JP2021504906A5 - - Google Patents

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Publication number
JP2021504906A5
JP2021504906A5 JP2020529216A JP2020529216A JP2021504906A5 JP 2021504906 A5 JP2021504906 A5 JP 2021504906A5 JP 2020529216 A JP2020529216 A JP 2020529216A JP 2020529216 A JP2020529216 A JP 2020529216A JP 2021504906 A5 JP2021504906 A5 JP 2021504906A5
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JP
Japan
Prior art keywords
liquid target
electron beam
collision portion
ray source
target
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Application number
JP2020529216A
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English (en)
Japanese (ja)
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JP7195648B2 (ja
JP2021504906A (ja
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Priority claimed from EP17204949.6A external-priority patent/EP3493239A1/en
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Publication of JP2021504906A publication Critical patent/JP2021504906A/ja
Publication of JP2021504906A5 publication Critical patent/JP2021504906A5/ja
Priority to JP2022195465A priority Critical patent/JP7488600B2/ja
Application granted granted Critical
Publication of JP7195648B2 publication Critical patent/JP7195648B2/ja
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JP2020529216A 2017-12-01 2018-11-30 X線源及びx線放射を発生する方法 Active JP7195648B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022195465A JP7488600B2 (ja) 2017-12-01 2022-12-07 X線源及びx線放射を発生する方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17204949.6 2017-12-01
EP17204949.6A EP3493239A1 (en) 2017-12-01 2017-12-01 X-ray source and method for generating x-ray radiation
PCT/EP2018/083138 WO2019106145A1 (en) 2017-12-01 2018-11-30 X-ray source and method for generating x-ray radiation

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022195465A Division JP7488600B2 (ja) 2017-12-01 2022-12-07 X線源及びx線放射を発生する方法

Publications (3)

Publication Number Publication Date
JP2021504906A JP2021504906A (ja) 2021-02-15
JP2021504906A5 true JP2021504906A5 (enExample) 2022-01-06
JP7195648B2 JP7195648B2 (ja) 2022-12-26

Family

ID=60569730

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020529216A Active JP7195648B2 (ja) 2017-12-01 2018-11-30 X線源及びx線放射を発生する方法
JP2022195465A Active JP7488600B2 (ja) 2017-12-01 2022-12-07 X線源及びx線放射を発生する方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022195465A Active JP7488600B2 (ja) 2017-12-01 2022-12-07 X線源及びx線放射を発生する方法

Country Status (8)

Country Link
US (2) US11342154B2 (enExample)
EP (2) EP3493239A1 (enExample)
JP (2) JP7195648B2 (enExample)
KR (2) KR20240150529A (enExample)
CN (2) CN116504601A (enExample)
AU (1) AU2018374514B2 (enExample)
TW (1) TWI687959B (enExample)
WO (1) WO2019106145A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3493239A1 (en) 2017-12-01 2019-06-05 Excillum AB X-ray source and method for generating x-ray radiation
EP3579664A1 (en) * 2018-06-08 2019-12-11 Excillum AB Method for controlling an x-ray source
EP3648135A1 (en) 2018-11-05 2020-05-06 Excillum AB Mechanical alignment of x-ray sources
JPWO2021199563A1 (enExample) * 2020-04-03 2021-10-07
EP4075474A1 (en) * 2021-04-15 2022-10-19 Excillum AB Liquid jet target x-ray source
JP7337312B1 (ja) * 2022-03-31 2023-09-01 キヤノンアネルバ株式会社 X線発生装置、x線撮像装置、および、x線発生装置の調整方法
CN114945237B (zh) * 2022-04-25 2025-12-05 上海科技大学 桌面型飞秒硬x射线脉冲源装置及脉冲产生方法
SE2351080A1 (en) * 2023-09-18 2025-03-19 Northvolt Ab A battery cell imaging apparatus

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US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
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US6324255B1 (en) * 1998-08-13 2001-11-27 Nikon Technologies, Inc. X-ray irradiation apparatus and x-ray exposure apparatus
DE60033374T2 (de) * 1999-12-20 2007-11-29 Koninklijke Philips Electronics N.V. Röntgenmikroskop mit einer röntgenstrahlungsquelle für weiche röntgenstrahlungen
EP1305984B1 (en) * 2000-07-28 2010-11-24 Jettec AB Method and apparatus for generating x-ray radiation
EP1573774A2 (en) * 2002-12-11 2005-09-14 Koninklijke Philips Electronics N.V. X-ray source for generating monochromatic x-rays
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DE102004013620B4 (de) * 2004-03-19 2008-12-04 GE Homeland Protection, Inc., Newark Elektronenfenster für eine Flüssigmetallanode, Flüssigmetallanode, Röntgenstrahler und Verfahren zum Betrieb eines solchen Röntgenstrahlers
US7208746B2 (en) * 2004-07-14 2007-04-24 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
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DE102008026938A1 (de) * 2008-06-05 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strahlungsquelle und Verfahren zum Erzeugen von Röntgenstrahlung
US8681943B2 (en) * 2009-01-26 2014-03-25 Excillum Ab X-ray window
EP2743963B8 (en) * 2009-04-03 2015-10-28 Excillum AB Supply of a liquid-metal target in x-ray generation
HUP1000635A2 (en) * 2010-11-26 2012-05-29 Ge Hungary Kft Liquid anode x-ray source
EP3089192B1 (en) * 2010-12-22 2018-05-09 Excillum AB Focusing an electron beam in an x-ray source
WO2013020130A1 (en) 2011-08-04 2013-02-07 John Lewellen Bremstrahlung target for intensity modulated x-ray radiation therapy and stereotactic x-ray therapy
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WO2013185829A1 (en) * 2012-06-14 2013-12-19 Excillum Ab Limiting migration of target material
EP2837016B1 (de) * 2012-06-15 2016-08-17 Siemens Aktiengesellschaft Röntgenstrahlungsquelle und deren verwendung und verfahren zum erzeugen von röntgenstrahlung
CN103543298B (zh) 2012-07-13 2016-03-23 旺矽科技股份有限公司 探针固持结构及其光学检测装置
US20140161233A1 (en) 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
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EP3493239A1 (en) 2017-12-01 2019-06-05 Excillum AB X-ray source and method for generating x-ray radiation

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