KR102597965B1 - 광산란 기반 광학 기기 및 도구를 위한 공기 산란 표준 - Google Patents

광산란 기반 광학 기기 및 도구를 위한 공기 산란 표준 Download PDF

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KR102597965B1
KR102597965B1 KR1020217029680A KR20217029680A KR102597965B1 KR 102597965 B1 KR102597965 B1 KR 102597965B1 KR 1020217029680 A KR1020217029680 A KR 1020217029680A KR 20217029680 A KR20217029680 A KR 20217029680A KR 102597965 B1 KR102597965 B1 KR 102597965B1
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KR20210120113A (ko
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프랑크 리
칭 리
지웨이 수
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케이엘에이 코포레이션
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4728—Optical definition of scattering volume
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G01N21/274—Calibration, base line adjustment, drift correction
    • G01N21/278—Constitution of standards

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  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020217029680A 2019-02-19 2020-02-10 광산란 기반 광학 기기 및 도구를 위한 공기 산란 표준 Active KR102597965B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/279,395 US11016024B2 (en) 2019-02-19 2019-02-19 Air scattering standard for light scattering based optical instruments and tools
US16/279,395 2019-02-19
PCT/US2020/017415 WO2020171991A1 (en) 2019-02-19 2020-02-10 Air scattering standard for light scattering based optical instruments and tools

Publications (2)

Publication Number Publication Date
KR20210120113A KR20210120113A (ko) 2021-10-06
KR102597965B1 true KR102597965B1 (ko) 2023-11-02

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KR1020217029680A Active KR102597965B1 (ko) 2019-02-19 2020-02-10 광산란 기반 광학 기기 및 도구를 위한 공기 산란 표준

Country Status (6)

Country Link
US (1) US11016024B2 (https=)
JP (2) JP2022520971A (https=)
KR (1) KR102597965B1 (https=)
CN (1) CN113383228A (https=)
TW (1) TWI829866B (https=)
WO (1) WO2020171991A1 (https=)

Citations (2)

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US20090046289A1 (en) 2002-08-02 2009-02-19 Ophir Corporation Optical Air Data Systems And Methods
JP2018182521A (ja) 2017-04-12 2018-11-15 キヤノン株式会社 撮像装置、撮像方法および撮像プログラム

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US4249244A (en) * 1978-05-03 1981-02-03 Ppm, Inc. Electro-optical system and method and apparatus for providing automatically-compensating, traceable calibration and zeroing for light scattering devices
US4226533A (en) * 1978-09-11 1980-10-07 General Electric Company Optical particle detector
US4362387A (en) * 1980-08-22 1982-12-07 Rockwell International Corporation Method and apparatus for measuring visibility from the polarization properties of the daylight sky
US4854705A (en) * 1988-04-05 1989-08-08 Aerometrics, Inc. Method and apparatus to determine the size and velocity of particles using light scatter detection from confocal beams
JP2722362B2 (ja) * 1992-03-27 1998-03-04 三井金属鉱業株式会社 粒子または欠陥の大きさ情報の測定方法および装置
US5741298A (en) 1995-04-28 1998-04-21 Macleod; Cathel Method and devices for video-assisted surgical techniques
US6091494A (en) * 1999-05-25 2000-07-18 Venturedyne, Ltd. Particle sensor with cooled light trap and related method
US6326608B1 (en) 1999-07-09 2001-12-04 Chung-Shan Institute Of Science And Technology Polarization-type laser detection system
US6633831B2 (en) * 2000-09-20 2003-10-14 Kla Tencor Technologies Methods and systems for determining a critical dimension and a thin film characteristic of a specimen
US6825437B2 (en) * 2001-01-17 2004-11-30 Hitachi, Ltd. Apparatus enabling particle detection utilizing wide view lens
JP3720799B2 (ja) * 2002-10-02 2005-11-30 神栄株式会社 花粉センサ
JP2004233078A (ja) * 2003-01-28 2004-08-19 Japan Atom Energy Res Inst 大気中に浮遊する微粒子等の個数、粒径分布等を遠隔において計測するリモートパーティクルカウンター装置
KR100576364B1 (ko) 2003-11-21 2006-05-03 삼성전자주식회사 시편 검사장치의 기준값설정장치 및 이를 이용한 기준값설정방법
US7623234B2 (en) * 2004-03-22 2009-11-24 Quantaspec, Inc. System and method for detecting and identifying an analyte
CA2883638C (en) * 2004-11-12 2017-06-20 Xtralis Technologies Ltd Particle detector, system and method
KR100684903B1 (ko) * 2005-07-15 2007-02-20 삼성전자주식회사 반도체 제조 장치 및 파티클 모니터링 방법
CA2993208C (en) * 2007-11-15 2021-01-26 Garrett Thermal Systems Limited Particle detection
EP2252871A2 (en) * 2008-02-01 2010-11-24 Cambridge Consultants Limited Device and method for measuring scattering of radiation
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JP2012137350A (ja) * 2010-12-27 2012-07-19 Hitachi High-Technologies Corp 欠陥検査方法および欠陥検査装置
US8960909B2 (en) * 2012-01-20 2015-02-24 Canon Kabushiki Kaisha Control apparatus and control method
WO2017060164A1 (en) * 2015-10-08 2017-04-13 Koninklijke Philips N.V. Optical sensor for particle detection

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090046289A1 (en) 2002-08-02 2009-02-19 Ophir Corporation Optical Air Data Systems And Methods
JP2018182521A (ja) 2017-04-12 2018-11-15 キヤノン株式会社 撮像装置、撮像方法および撮像プログラム

Also Published As

Publication number Publication date
US11016024B2 (en) 2021-05-25
US20200264099A1 (en) 2020-08-20
JP2022520971A (ja) 2022-04-04
JP2024026532A (ja) 2024-02-28
TWI829866B (zh) 2024-01-21
CN113383228A (zh) 2021-09-10
WO2020171991A1 (en) 2020-08-27
JP7639111B2 (ja) 2025-03-04
KR20210120113A (ko) 2021-10-06
TW202043732A (zh) 2020-12-01

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