JP2022002274A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP2022002274A JP2022002274A JP2020107065A JP2020107065A JP2022002274A JP 2022002274 A JP2022002274 A JP 2022002274A JP 2020107065 A JP2020107065 A JP 2020107065A JP 2020107065 A JP2020107065 A JP 2020107065A JP 2022002274 A JP2022002274 A JP 2022002274A
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- JP
- Japan
- Prior art keywords
- frame member
- lift pin
- holding surface
- substrate
- driving force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Liquid Crystal (AREA)
Abstract
Description
以下、本実施の形態に関する基板処理装置について説明する。
図1は、本実施の形態に関する基板処理装置1を模式的に示す斜視図である。
図4は、リフトピン駆動部8における駆動力伝達機構8Bおよび昇降機構8Cの構成の例を示す図である。
図5および図6は、リフトピン6の昇降動作の例を示す断面図である。まず、図5に例が示されるように、リフトピン6がステージ4の保持面41から上方へ突き出していない状態(図5においては、貫通孔90にリフトピン6が挿入され、かつ、リフトピン6が保持面41から上方へ突き出していない状態)では、昇降機構8Cに連結された枠部材7が下位置に配置されている。
図7は、駆動力伝達機構80Bおよび昇降機構80Cの構成の例を示す図である。
次に、以上に記載された実施の形態によって生じる効果の例を示す。なお、以下の説明においては、以上に記載された実施の形態に例が示された具体的な構成に基づいて当該効果が記載されるが、同様の効果が生じる範囲で、本願明細書に例が示される他の具体的な構成と置き換えられてもよい。
以上に記載された実施の形態では、それぞれの構成要素の材質、材料、寸法、形状、相対的配置関係または実施の条件などについても記載する場合があるが、これらはすべての局面においてひとつの例であって、限定的なものではないものとする。
2 スリットノズル
3 基板
4 ステージ
5 塗布処理部
6 リフトピン
7 枠部材
8 リフトピン駆動部
8A 駆動源
8B,80B 駆動力伝達機構
8C,80C 昇降機構
21 吐出口
31 上面
41 保持面
51 ノズル支持体
52 ガイドレール
53 スリットノズル移動部
54 リニアモータ
55 リニアエンコーダ
70 制御部
82 シャフト
82A ピニオンギア
82B 連動治具
84 連動部
86 ラック
88 スライド孔
88A,88B 端部
90 貫通孔
100 ノズル調整領域
Claims (4)
- 上面に基板を保持するための保持面と、
前記保持面に形成される複数の貫通孔を介して前記保持面の前記上面へそれぞれ突き出す、複数のリフトピンと、
前記複数のリフトピンを下方から支持し、かつ、平面視において前記保持面と重なって配置される枠部材と、
平面視において前記枠部材の外周部に配置され、かつ、前記枠部材を昇降させることによって前記複数のリフトピンを昇降させるためのリフトピン駆動部とを備え、
前記リフトピン駆動部は、
駆動源と、
前記枠部材の周方向に延びて配置され、かつ、前記駆動源の駆動力を伝達するための駆動力伝達機構と、
前記駆動力伝達機構と前記枠部材の外周部とに連結され、かつ、前記枠部材を昇降させるための複数の昇降機構とを備える、
基板処理装置。 - 請求項1に記載の基板処理装置であり、
前記リフトピン駆動部は、平面視において前記枠部材と重ならない、
基板処理装置。 - 請求項1または2に記載の基板処理装置であり、
前記リフトピン駆動部は、平面視において前記保持面と重ならない、
基板処理装置。 - 請求項1から3のうちのいずれか1つに記載の基板処理装置であり、
前記駆動力伝達機構は、前記枠部材の異なる2つの周方向に延びて配置される、
基板処理装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020107065A JP2022002274A (ja) | 2020-06-22 | 2020-06-22 | 基板処理装置 |
CN202110537975.8A CN113903679A (zh) | 2020-06-22 | 2021-05-18 | 基板处理装置 |
TW110118902A TW202201623A (zh) | 2020-06-22 | 2021-05-25 | 基板處理裝置 |
KR1020210078592A KR20210157883A (ko) | 2020-06-22 | 2021-06-17 | 기판 처리 장치 |
JP2023082055A JP7441995B2 (ja) | 2020-06-22 | 2023-05-18 | 基板処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020107065A JP2022002274A (ja) | 2020-06-22 | 2020-06-22 | 基板処理装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023082055A Division JP7441995B2 (ja) | 2020-06-22 | 2023-05-18 | 基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2022002274A true JP2022002274A (ja) | 2022-01-06 |
Family
ID=79176949
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020107065A Pending JP2022002274A (ja) | 2020-06-22 | 2020-06-22 | 基板処理装置 |
JP2023082055A Active JP7441995B2 (ja) | 2020-06-22 | 2023-05-18 | 基板処理装置 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023082055A Active JP7441995B2 (ja) | 2020-06-22 | 2023-05-18 | 基板処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (2) | JP2022002274A (ja) |
KR (1) | KR20210157883A (ja) |
CN (1) | CN113903679A (ja) |
TW (1) | TW202201623A (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0697269A (ja) * | 1992-02-26 | 1994-04-08 | Tokyo Electron Ltd | 基板処理装置 |
JPH09249426A (ja) * | 1996-03-13 | 1997-09-22 | Hitachi Techno Eng Co Ltd | 加熱炉 |
JP2002231792A (ja) * | 2001-01-31 | 2002-08-16 | Tokyo Electron Ltd | 基板処理装置 |
JP2006073876A (ja) * | 2004-09-03 | 2006-03-16 | Seiko Epson Corp | リフター機構、これを備えた液滴吐出装置、並びに電気光学装置の製造方法、電気光学装置、および電子機器 |
JP2008311407A (ja) * | 2007-06-14 | 2008-12-25 | Dainippon Screen Mfg Co Ltd | リフトピン昇降装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006313766A (ja) | 2005-05-06 | 2006-11-16 | Nikon Corp | 基板保持装置及びステージ装置並びに露光装置 |
KR20090053839A (ko) | 2006-09-08 | 2009-05-27 | 세미컨덕터 앤 디스플레이 코포레이션 | 리프트 핀 기구 |
JP2010114175A (ja) | 2008-11-05 | 2010-05-20 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
-
2020
- 2020-06-22 JP JP2020107065A patent/JP2022002274A/ja active Pending
-
2021
- 2021-05-18 CN CN202110537975.8A patent/CN113903679A/zh active Pending
- 2021-05-25 TW TW110118902A patent/TW202201623A/zh unknown
- 2021-06-17 KR KR1020210078592A patent/KR20210157883A/ko active IP Right Grant
-
2023
- 2023-05-18 JP JP2023082055A patent/JP7441995B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0697269A (ja) * | 1992-02-26 | 1994-04-08 | Tokyo Electron Ltd | 基板処理装置 |
JPH09249426A (ja) * | 1996-03-13 | 1997-09-22 | Hitachi Techno Eng Co Ltd | 加熱炉 |
JP2002231792A (ja) * | 2001-01-31 | 2002-08-16 | Tokyo Electron Ltd | 基板処理装置 |
JP2006073876A (ja) * | 2004-09-03 | 2006-03-16 | Seiko Epson Corp | リフター機構、これを備えた液滴吐出装置、並びに電気光学装置の製造方法、電気光学装置、および電子機器 |
JP2008311407A (ja) * | 2007-06-14 | 2008-12-25 | Dainippon Screen Mfg Co Ltd | リフトピン昇降装置 |
Also Published As
Publication number | Publication date |
---|---|
JP7441995B2 (ja) | 2024-03-01 |
JP2023096105A (ja) | 2023-07-06 |
KR20210157883A (ko) | 2021-12-29 |
TW202201623A (zh) | 2022-01-01 |
CN113903679A (zh) | 2022-01-07 |
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