JP2022040392A - 高い損傷耐性を備えた、ジルコン適合性を有するイオン交換可能なガラス - Google Patents
高い損傷耐性を備えた、ジルコン適合性を有するイオン交換可能なガラス Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 280
- 229910052845 zircon Inorganic materials 0.000 title claims description 19
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 title claims description 19
- 230000006378 damage Effects 0.000 title abstract description 17
- 150000002500 ions Chemical class 0.000 title description 6
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims abstract description 13
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 52
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 24
- 229910052708 sodium Inorganic materials 0.000 claims description 8
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 3
- 238000007373 indentation Methods 0.000 abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 10
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000377 silicon dioxide Substances 0.000 abstract description 5
- 229910011255 B2O3 Inorganic materials 0.000 abstract description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 4
- 238000006748 scratching Methods 0.000 abstract description 3
- 230000002393 scratching effect Effects 0.000 abstract description 3
- 229910052593 corundum Inorganic materials 0.000 abstract 3
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract 1
- 238000005299 abrasion Methods 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 description 45
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical group [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 37
- 239000010410 layer Substances 0.000 description 24
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 19
- 230000000977 initiatory effect Effects 0.000 description 19
- 238000005342 ion exchange Methods 0.000 description 19
- 239000000395 magnesium oxide Substances 0.000 description 19
- 150000001768 cations Chemical class 0.000 description 18
- -1 boron cations Chemical class 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 12
- 238000000137 annealing Methods 0.000 description 12
- 239000000203 mixture Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 230000004927 fusion Effects 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 230000015556 catabolic process Effects 0.000 description 4
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- 239000003607 modifier Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 239000005407 aluminoborosilicate glass Substances 0.000 description 3
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- 230000008901 benefit Effects 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
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- 238000012545 processing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
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- 230000000694 effects Effects 0.000 description 2
- 239000002241 glass-ceramic Substances 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- 229910001947 lithium oxide Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000011819 refractory material Substances 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 238000007655 standard test method Methods 0.000 description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910020599 Co 3 O 4 Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 241000842539 Rhagades Species 0.000 description 1
- 206010040849 Skin fissures Diseases 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910001423 beryllium ion Inorganic materials 0.000 description 1
- HYFJXBYGHMZZPQ-UHFFFAOYSA-N boron(1+) Chemical compound [B+] HYFJXBYGHMZZPQ-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical class [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 1
- 229910001942 caesium oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
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- 239000000835 fiber Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000003286 fusion draw glass process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
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- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001387 inorganic aluminate Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical group [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000008458 response to injury Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910001952 rubidium oxide Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000006058 strengthened glass Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
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- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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Abstract
【課題】摩耗、引っ掻き、押込み等が引き起こす損傷に対して高い耐性を有する、イオン交換可能なガラスを提供する。
【解決手段】ガラスであって、少なくとも50モル%のSiO2;9モル%~22モル%のAl2O3;9モル%~20モル%のNa2O;少なくとも10モル%のR2O、ここでR2Oはアルカリ金属酸化物の合計;4.5モル%以下のB2O3;少なくとも0.1モル%のMgO;少なくとも0.1モル%のZnO;及びCaO、BaO及びSrOの少なくとも1つ(0モル%超で2モル%以下のCaO+BaO+SrO);を含み、Al2O3の量がR2Oの全量より少なく、B2O3-(R2O-Al2O3)≦4.5モル%である。
【選択図】図1
Description
1.ガラスにおいて、
少なくとも約50モル%のSiO2;
少なくとも約10モル%のR2O(ここでR2OはNa2Oを含む);
Al2O3(Al2O3(モル%)<R2O(モル%));及び
B2O3(B2O3(モル%)-(R2O(モル%)-Al2O3(モル%))≧3モル%)
を含む、イオン交換可能なガラス。
少なくとも約50モル%のSiO2;
約9モル%~約22モル%のAl2O3;
約3モル%~約10モル%のB2O3;
約9モル%~約20モル%のNa2O;
0モル%~5モル%のK2O;
少なくとも約0.1モル%のMgO、ZnO、又はこれらの組み合わせ(0≦MgO≦6かつ0≦ZnO≦6モル%);並びに
任意で、CaO、BaO及びSrOの少なくとも1つ(0モル%≦CaO+SrO+BaO≦2モル%)を含む、実施態様1に記載のガラス。
少なくとも約50モル%のSiO2;
約9モル%~約22モル%のAl2O3;
約3モル%~約10モル%のB2O3;
約9モル%~約20モル%のNa2O;
0モル%~5モル%のK2O;
少なくとも約0.1モル%のMgO、ZnO、又はこれらの組み合わせ(0≦MgO≦6かつ0≦ZnO≦6モル%);並びに
任意で、CaO、BaO及びSrOの少なくとも1つ(0モル%≦CaO+SrO+BaO≦2モル%)
を含む、実施態様18に記載のガラス。
少なくとも約50モル%のSiO2;
少なくとも約10モル%のR2O(ここでR2OはNa2Oを含む);
Al2O3(Al2O3(モル%)<R2O(モル%));及び
B2O3(B2O3(モル%)-(R2O(モル%)-Al2O3(モル%))≧3モル%)を含み、イオン交換され、少なくとも約10kgf(約98N)のビッカース亀裂開始閾値を有するガラス。
少なくとも約50モル%のSiO2;
約9モル%~約22モル%のAl2O3;
約3モル%~約10モル%のB2O3;
約9モル%~約20モル%のNa2O;
0モル%~5モル%のK2O;
少なくとも約0.1モル%のMgO、ZnO、又はこれらの組み合わせ(0≦MgO≦6かつ0≦ZnO≦6モル%);並びに
任意で、CaO、BaO及びSrOの少なくとも1つ(0モル%≦CaO+SrO+BaO≦2モル%)
を含む、実施態様35に記載のガラス。
少なくとも約50モル%のSiO2;
少なくとも約10モル%のR2O(ここでR2OはNa2Oを含む);
Al2O3;及び
配位ホウ素陽イオンを含有する少なくとも2.7モル%のB2O3(B2O3-(R2O-Al2O3)≧3モル%)を含む、ガラス。
少なくとも約50モル%のSiO2;
約9モル%~約22モル%のAl2O3;
約3モル%~約10モル%のB2O3;
約9モル%~約20モル%のNa2O;
0モル%~5モル%のK2O;
少なくとも約0.1モル%のMgO、ZnO、又はこれらの組み合わせ(0≦MgO≦6かつ0≦ZnO≦6モル%);並びに
任意で、CaO、BaO及びSrOの少なくとも1つ(0モル%≦CaO+SrO+BaO≦2モル%)
を含む、実施態様50に記載のガラス。
Claims (16)
- 少なくとも50モル%のSiO2;
9モル%~22モル%のAl2O3;
9モル%~20モル%のNa2O;
少なくとも10モル%のR2O、ここでR2Oはアルカリ金属酸化物の合計;
4.5モル%以下のB2O3;
少なくとも0.1モル%のMgO;
少なくとも0.1モル%のZnO;
及び
CaO、BaO及びSrOの少なくとも1つ(0モル%超で2モル%以下のCaO+BaO+SrO);を含み、
Al2O3の量がR2Oの全量より少なく、
B2O3-(R2O-Al2O3)≦4.5モル%である、
ガラス。 - MgO+ZnOが6モル%以下である、請求項1記載のガラス。
- Li2Oをさらに含む請求項1記載のガラス。
- K2Oをさらに含む請求項1記載のガラス。
- 0モル%から5モル%のK2Oさらに含む請求項1記載のガラス。
- 前記ガラスがイオン交換され、少なくとも600MPaの圧縮応力下の層を有し、該層が、前記ガラスの表面から前記ガラス内に少なくとも30μmの層深さまで延在する、請求項1記載のガラス。
- 前記圧縮応力が少なくとも800MPaである、請求項6記載のガラス。
- 前記ガラスは、該ガラスが30キロポアズ(3.0kPa・s)~40キロポアズ(4.0kPa・s)の範囲の粘度を有する温度に等しいジルコン破壊温度を有する、請求項1記載のガラス。
- 少なくとも50モル%のSiO2;
9モル%~22モル%のAl2O3;
9モル%~20モル%のNa2O;
少なくとも10モル%のR2O、ここでR2Oはアルカリ金属酸化物の合計;
4.5モル%以下のB2O3;
少なくとも0.1モル%のMgO;
少なくとも0.1モル%のZnO;
及び
CaO、BaO及びSrOの少なくとも1つ(0モル%超で2モル%以下のCaO+BaO+SrO);を含み、
Al2O3の量がR2Oの全量より少なく、
B2O3-(R2O-Al2O3)≦4.5モル%であり、
少なくとも600MPaの圧縮応力下の層を有する、
イオン交換されたガラス物品。 - MgO+ZnOが6モル%以下である、請求項9に記載のイオン交換されたガラス物品。
- Li2Oをさらに含む請求項9記載のイオン交換されたガラス物品。
- K2Oをさらに含む請求項9記載のイオン交換されたガラス物品。
- 0モル%から5モル%のK2Oさらに含む請求項9記載のイオン交換されたガラス物品。
- 前記圧縮応力下の層が、ガラスの表面から前記ガラス内に少なくとも30μmの層深さまで延在する、請求項9記載のイオン交換されたガラス物品。
- 前記圧縮応力が少なくとも800MPaである、請求項14記載のイオン交換されたガラス物品。
- ガラスが、該ガラスが30キロポアズ(3.0kPa・s)~40キロポアズ(4.0kPa・s)の範囲の粘度を有する温度に等しいジルコン破壊温度を有する、請求項9記載のイオン交換されたガラス物品。
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