CN115639728A - 光源装置、曝光装置以及物品的制造方法 - Google Patents

光源装置、曝光装置以及物品的制造方法 Download PDF

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Publication number
CN115639728A
CN115639728A CN202210835115.7A CN202210835115A CN115639728A CN 115639728 A CN115639728 A CN 115639728A CN 202210835115 A CN202210835115 A CN 202210835115A CN 115639728 A CN115639728 A CN 115639728A
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CN
China
Prior art keywords
leds
light
current
current value
light emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210835115.7A
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English (en)
Chinese (zh)
Inventor
春见和之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN115639728A publication Critical patent/CN115639728A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Led Device Packages (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
CN202210835115.7A 2021-07-20 2022-07-15 光源装置、曝光装置以及物品的制造方法 Pending CN115639728A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021119815A JP2023015808A (ja) 2021-07-20 2021-07-20 光源装置、露光装置、及び物品の製造方法
JP2021-119815 2021-07-20

Publications (1)

Publication Number Publication Date
CN115639728A true CN115639728A (zh) 2023-01-24

Family

ID=84939487

Family Applications (1)

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CN202210835115.7A Pending CN115639728A (zh) 2021-07-20 2022-07-15 光源装置、曝光装置以及物品的制造方法

Country Status (3)

Country Link
JP (2) JP2023015808A (https=)
KR (2) KR102900827B1 (https=)
CN (1) CN115639728A (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004342633A (ja) * 2003-05-13 2004-12-02 Nikon Corp 露光装置、照明装置及び露光方法
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
CN102265706A (zh) * 2008-12-26 2011-11-30 三菱电机株式会社 Led点亮装置及前灯用led点亮装置
KR20130052520A (ko) * 2011-11-11 2013-05-22 도쿄엘렉트론가부시키가이샤 노광 장치 및 노광 방법
CN103238377A (zh) * 2011-01-11 2013-08-07 三菱电机株式会社 Led点亮装置
JP2015214092A (ja) * 2014-05-12 2015-12-03 キヤノン株式会社 画像形成装置、露光器、及び画像形成方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004015700A1 (de) * 2004-03-29 2005-11-03 Platsch Gmbh & Co.Kg Flächige UV-Lichtquelle
JP2009289622A (ja) * 2008-05-29 2009-12-10 Sharp Corp 照明装置
US8592830B2 (en) * 2009-04-13 2013-11-26 Panasonic Corporation LED unit
JP5421799B2 (ja) * 2010-01-18 2014-02-19 パナソニック株式会社 Ｌｅｄユニット
JP2011165509A (ja) * 2010-02-10 2011-08-25 Moritex Corp Ｌｅｄ照明装置
JP5325907B2 (ja) * 2011-02-22 2013-10-23 東京エレクトロン株式会社 局所露光装置
KR20130114032A (ko) * 2013-08-30 2013-10-16 (주)세미솔루션 광 발생 장치 및 그의 제어 방법
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
KR101820041B1 (ko) * 2016-02-02 2018-01-18 조남직 노광용 광원모듈 유닛 및 그 광원모듈 유닛이 구비된 노광장치
KR102672299B1 (ko) * 2016-05-17 2024-06-04 더 유니버시티 오브 홍콩 자체(in situ) 실시간 강도 모니터링을 위한 일체형으로 통합된 광감지기들을 구비한 발광 다이오드(LED)
JP6636996B2 (ja) * 2017-07-11 2020-01-29 ファナック株式会社 Ｌｄモジュール冷却装置及びレーザ装置
KR102148856B1 (ko) * 2018-10-30 2020-08-27 주식회사 에이아이오코리아 Uv led 광원을 이용한 노광장치
JP7210249B2 (ja) * 2018-11-30 2023-01-23 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法
JP7267761B2 (ja) * 2019-01-31 2023-05-02 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004342633A (ja) * 2003-05-13 2004-12-02 Nikon Corp 露光装置、照明装置及び露光方法
CN102265706A (zh) * 2008-12-26 2011-11-30 三菱电机株式会社 Led点亮装置及前灯用led点亮装置
WO2011096365A1 (ja) * 2010-02-05 2011-08-11 日本精工株式会社 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
CN103238377A (zh) * 2011-01-11 2013-08-07 三菱电机株式会社 Led点亮装置
KR20130052520A (ko) * 2011-11-11 2013-05-22 도쿄엘렉트론가부시키가이샤 노광 장치 및 노광 방법
JP2015214092A (ja) * 2014-05-12 2015-12-03 キヤノン株式会社 画像形成装置、露光器、及び画像形成方法

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KR102900827B1 (ko) 2025-12-15
KR20260002384A (ko) 2026-01-06
KR20230014061A (ko) 2023-01-27
JP2023015808A (ja) 2023-02-01
JP2026063175A (ja) 2026-04-10

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