JP2022537038A5 - - Google Patents
Info
- Publication number
- JP2022537038A5 JP2022537038A5 JP2021575229A JP2021575229A JP2022537038A5 JP 2022537038 A5 JP2022537038 A5 JP 2022537038A5 JP 2021575229 A JP2021575229 A JP 2021575229A JP 2021575229 A JP2021575229 A JP 2021575229A JP 2022537038 A5 JP2022537038 A5 JP 2022537038A5
- Authority
- JP
- Japan
- Prior art keywords
- support stand
- outer diameter
- circuit board
- substrate
- ceramic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024228084A JP7789172B2 (ja) | 2019-06-18 | 2024-12-25 | 基板処理システム用の縮径キャリアリングハードウェア |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962862814P | 2019-06-18 | 2019-06-18 | |
| US62/862,814 | 2019-06-18 | ||
| PCT/US2020/037699 WO2020257095A1 (en) | 2019-06-18 | 2020-06-15 | Reduced diameter carrier ring hardware for substrate processing systems |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024228084A Division JP7789172B2 (ja) | 2019-06-18 | 2024-12-25 | 基板処理システム用の縮径キャリアリングハードウェア |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022537038A JP2022537038A (ja) | 2022-08-23 |
| JP2022537038A5 true JP2022537038A5 (https=) | 2023-05-31 |
| JP7612618B2 JP7612618B2 (ja) | 2025-01-14 |
Family
ID=74040878
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021575229A Active JP7612618B2 (ja) | 2019-06-18 | 2020-06-15 | 基板処理システム用の縮径キャリアリングハードウェア |
| JP2024228084A Active JP7789172B2 (ja) | 2019-06-18 | 2024-12-25 | 基板処理システム用の縮径キャリアリングハードウェア |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024228084A Active JP7789172B2 (ja) | 2019-06-18 | 2024-12-25 | 基板処理システム用の縮径キャリアリングハードウェア |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US12480210B2 (https=) |
| EP (1) | EP3987081A4 (https=) |
| JP (2) | JP7612618B2 (https=) |
| KR (1) | KR102916789B1 (https=) |
| CN (2) | CN114008738B (https=) |
| TW (2) | TWI849145B (https=) |
| WO (1) | WO2020257095A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220117155A (ko) * | 2021-02-16 | 2022-08-23 | 에이에스엠 아이피 홀딩 비.브이. | 흐름 제어 링을 갖는 기판 처리 장치 및 기판 처리 방법 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0945624A (ja) * | 1995-07-27 | 1997-02-14 | Tokyo Electron Ltd | 枚葉式の熱処理装置 |
| KR100292410B1 (ko) | 1998-09-23 | 2001-06-01 | 윤종용 | 불순물 오염이 억제된 반도체 제조용 반응 챔버 |
| US6344105B1 (en) * | 1999-06-30 | 2002-02-05 | Lam Research Corporation | Techniques for improving etch rate uniformity |
| US6257168B1 (en) | 1999-06-30 | 2001-07-10 | Lam Research Corporation | Elevated stationary uniformity ring design |
| US6383931B1 (en) * | 2000-02-11 | 2002-05-07 | Lam Research Corporation | Convertible hot edge ring to improve low-K dielectric etch |
| JP2001313329A (ja) * | 2000-04-28 | 2001-11-09 | Applied Materials Inc | 半導体製造装置におけるウェハ支持装置 |
| US6475336B1 (en) | 2000-10-06 | 2002-11-05 | Lam Research Corporation | Electrostatically clamped edge ring for plasma processing |
| JP4035627B2 (ja) | 2001-12-13 | 2008-01-23 | 東京エレクトロン株式会社 | プラズマ処理装置及びフォーカスリング機構 |
| JP4209618B2 (ja) * | 2002-02-05 | 2009-01-14 | 東京エレクトロン株式会社 | プラズマ処理装置及びリング部材 |
| JP2004221266A (ja) | 2003-01-14 | 2004-08-05 | Ngk Insulators Ltd | 半導体製造装置用リング部材 |
| KR100520229B1 (ko) * | 2004-03-11 | 2005-10-11 | 삼성전자주식회사 | 반도체 식각장치 |
| JP4336320B2 (ja) * | 2005-02-25 | 2009-09-30 | キヤノンアネルバ株式会社 | ウエハホルダ |
| US20060219172A1 (en) | 2005-04-05 | 2006-10-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | PVD equipment and electrode and deposition ring thereof |
| US20070032081A1 (en) * | 2005-08-08 | 2007-02-08 | Jeremy Chang | Edge ring assembly with dielectric spacer ring |
| KR101402233B1 (ko) * | 2008-01-23 | 2014-05-30 | (주)소슬 | 플라즈마 식각 장치 |
| JP5281811B2 (ja) * | 2008-03-13 | 2013-09-04 | 東京エレクトロン株式会社 | プラズマ処理用環状部品、プラズマ処理装置、及び外側環状部材 |
| WO2011058851A1 (ja) | 2009-11-16 | 2011-05-19 | シャープ株式会社 | ドライエッチング装置およびドライエッチング方法 |
| US8844106B2 (en) * | 2011-11-10 | 2014-09-30 | Lam Research Corporation | Installation fixture for elastomer bands and methods of using the same |
| US9315899B2 (en) * | 2012-06-15 | 2016-04-19 | Novellus Systems, Inc. | Contoured showerhead for improved plasma shaping and control |
| JP6853038B2 (ja) * | 2013-06-26 | 2021-03-31 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Icpプラズマ処理チャンバ内における高収率・基板最端部欠陥低減のための単一リング設計 |
| JP6169040B2 (ja) * | 2014-05-12 | 2017-07-26 | 東京エレクトロン株式会社 | プラズマ処理装置の上部電極構造、プラズマ処理装置、及びプラズマ処理装置の運用方法 |
| US20160289827A1 (en) * | 2015-03-31 | 2016-10-06 | Lam Research Corporation | Plasma processing systems and structures having sloped confinement rings |
| US20170002465A1 (en) | 2015-06-30 | 2017-01-05 | Lam Research Corporation | Separation of Plasma Suppression and Wafer Edge to Improve Edge Film Thickness Uniformity |
| US10854492B2 (en) * | 2015-08-18 | 2020-12-01 | Lam Research Corporation | Edge ring assembly for improving feature profile tilting at extreme edge of wafer |
| US10541117B2 (en) | 2015-10-29 | 2020-01-21 | Lam Research Corporation | Systems and methods for tilting a wafer for achieving deposition uniformity |
| US10483092B2 (en) * | 2016-04-13 | 2019-11-19 | Lam Research Corporation | Baffle plate and showerhead assemblies and corresponding manufacturing method |
| US10340171B2 (en) * | 2016-05-18 | 2019-07-02 | Lam Research Corporation | Permanent secondary erosion containment for electrostatic chuck bonds |
| KR102641441B1 (ko) | 2016-09-28 | 2024-02-29 | 삼성전자주식회사 | 링 어셈블리 및 이를 포함하는 척 어셈블리 |
| US10923385B2 (en) * | 2016-11-03 | 2021-02-16 | Lam Research Corporation | Carrier plate for use in plasma processing systems |
| US20180182635A1 (en) * | 2016-12-27 | 2018-06-28 | Tokyo Electron Limited | Focus ring and substrate processing apparatus |
| KR102417931B1 (ko) * | 2017-05-30 | 2022-07-06 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 장치 및 이를 포함하는 기판 처리 장치 |
| WO2019103722A1 (en) * | 2017-11-21 | 2019-05-31 | Lam Research Corporation | Bottom and middle edge rings |
-
2020
- 2020-06-15 CN CN202080045297.7A patent/CN114008738B/zh active Active
- 2020-06-15 EP EP20825823.6A patent/EP3987081A4/en active Pending
- 2020-06-15 US US17/619,500 patent/US12480210B2/en active Active
- 2020-06-15 WO PCT/US2020/037699 patent/WO2020257095A1/en not_active Ceased
- 2020-06-15 CN CN202410549950.3A patent/CN118507324A/zh active Pending
- 2020-06-15 KR KR1020227001373A patent/KR102916789B1/ko active Active
- 2020-06-15 JP JP2021575229A patent/JP7612618B2/ja active Active
- 2020-06-16 TW TW109120200A patent/TWI849145B/zh active
- 2020-06-16 TW TW113121430A patent/TW202447855A/zh unknown
-
2024
- 2024-12-25 JP JP2024228084A patent/JP7789172B2/ja active Active
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