JP2022521593A - 黒色光起電力デバイス - Google Patents
黒色光起電力デバイス Download PDFInfo
- Publication number
- JP2022521593A JP2022521593A JP2021549244A JP2021549244A JP2022521593A JP 2022521593 A JP2022521593 A JP 2022521593A JP 2021549244 A JP2021549244 A JP 2021549244A JP 2021549244 A JP2021549244 A JP 2021549244A JP 2022521593 A JP2022521593 A JP 2022521593A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photovoltaic device
- contact layer
- germanium
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims abstract description 20
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 17
- 239000000956 alloy Substances 0.000 claims abstract description 17
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000004065 semiconductor Substances 0.000 claims abstract description 14
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 13
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 5
- 239000010703 silicon Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 29
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 23
- 238000000576 coating method Methods 0.000 claims description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 14
- 239000011787 zinc oxide Substances 0.000 claims description 7
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 6
- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 230000005284 excitation Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 123
- 229910008310 Si—Ge Inorganic materials 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 238000000151 deposition Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910000927 Ge alloy Inorganic materials 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000006120 scratch resistant coating Substances 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- -1 that is Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04C—ELECTROMECHANICAL CLOCKS OR WATCHES
- G04C10/00—Arrangements of electric power supplies in time pieces
- G04C10/02—Arrangements of electric power supplies in time pieces the power supply being a radioactive or photovoltaic source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0368—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
- H01L31/03682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic System
- H01L31/03687—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic System including microcrystalline AIVBIV alloys, e.g. uc-SiGe, uc-SiC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
- H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System
- H01L31/03765—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System including AIVBIV compounds or alloys, e.g. SiGe, SiC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
- H01L31/1812—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System including only AIVBIV alloys, e.g. SiGe
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
- H01L31/204—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System including AIVBIV alloys, e.g. SiGe, SiC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
-例えば、透過性導電性酸化物等を含む導電性表接触層と、
-例えば、金属層、透過性導電性酸化物等を含む導電性裏接触層であって、前記裏接触層は、デバイスに対する「表」及び「裏」側を画定するように、前記表接触層よりも入射光源から遠くに位置することが意図される、導電性裏接触層と、
-半導体ベースのPIN接合部と
を備え、半導体ベースのPIN接合部は、P型半導体層とN型半導体層との間に挟まれた実質的に非晶質の真性シリコン層(水素化、即ちa-Si:Hであっても、非水素化、即ちa-Siであってもよい)を備える。PIN接合部は、いずれかの向きで配置することができる。即ち、P型層又はN型層のいずれかがデバイスの表側に近い。
-シラン流30~50sccm、
-ゲルマン流6~10sccm、
-水素流1200~1500sccm、
-ホスフィン流0.5~1.5sccm(N型ドーピングの場合)、又はジボラン流0.5~1.5sccm(P型ドーピングの場合)
-圧力3.0~3.5mbar
-プラズマ電力100~150W。
Claims (14)
- 光起電力デバイス(1)であって、前記光起電力デバイス(1)は、
-導電性表接触層(5)と、
-前記表接触層(5)よりも入射光源から遠くに位置することが意図される導電性裏接触層(13)と、
-半導体ベースのPIN接合部(7、9、11)と
を備え、前記半導体ベースのPIN接合部(7、9、11)は、P型ドープ半導体層(7、11)とN型ドープ半導体層(11、7)との間に挟まれた実質的に非晶質の真性シリコン層(9)を備える、光起電力デバイス(1)において、前記裏接触層(13)の最も近くに位置する前記PIN接合部の前記層(11)は、少なくとも2mol%のゲルマニウムを含むシリコン-ゲルマニウム合金層であることを特徴とする、光起電力デバイス(1)。 - 前記シリコン-ゲルマニウム合金は、少なくとも10mol%のゲルマニウム、更に好ましくは、15%から25%のゲルマニウム、更に好ましくは、実質的に20%のゲルマニウムを含む、請求項1に記載の光起電力デバイス(1)。
- 前記表接触層(5)の光入射側上に位置する反射防止層(19)を更に備える、請求項1又は2に記載の光起電力デバイス(1)。
- 前記反射防止層(19)は、前記表接触層(5)の屈折率よりも低い屈折率を呈する、請求項3に記載の光起電力デバイス(1)。
- 前記表接触層(5)の方に面する前記シリコン-ゲルマニウム合金層(11)の表面は、少なくとも10nmのrms粗さを有する、請求項1から4のいずれか一項に記載の光起電力デバイス(1)。
- 前記表接触層(5)の光入射側上に位置する、実質的に透過性の基体(3)を更に備える、請求項1から5のいずれか一項に記載の光起電力デバイス(1)。
- 前記実質的に透過性の基体の表側に配設した反射防止コーティング(17)を更に備え、前記反射防止コーティング(17)は、好ましくは、前記基体(3)の屈折率よりも低い屈折率を呈する、請求項6に記載の光起電力デバイス(1)。
- 前記表接触層(5)は、酸化亜鉛及び/又は酸化スズを含む、請求項5又は6に記載の光起電力デバイス(1)。
- 前記裏接触層(13)の光入射側から離れて面する前記裏接触層(13)の表面上に配置した基体(15)を更に備える、請求項1から5のいずれか一項に記載の光起電力デバイス(1)。
- 前記裏接触層(13)は、酸化亜鉛及び/又は酸化スズを含む、請求項1から9のいずれか一項に記載の光起電力デバイス(1)。
- 前記シリコン-ゲルマニウム合金ベースの層(11)以外の前記PIN接合部(7、9)の層は、非晶質シリコンベースの層である、請求項1から10のいずれか一項に記載の光起電力デバイス(1)。
- 請求項1から11のいずれか一項に記載の光起電力デバイス(1)を備える計時器(21)。
- 前記光起電力デバイス(1)は、前記計時器(21)が備える文字板(23)又はベゼル(25)の少なくとも一部を形成する、請求項12に記載の計時器(21)。
- 前記シリコン-ゲルマニウム層(11)は、以下の条件:
-シラン流30~50sccm、
-ゲルマン流6~10sccm、
-水素流1200~1500sccm、
-ホスフィン流0.5~1.5sccm、又はジボラン流0.5~1.5sccm
-圧力3.0~3.5mbar
-プラズマ電力100~150W
下、13.56MHzプラズマ励起周波数、15mm電極間距離、45×55cm電極面寸法の反応器で、プラズマ援用化学蒸着によって堆積する、請求項1から13のいずれか一項に記載の光起電力デバイス(1)の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19158681.7 | 2019-02-21 | ||
EP19158681 | 2019-02-21 | ||
PCT/EP2020/054593 WO2020169789A1 (en) | 2019-02-21 | 2020-02-21 | Black-coloured photovoltaic device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022521593A true JP2022521593A (ja) | 2022-04-11 |
JP7270754B2 JP7270754B2 (ja) | 2023-05-10 |
Family
ID=65520203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021549244A Active JP7270754B2 (ja) | 2019-02-21 | 2020-02-21 | 黒色光起電力デバイス |
Country Status (6)
Country | Link |
---|---|
US (1) | US11966201B2 (ja) |
EP (1) | EP3928166A1 (ja) |
JP (1) | JP7270754B2 (ja) |
KR (1) | KR102654436B1 (ja) |
CN (1) | CN114270279A (ja) |
WO (1) | WO2020169789A1 (ja) |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5762571A (en) * | 1980-10-03 | 1982-04-15 | Nippon Telegr & Teleph Corp <Ntt> | Solar battery |
JPH06318719A (ja) * | 1993-05-07 | 1994-11-15 | Canon Inc | 光起電力素子 |
JPH07115215A (ja) * | 1993-10-18 | 1995-05-02 | Canon Inc | 光起電力素子 |
JPH07202231A (ja) * | 1993-12-28 | 1995-08-04 | Canon Inc | 光起電力素子 |
JPH0846229A (ja) * | 1994-07-29 | 1996-02-16 | Canon Inc | 多結晶シリコンデバイス及び太陽電池 |
JPH11220154A (ja) * | 1997-10-29 | 1999-08-10 | Canon Inc | 光起電力素子および光起電力素子モジュール |
JP2004045105A (ja) * | 2002-07-09 | 2004-02-12 | Casio Comput Co Ltd | 時計装置 |
JP2005294326A (ja) * | 2004-03-31 | 2005-10-20 | Canon Inc | 光起電力素子及びその製造方法 |
JP2011149710A (ja) * | 2010-01-19 | 2011-08-04 | Seiko Epson Corp | 時計用カバーガラス、及び時計 |
JP2012164775A (ja) * | 2011-02-04 | 2012-08-30 | Mitsubishi Electric Corp | 光起電力装置およびその製造方法、光起電力モジュール |
JP2016118405A (ja) * | 2014-12-18 | 2016-06-30 | セイコーエプソン株式会社 | 発電装置、電子機器、および時計 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05198814A (ja) * | 1992-01-21 | 1993-08-06 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US6140570A (en) | 1997-10-29 | 2000-10-31 | Canon Kabushiki Kaisha | Photovoltaic element having a back side transparent and electrically conductive layer with a light incident side surface region having a specific cross section and a module comprising said photovolatic element |
JP4275778B2 (ja) | 1998-10-29 | 2009-06-10 | シチズンホールディングス株式会社 | 太陽電池時計 |
US6521883B2 (en) * | 2000-07-18 | 2003-02-18 | Sanyo Electric Co., Ltd. | Photovoltaic device |
JP2002148360A (ja) | 2000-11-08 | 2002-05-22 | Citizen Watch Co Ltd | 太陽電池用表示装置およびその製造方法 |
US7079453B2 (en) | 2002-07-09 | 2006-07-18 | Casio Computer Co., Ltd. | Timepiece and electronic apparatus with bulb-shaped semiconductor element |
US7767253B2 (en) | 2007-03-09 | 2010-08-03 | Guardian Industries Corp. | Method of making a photovoltaic device with antireflective coating |
US20100059119A1 (en) * | 2008-09-09 | 2010-03-11 | Electronics And Telecommunications Research Institute | Solar cell and method of manufacturing the same |
DE102009040670A1 (de) * | 2009-09-09 | 2010-02-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer einseitig kontaktierbaren Solarzelle |
DE102010048088A1 (de) | 2010-10-01 | 2012-04-05 | Carl Zeiss Vision Gmbh | Optische Linse mit kratzfester Entspiegelungsschicht |
US20120152352A1 (en) * | 2010-12-15 | 2012-06-21 | Egypt Nanotechnology Center | Photovoltaic devices with an interfacial germanium-containing layer and methods for forming the same |
EP2669952B1 (en) * | 2012-06-01 | 2015-03-25 | Roth & Rau AG | Photovoltaic device and method of manufacturing same |
US9373741B2 (en) * | 2012-08-15 | 2016-06-21 | International Business Machines Corporation | Heterostructure germanium tandem junction solar cell |
US9335444B2 (en) | 2014-05-12 | 2016-05-10 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
JP2016039198A (ja) * | 2014-08-06 | 2016-03-22 | セイコーエプソン株式会社 | 太陽電池、電子機器および太陽電池の製造方法 |
DE102015114877B4 (de) | 2015-09-04 | 2020-10-01 | Schott Ag | Kratzfeste Antireflexbeschichtung und mobiles elektronisches Gerät |
-
2020
- 2020-02-21 EP EP20705980.9A patent/EP3928166A1/en active Pending
- 2020-02-21 US US17/432,785 patent/US11966201B2/en active Active
- 2020-02-21 KR KR1020217029691A patent/KR102654436B1/ko active IP Right Grant
- 2020-02-21 CN CN202080029796.7A patent/CN114270279A/zh active Pending
- 2020-02-21 JP JP2021549244A patent/JP7270754B2/ja active Active
- 2020-02-21 WO PCT/EP2020/054593 patent/WO2020169789A1/en unknown
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5762571A (en) * | 1980-10-03 | 1982-04-15 | Nippon Telegr & Teleph Corp <Ntt> | Solar battery |
JPH06318719A (ja) * | 1993-05-07 | 1994-11-15 | Canon Inc | 光起電力素子 |
JPH07115215A (ja) * | 1993-10-18 | 1995-05-02 | Canon Inc | 光起電力素子 |
JPH07202231A (ja) * | 1993-12-28 | 1995-08-04 | Canon Inc | 光起電力素子 |
JPH0846229A (ja) * | 1994-07-29 | 1996-02-16 | Canon Inc | 多結晶シリコンデバイス及び太陽電池 |
JPH11220154A (ja) * | 1997-10-29 | 1999-08-10 | Canon Inc | 光起電力素子および光起電力素子モジュール |
JP2004045105A (ja) * | 2002-07-09 | 2004-02-12 | Casio Comput Co Ltd | 時計装置 |
JP2005294326A (ja) * | 2004-03-31 | 2005-10-20 | Canon Inc | 光起電力素子及びその製造方法 |
JP2011149710A (ja) * | 2010-01-19 | 2011-08-04 | Seiko Epson Corp | 時計用カバーガラス、及び時計 |
JP2012164775A (ja) * | 2011-02-04 | 2012-08-30 | Mitsubishi Electric Corp | 光起電力装置およびその製造方法、光起電力モジュール |
JP2016118405A (ja) * | 2014-12-18 | 2016-06-30 | セイコーエプソン株式会社 | 発電装置、電子機器、および時計 |
Also Published As
Publication number | Publication date |
---|---|
EP3928166A1 (en) | 2021-12-29 |
CN114270279A (zh) | 2022-04-01 |
JP7270754B2 (ja) | 2023-05-10 |
US20220004149A1 (en) | 2022-01-06 |
US11966201B2 (en) | 2024-04-23 |
WO2020169789A1 (en) | 2020-08-27 |
KR20210128451A (ko) | 2021-10-26 |
KR102654436B1 (ko) | 2024-04-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2363766B1 (en) | Timepiece cover glass and timepiece | |
JP5514207B2 (ja) | 結晶シリコン系太陽電池およびその製造方法 | |
Lin et al. | Comparison of AZO, GZO, and AGZO thin films TCOs applied for a-Si solar cells | |
CN104969362B (zh) | 带表面电极的透明导电玻璃基板及其制造方法、以及薄膜太阳能电池及其制造方法 | |
EP2296186A1 (en) | Thin film photoelectric conversion device and method for manufacturing the same | |
US5718773A (en) | Photoelectric transducer | |
JP2014107504A (ja) | 光起電力装置 | |
CN111048603B (zh) | 一种彩色铜铟镓硒薄膜太阳能电池及其制备方法 | |
AU2010324606A1 (en) | Textured superstrates for photovoltaics | |
TW201133887A (en) | Thin-film photoelectric conversion device | |
JP2023171787A (ja) | 黒色物品 | |
JP2022521593A (ja) | 黒色光起電力デバイス | |
US20110030780A1 (en) | Solar cell | |
US6229766B1 (en) | Dial formed of a solar cell in particular for a timepiece | |
US20180366605A1 (en) | Solar power sunroof device having low reflectance and manufacturing method thereof | |
CN205428968U (zh) | 太阳能电池组件 | |
JPH09307132A (ja) | 太陽電池装置およびその製造方法 | |
RU150125U1 (ru) | Фотовольтаическая ячейка | |
JP2014241311A (ja) | 薄膜太陽電池モジュール | |
Eisenlohr et al. | Highly efficient coloured BIPV modules with anti-glare properties | |
US20200227573A1 (en) | Optoelectronic device | |
WO2020184261A1 (ja) | 太陽電池およびその製造方法、太陽電池の検査方法、ならびに太陽電池モジュールおよびその製造方法 | |
JP2014241308A (ja) | 薄膜太陽電池モジュール | |
JP2011181837A (ja) | 光電変換装置 | |
Cording | Advances in tin-based transparent conductive oxides for thin film photovoltaic applications |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210928 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220921 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221004 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221102 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20230131 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230310 |
|
C60 | Trial request (containing other claim documents, opposition documents) |
Free format text: JAPANESE INTERMEDIATE CODE: C60 Effective date: 20230310 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20230323 |
|
C21 | Notice of transfer of a case for reconsideration by examiners before appeal proceedings |
Free format text: JAPANESE INTERMEDIATE CODE: C21 Effective date: 20230328 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230418 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230425 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7270754 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |