR 1020220086362A KR 20220086362 A KR20220086362 A KR 20220086362A KR 102900827 B1 KR102900827 B1 KR 102900827B1
Authority
KR
South Korea
Prior art keywords
light
leds
current
emission amount
light emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020220086362A
Other languages
English (en)
Korean (ko)
Other versions
KR20230014061A (ko
Inventor
카즈유키 카스미
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230014061A publication Critical patent/KR20230014061A/ko
Priority to KR1020250191376A priority Critical patent/KR20260002384A/ko
Application granted granted Critical
Publication of KR102900827B1 publication Critical patent/KR102900827B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Led Device Packages (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
KR1020220086362A 2021-07-20 2022-07-13 광원 장치, 노광 장치, 및 물품의 제조 방법 Active KR102900827B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020250191376A KR20260002384A (ko) 2021-07-20 2025-12-05 광원 장치, 노광 장치, 및 물품의 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021119815A JP2023015808A (ja) 2021-07-20 2021-07-20 光源装置、露光装置、及び物品の製造方法
JPJP-P-2021-119815 2021-07-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020250191376A Division KR20260002384A (ko) 2021-07-20 2025-12-05 광원 장치, 노광 장치, 및 물품의 제조 방법

Publications (2)

Publication Number Publication Date
KR20230014061A KR20230014061A (ko) 2023-01-27
KR102900827B1 true KR102900827B1 (ko) 2025-12-15

Family

ID=84939487

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020220086362A Active KR102900827B1 (ko) 2021-07-20 2022-07-13 광원 장치, 노광 장치, 및 물품의 제조 방법
KR1020250191376A Pending KR20260002384A (ko) 2021-07-20 2025-12-05 광원 장치, 노광 장치, 및 물품의 제조 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020250191376A Pending KR20260002384A (ko) 2021-07-20 2025-12-05 광원 장치, 노광 장치, 및 물품의 제조 방법

Country Status (3)

Country Link
JP (2) JP2023015808A (https=)
KR (2) KR102900827B1 (https=)
CN (1) CN115639728A (https=)

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004342633A (ja) * 2003-05-13 2004-12-02 Nikon Corp 露光装置、照明装置及び露光方法
DE102004015700A1 (de) * 2004-03-29 2005-11-03 Platsch Gmbh & Co.Kg Flächige UV-Lichtquelle
JP2009289622A (ja) * 2008-05-29 2009-12-10 Sharp Corp 照明装置
US8536790B2 (en) * 2008-12-26 2013-09-17 Mitsubishi Electric Corporation LED lighting device and head lamp LED lighting device
US8592830B2 (en) * 2009-04-13 2013-11-26 Panasonic Corporation LED unit
JP5421799B2 (ja) * 2010-01-18 2014-02-19 パナソニック株式会社 Ｌｅｄユニット
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
JP2011165509A (ja) * 2010-02-10 2011-08-25 Moritex Corp Ｌｅｄ照明装置
WO2012095889A1 (ja) * 2011-01-11 2012-07-19 三菱電機株式会社 Ｌｅｄ点灯装置
JP5325907B2 (ja) * 2011-02-22 2013-10-23 東京エレクトロン株式会社 局所露光装置
JP2013104934A (ja) * 2011-11-11 2013-05-30 Tokyo Electron Ltd 露光装置及び露光方法
KR20130114032A (ko) * 2013-08-30 2013-10-16 (주)세미솔루션 광 발생 장치 및 그의 제어 방법
JP2015214092A (ja) * 2014-05-12 2015-12-03 キヤノン株式会社 画像形成装置、露光器、及び画像形成方法
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
KR101820041B1 (ko) * 2016-02-02 2018-01-18 조남직 노광용 광원모듈 유닛 및 그 광원모듈 유닛이 구비된 노광장치
KR102672299B1 (ko) * 2016-05-17 2024-06-04 더 유니버시티 오브 홍콩 자체(in situ) 실시간 강도 모니터링을 위한 일체형으로 통합된 광감지기들을 구비한 발광 다이오드(LED)
JP6636996B2 (ja) * 2017-07-11 2020-01-29 ファナック株式会社 Ｌｄモジュール冷却装置及びレーザ装置
KR102148856B1 (ko) * 2018-10-30 2020-08-27 주식회사 에이아이오코리아 Uv led 광원을 이용한 노광장치
JP7210249B2 (ja) * 2018-11-30 2023-01-23 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法
JP7267761B2 (ja) * 2019-01-31 2023-05-02 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Also Published As

Publication number Publication date
CN115639728A (zh) 2023-01-24
KR20260002384A (ko) 2026-01-06
KR20230014061A (ko) 2023-01-27
JP2023015808A (ja) 2023-02-01
JP2026063175A (ja) 2026-04-10

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