TWI829866B - 以針對光散射之空氣散射標準為基礎之光學設備及工具 - Google Patents
以針對光散射之空氣散射標準為基礎之光學設備及工具 Download PDFInfo
- Publication number
- TWI829866B TWI829866B TW109105274A TW109105274A TWI829866B TW I829866 B TWI829866 B TW I829866B TW 109105274 A TW109105274 A TW 109105274A TW 109105274 A TW109105274 A TW 109105274A TW I829866 B TWI829866 B TW I829866B
- Authority
- TW
- Taiwan
- Prior art keywords
- illumination
- air
- volume
- intensity
- scattered
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 19
- 238000000149 argon plasma sintering Methods 0.000 title description 2
- 238000005286 illumination Methods 0.000 claims abstract description 304
- 230000010287 polarization Effects 0.000 claims abstract description 62
- 238000001514 detection method Methods 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 48
- 238000007689 inspection Methods 0.000 abstract description 11
- 238000005516 engineering process Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002279 physical standard Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4704—Angular selective
- G01N2021/4728—Optical definition of scattering volume
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4792—Polarisation of scatter light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
- G01N21/278—Constitution of standards
Landscapes
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/279,395 US11016024B2 (en) | 2019-02-19 | 2019-02-19 | Air scattering standard for light scattering based optical instruments and tools |
| US16/279,395 | 2019-02-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202043732A TW202043732A (zh) | 2020-12-01 |
| TWI829866B true TWI829866B (zh) | 2024-01-21 |
Family
ID=72040596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109105274A TWI829866B (zh) | 2019-02-19 | 2020-02-19 | 以針對光散射之空氣散射標準為基礎之光學設備及工具 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11016024B2 (https=) |
| JP (2) | JP2022520971A (https=) |
| KR (1) | KR102597965B1 (https=) |
| CN (1) | CN113383228A (https=) |
| TW (1) | TWI829866B (https=) |
| WO (1) | WO2020171991A1 (https=) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5471298A (en) * | 1992-03-27 | 1995-11-28 | Mitsui Minings & Melting Co., Ltd. | Method and apparatus for measuring size of particle or defect |
| US6326608B1 (en) * | 1999-07-09 | 2001-12-04 | Chung-Shan Institute Of Science And Technology | Polarization-type laser detection system |
| CN101952709A (zh) * | 2007-11-15 | 2011-01-19 | 爱克斯崔里斯科技有限公司 | 颗粒探测 |
| US7894057B2 (en) * | 2004-03-22 | 2011-02-22 | Quantaspec, Inc. | Methods of analyzing samples using broadband laser light |
| US8351035B2 (en) * | 2009-05-12 | 2013-01-08 | Thermo Fisher Scientific Inc. | Particulate detection and calibration of sensors |
| CN104833655A (zh) * | 2009-05-01 | 2015-08-12 | 爱克斯崔里斯科技有限公司 | 微粒探测器的改进 |
| US10161866B2 (en) * | 2004-11-12 | 2018-12-25 | Garrett Thermal Systems Limited | Particle detector, system and method |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4249244A (en) * | 1978-05-03 | 1981-02-03 | Ppm, Inc. | Electro-optical system and method and apparatus for providing automatically-compensating, traceable calibration and zeroing for light scattering devices |
| US4226533A (en) * | 1978-09-11 | 1980-10-07 | General Electric Company | Optical particle detector |
| US4362387A (en) * | 1980-08-22 | 1982-12-07 | Rockwell International Corporation | Method and apparatus for measuring visibility from the polarization properties of the daylight sky |
| US4854705A (en) * | 1988-04-05 | 1989-08-08 | Aerometrics, Inc. | Method and apparatus to determine the size and velocity of particles using light scatter detection from confocal beams |
| US5741298A (en) | 1995-04-28 | 1998-04-21 | Macleod; Cathel | Method and devices for video-assisted surgical techniques |
| US6091494A (en) * | 1999-05-25 | 2000-07-18 | Venturedyne, Ltd. | Particle sensor with cooled light trap and related method |
| US6633831B2 (en) * | 2000-09-20 | 2003-10-14 | Kla Tencor Technologies | Methods and systems for determining a critical dimension and a thin film characteristic of a specimen |
| US6825437B2 (en) * | 2001-01-17 | 2004-11-30 | Hitachi, Ltd. | Apparatus enabling particle detection utilizing wide view lens |
| US8072584B2 (en) | 2002-08-02 | 2011-12-06 | Ophir Corporation | Optical air data systems and methods |
| JP3720799B2 (ja) * | 2002-10-02 | 2005-11-30 | 神栄株式会社 | 花粉センサ |
| JP2004233078A (ja) * | 2003-01-28 | 2004-08-19 | Japan Atom Energy Res Inst | 大気中に浮遊する微粒子等の個数、粒径分布等を遠隔において計測するリモートパーティクルカウンター装置 |
| KR100576364B1 (ko) | 2003-11-21 | 2006-05-03 | 삼성전자주식회사 | 시편 검사장치의 기준값설정장치 및 이를 이용한 기준값설정방법 |
| KR100684903B1 (ko) * | 2005-07-15 | 2007-02-20 | 삼성전자주식회사 | 반도체 제조 장치 및 파티클 모니터링 방법 |
| EP2252871A2 (en) * | 2008-02-01 | 2010-11-24 | Cambridge Consultants Limited | Device and method for measuring scattering of radiation |
| US8988673B2 (en) * | 2010-03-23 | 2015-03-24 | Ophir-Spiricon, Llc | Beam scattering laser monitor |
| JP2012137350A (ja) * | 2010-12-27 | 2012-07-19 | Hitachi High-Technologies Corp | 欠陥検査方法および欠陥検査装置 |
| US8960909B2 (en) * | 2012-01-20 | 2015-02-24 | Canon Kabushiki Kaisha | Control apparatus and control method |
| WO2017060164A1 (en) * | 2015-10-08 | 2017-04-13 | Koninklijke Philips N.V. | Optical sensor for particle detection |
| JP6862255B2 (ja) | 2017-04-12 | 2021-04-21 | キヤノン株式会社 | 撮像装置、撮像方法および撮像プログラム |
-
2019
- 2019-02-19 US US16/279,395 patent/US11016024B2/en active Active
-
2020
- 2020-02-10 CN CN202080012505.3A patent/CN113383228A/zh active Pending
- 2020-02-10 KR KR1020217029680A patent/KR102597965B1/ko active Active
- 2020-02-10 WO PCT/US2020/017415 patent/WO2020171991A1/en not_active Ceased
- 2020-02-10 JP JP2021547729A patent/JP2022520971A/ja active Pending
- 2020-02-19 TW TW109105274A patent/TWI829866B/zh active
-
2023
- 2023-12-26 JP JP2023219602A patent/JP7639111B2/ja active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5471298A (en) * | 1992-03-27 | 1995-11-28 | Mitsui Minings & Melting Co., Ltd. | Method and apparatus for measuring size of particle or defect |
| US6326608B1 (en) * | 1999-07-09 | 2001-12-04 | Chung-Shan Institute Of Science And Technology | Polarization-type laser detection system |
| US7894057B2 (en) * | 2004-03-22 | 2011-02-22 | Quantaspec, Inc. | Methods of analyzing samples using broadband laser light |
| US10161866B2 (en) * | 2004-11-12 | 2018-12-25 | Garrett Thermal Systems Limited | Particle detector, system and method |
| CN101952709A (zh) * | 2007-11-15 | 2011-01-19 | 爱克斯崔里斯科技有限公司 | 颗粒探测 |
| CN104833655A (zh) * | 2009-05-01 | 2015-08-12 | 爱克斯崔里斯科技有限公司 | 微粒探测器的改进 |
| US8351035B2 (en) * | 2009-05-12 | 2013-01-08 | Thermo Fisher Scientific Inc. | Particulate detection and calibration of sensors |
Also Published As
| Publication number | Publication date |
|---|---|
| US11016024B2 (en) | 2021-05-25 |
| US20200264099A1 (en) | 2020-08-20 |
| JP2022520971A (ja) | 2022-04-04 |
| JP2024026532A (ja) | 2024-02-28 |
| CN113383228A (zh) | 2021-09-10 |
| WO2020171991A1 (en) | 2020-08-27 |
| KR102597965B1 (ko) | 2023-11-02 |
| JP7639111B2 (ja) | 2025-03-04 |
| KR20210120113A (ko) | 2021-10-06 |
| TW202043732A (zh) | 2020-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6490042B2 (ja) | 非線形光学結晶中の結晶位置寿命の測定 | |
| US8638429B2 (en) | Defect inspecting method and defect inspecting apparatus | |
| JP6758309B2 (ja) | フォーカスエラー感応性が減少した光学的計測 | |
| TWI785253B (zh) | 基於多個散射信號之嵌入式粒子深度分級 | |
| TWI746863B (zh) | 用於控制及量測一樣本之檢測之極化之系統及方法 | |
| JP2020514762A5 (https=) | ||
| JP2018508995A5 (https=) | ||
| TW201946176A (zh) | 具有整合量測之樣品搬送裝置 | |
| JP5349742B2 (ja) | 表面検査方法及び表面検査装置 | |
| TWI829866B (zh) | 以針對光散射之空氣散射標準為基礎之光學設備及工具 | |
| JP2010271186A (ja) | 欠陥検査装置 | |
| US10648928B1 (en) | Scattered radiation optical scanner | |
| JP2004354347A (ja) | 蛍光測定装置 | |
| JPH0293344A (ja) | 微粒子測定方法および装置 | |
| JP2007033207A (ja) | 蛍光ｘ線三次元分析装置 | |
| CN121909389A (zh) | 多厚度叠加测量系统 | |
| TW202434998A (zh) | 具有中央透射切口之光束感測器 | |
| JPH0886737A (ja) | 微粒子測定方法及び微粒子測定装置 | |
| JP2022020435A (ja) | 偏光回転角抽出方法 | |
| KR20150111817A (ko) | 나노구조체의 임계 치수를 측정하기 위한 방법 및 장치 |