JP2022167883A5 - - Google Patents

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Publication number
JP2022167883A5
JP2022167883A5 JP2022070772A JP2022070772A JP2022167883A5 JP 2022167883 A5 JP2022167883 A5 JP 2022167883A5 JP 2022070772 A JP2022070772 A JP 2022070772A JP 2022070772 A JP2022070772 A JP 2022070772A JP 2022167883 A5 JP2022167883 A5 JP 2022167883A5
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JP
Japan
Prior art keywords
etching solution
group
solution according
formula
carbon atoms
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JP2022070772A
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English (en)
Japanese (ja)
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JP2022167883A (ja
JP7768825B2 (ja
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Publication of JP2022167883A publication Critical patent/JP2022167883A/ja
Publication of JP2022167883A5 publication Critical patent/JP2022167883A5/ja
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Publication of JP7768825B2 publication Critical patent/JP7768825B2/ja
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JP2022070772A 2021-04-22 2022-04-22 エッチング液 Active JP7768825B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021072537 2021-04-22
JP2021072537 2021-04-22

Publications (3)

Publication Number Publication Date
JP2022167883A JP2022167883A (ja) 2022-11-04
JP2022167883A5 true JP2022167883A5 (enExample) 2025-03-04
JP7768825B2 JP7768825B2 (ja) 2025-11-12

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ID=83722358

Family Applications (1)

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JP2022070772A Active JP7768825B2 (ja) 2021-04-22 2022-04-22 エッチング液

Country Status (5)

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US (1) US20240209260A1 (enExample)
JP (1) JP7768825B2 (enExample)
KR (1) KR20230173103A (enExample)
CN (1) CN117223092A (enExample)
WO (1) WO2022225032A1 (enExample)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO901662L (no) * 1989-04-17 1990-12-21 Monsanto Co Toert herbicid preparat med forbedret vannopploeselighet.
US10995269B2 (en) 2016-11-24 2021-05-04 Samsung Electronics Co., Ltd. Etchant composition and method of fabricating integrated circuit device using the same
US11186771B2 (en) * 2017-06-05 2021-11-30 Versum Materials Us, Llc Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device
WO2020022491A1 (ja) * 2018-07-27 2020-01-30 花王株式会社 洗浄方法
KR102258307B1 (ko) * 2018-09-03 2021-06-01 주식회사 이엔에프테크놀로지 실리콘 질화막 식각 조성물 및 이를 이용한 방법
KR102557642B1 (ko) * 2018-10-25 2023-07-20 에스케이이노베이션 주식회사 식각 조성물 첨가제, 그 제조방법 및 이를 포함하는 식각 조성물
JP2021086943A (ja) * 2019-11-28 2021-06-03 花王株式会社 エッチング液

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