JP2022520971A - 光散乱に基づく光学器械および器具に対する空気散乱基準 - Google Patents

光散乱に基づく光学器械および器具に対する空気散乱基準 Download PDF

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JP2022520971A
JP2022520971A JP2021547729A JP2021547729A JP2022520971A JP 2022520971 A JP2022520971 A JP 2022520971A JP 2021547729 A JP2021547729 A JP 2021547729A JP 2021547729 A JP2021547729 A JP 2021547729A JP 2022520971 A JP2022520971 A JP 2022520971A
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illumination
air
intensity
scattered
volume portion
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JP2022520971A5 (https=
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フランク リー
チン リー
チーウェイ スー
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4728—Optical definition of scattering volume
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G01N21/278—Constitution of standards

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  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2021547729A 2019-02-19 2020-02-10 光散乱に基づく光学器械および器具に対する空気散乱基準 Pending JP2022520971A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023219602A JP7639111B2 (ja) 2019-02-19 2023-12-26 検査システム及び方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/279,395 US11016024B2 (en) 2019-02-19 2019-02-19 Air scattering standard for light scattering based optical instruments and tools
US16/279,395 2019-02-19
PCT/US2020/017415 WO2020171991A1 (en) 2019-02-19 2020-02-10 Air scattering standard for light scattering based optical instruments and tools

Related Child Applications (1)

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JP2023219602A Division JP7639111B2 (ja) 2019-02-19 2023-12-26 検査システム及び方法

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JP2022520971A true JP2022520971A (ja) 2022-04-04
JP2022520971A5 JP2022520971A5 (https=) 2023-02-16

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JP2021547729A Pending JP2022520971A (ja) 2019-02-19 2020-02-10 光散乱に基づく光学器械および器具に対する空気散乱基準
JP2023219602A Active JP7639111B2 (ja) 2019-02-19 2023-12-26 検査システム及び方法

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US (1) US11016024B2 (https=)
JP (2) JP2022520971A (https=)
KR (1) KR102597965B1 (https=)
CN (1) CN113383228A (https=)
TW (1) TWI829866B (https=)
WO (1) WO2020171991A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012090367A1 (ja) * 2010-12-27 2012-07-05 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
JP2013522651A (ja) * 2010-03-23 2013-06-13 オフィール−スピリコン エルエルシー ビーム散乱レーザーモニター
JP2016122860A (ja) * 2000-09-20 2016-07-07 ケーエルエー−テンカー コーポレイション 半導体製造プロセスのための方法とシステム

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US4249244A (en) * 1978-05-03 1981-02-03 Ppm, Inc. Electro-optical system and method and apparatus for providing automatically-compensating, traceable calibration and zeroing for light scattering devices
US4226533A (en) * 1978-09-11 1980-10-07 General Electric Company Optical particle detector
US4362387A (en) * 1980-08-22 1982-12-07 Rockwell International Corporation Method and apparatus for measuring visibility from the polarization properties of the daylight sky
US4854705A (en) * 1988-04-05 1989-08-08 Aerometrics, Inc. Method and apparatus to determine the size and velocity of particles using light scatter detection from confocal beams
JP2722362B2 (ja) * 1992-03-27 1998-03-04 三井金属鉱業株式会社 粒子または欠陥の大きさ情報の測定方法および装置
US5741298A (en) 1995-04-28 1998-04-21 Macleod; Cathel Method and devices for video-assisted surgical techniques
US6091494A (en) * 1999-05-25 2000-07-18 Venturedyne, Ltd. Particle sensor with cooled light trap and related method
US6326608B1 (en) 1999-07-09 2001-12-04 Chung-Shan Institute Of Science And Technology Polarization-type laser detection system
US6825437B2 (en) * 2001-01-17 2004-11-30 Hitachi, Ltd. Apparatus enabling particle detection utilizing wide view lens
US8072584B2 (en) 2002-08-02 2011-12-06 Ophir Corporation Optical air data systems and methods
JP3720799B2 (ja) * 2002-10-02 2005-11-30 神栄株式会社 花粉センサ
JP2004233078A (ja) * 2003-01-28 2004-08-19 Japan Atom Energy Res Inst 大気中に浮遊する微粒子等の個数、粒径分布等を遠隔において計測するリモートパーティクルカウンター装置
KR100576364B1 (ko) 2003-11-21 2006-05-03 삼성전자주식회사 시편 검사장치의 기준값설정장치 및 이를 이용한 기준값설정방법
US7623234B2 (en) * 2004-03-22 2009-11-24 Quantaspec, Inc. System and method for detecting and identifying an analyte
CA2883638C (en) * 2004-11-12 2017-06-20 Xtralis Technologies Ltd Particle detector, system and method
KR100684903B1 (ko) * 2005-07-15 2007-02-20 삼성전자주식회사 반도체 제조 장치 및 파티클 모니터링 방법
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JP6862255B2 (ja) 2017-04-12 2021-04-21 キヤノン株式会社 撮像装置、撮像方法および撮像プログラム

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016122860A (ja) * 2000-09-20 2016-07-07 ケーエルエー−テンカー コーポレイション 半導体製造プロセスのための方法とシステム
JP2013522651A (ja) * 2010-03-23 2013-06-13 オフィール−スピリコン エルエルシー ビーム散乱レーザーモニター
WO2012090367A1 (ja) * 2010-12-27 2012-07-05 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置

Also Published As

Publication number Publication date
US11016024B2 (en) 2021-05-25
US20200264099A1 (en) 2020-08-20
JP2024026532A (ja) 2024-02-28
TWI829866B (zh) 2024-01-21
CN113383228A (zh) 2021-09-10
WO2020171991A1 (en) 2020-08-27
KR102597965B1 (ko) 2023-11-02
JP7639111B2 (ja) 2025-03-04
KR20210120113A (ko) 2021-10-06
TW202043732A (zh) 2020-12-01

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