JP2021519514A5 - - Google Patents
Info
- Publication number
- JP2021519514A5 JP2021519514A5 JP2020551853A JP2020551853A JP2021519514A5 JP 2021519514 A5 JP2021519514 A5 JP 2021519514A5 JP 2020551853 A JP2020551853 A JP 2020551853A JP 2020551853 A JP2020551853 A JP 2020551853A JP 2021519514 A5 JP2021519514 A5 JP 2021519514A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- containing reactant
- aluminum
- semiconductor substrate
- layer
- Prior art date
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862647993P | 2018-03-26 | 2018-03-26 | |
| US62/647,993 | 2018-03-26 | ||
| PCT/US2019/022568 WO2019190783A1 (en) | 2018-03-26 | 2019-03-15 | Atomic layer deposition of carbon films |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2021519514A JP2021519514A (ja) | 2021-08-10 |
| JP2021519514A5 true JP2021519514A5 (https=) | 2022-03-24 |
| JPWO2019190783A5 JPWO2019190783A5 (https=) | 2022-03-24 |
| JP7396998B2 JP7396998B2 (ja) | 2023-12-12 |
Family
ID=68060319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020551853A Active JP7396998B2 (ja) | 2018-03-26 | 2019-03-15 | 炭素膜の原子層堆積 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7396998B2 (https=) |
| KR (2) | KR102712239B1 (https=) |
| CN (2) | CN112005339B (https=) |
| WO (1) | WO2019190783A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10607852B2 (en) * | 2017-09-13 | 2020-03-31 | Tokyo Electron Limited | Selective nitride etching method for self-aligned multiple patterning |
| JP7623082B2 (ja) * | 2021-02-04 | 2025-01-28 | 東京エレクトロン株式会社 | カーボン膜の成膜方法及び成膜装置 |
| US20230058831A1 (en) * | 2021-08-20 | 2023-02-23 | Applied Materials, Inc. | Molecular layer deposition liner for 3d nand |
| US11756785B2 (en) * | 2021-08-20 | 2023-09-12 | Applied Materials, Inc. | Molecular layer deposition contact landing protection for 3D NAND |
| WO2024118304A1 (en) * | 2022-11-30 | 2024-06-06 | Lam Research Corporation | Metal doped carbon non-conformal deposition |
| KR20250173679A (ko) * | 2024-06-04 | 2025-12-11 | 주성엔지니어링(주) | 탄소층 형성 방법 및 그를 이용한 기판 처리 방법 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04143921A (ja) * | 1990-10-05 | 1992-05-18 | Mitsubishi Electric Corp | 磁気ディスクおよびその製造方法 |
| TW548239B (en) * | 2000-10-23 | 2003-08-21 | Asm Microchemistry Oy | Process for producing aluminium oxide films at low temperatures |
| US7198820B2 (en) * | 2003-02-06 | 2007-04-03 | Planar Systems, Inc. | Deposition of carbon- and transition metal-containing thin films |
| CN101680087A (zh) | 2007-03-06 | 2010-03-24 | 瓦里安半导体设备公司 | 原子层沉积技术 |
| US7666474B2 (en) * | 2008-05-07 | 2010-02-23 | Asm America, Inc. | Plasma-enhanced pulsed deposition of metal carbide films |
| JP2010041038A (ja) | 2008-06-27 | 2010-02-18 | Asm America Inc | 重要な用途のための二酸化ケイ素の低温熱でのａｌｄ |
| JP4638550B2 (ja) * | 2008-09-29 | 2011-02-23 | 東京エレクトロン株式会社 | マスクパターンの形成方法、微細パターンの形成方法及び成膜装置 |
| US8993460B2 (en) | 2013-01-10 | 2015-03-31 | Novellus Systems, Inc. | Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants |
| JP2016507001A (ja) | 2012-12-21 | 2016-03-07 | プラサド ナーハー ガジル | セラミック薄膜の低温堆積方法 |
| US9721784B2 (en) | 2013-03-15 | 2017-08-01 | Applied Materials, Inc. | Ultra-conformal carbon film deposition |
| US9605343B2 (en) * | 2013-11-13 | 2017-03-28 | Asm Ip Holding B.V. | Method for forming conformal carbon films, structures conformal carbon film, and system of forming same |
| US9624577B2 (en) * | 2014-07-22 | 2017-04-18 | Applied Materials, Inc. | Deposition of metal doped amorphous carbon film |
| US9443956B2 (en) * | 2014-12-08 | 2016-09-13 | Globalfoundries Inc. | Method for forming air gap structure using carbon-containing spacer |
-
2019
- 2019-03-15 CN CN201980022653.0A patent/CN112005339B/zh active Active
- 2019-03-15 JP JP2020551853A patent/JP7396998B2/ja active Active
- 2019-03-15 WO PCT/US2019/022568 patent/WO2019190783A1/en not_active Ceased
- 2019-03-15 CN CN202510357288.6A patent/CN120497125A/zh active Pending
- 2019-03-15 KR KR1020207030667A patent/KR102712239B1/ko active Active
- 2019-03-15 KR KR1020247032172A patent/KR20240148932A/ko not_active Ceased
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