JP6871833B2 - 形状計測装置および形状計測方法 - Google Patents
形状計測装置および形状計測方法 Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/04—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/28—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring contours or curvatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
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- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
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- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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Description
図1は、第1実施形態の三次元形状計測装置1の構成を示す模式図である。
4:ホールパターン、11:二次元情報記憶部、12:条件算出部、
13:X線管球、14:光源制御部、15:発散スリット、
16:二次元検出器、17:データ処理部、18:シミュレーション部、
19:形状算出部、20:ステージ、21:ステージ制御部
Claims (5)
- 試料に設けられたパターンに関する情報として、前記試料の表面に平行な面内の二次元情報を記憶する記憶部と、
前記二次元情報に基づいて、前記試料の表面に照射するビームの入射方位を変化させる最大角度範囲を含む、前記パターンの形状計測の条件を算出する条件算出部と、
前記算出された条件に基づいて、前記試料の表面に前記ビームを照射する照射部と、
前記試料の表面で反射された前記ビームの散乱強度データを取得する取得部と、
前記パターンの三次元形状をパラメータを用いて表した形状モデルに基づいて、前記ビームの予想散乱強度データを算出する算出部と、
前記形状モデルのパラメータを調整して前記散乱強度データと前記予想散乱強度データとをフィッティングすることで得られた計測値と、前記二次元情報とに基づいて、前記パターンの三次元形状を計測する計測部と、
を備える形状計測装置。 - 前記二次元情報は、前記試料の表面に平行な面内における各パターンの二次元形状またはパターン同士の二次元配置に関する情報を含む、請求項1に記載の形状計測装置。
- 前記二次元情報は、前記試料の表面に平行な面内における各パターンの二方向の寸法を含む、請求項2に記載の形状計測装置。
- 前記二次元情報は、前記形状計測装置の外部で計測された情報である、請求項1から3のいずれか1項に記載の形状計測装置。
- 試料に設けられたパターンに関する情報として、前記試料の表面に平行な面内の二次元情報を取得し、
前記二次元情報に基づいて、前記試料の表面に照射するビームの入射方位を変化させる最大角度範囲を含む、前記パターンの形状計測の条件を算出し、
前記算出された条件に基づいて、前記試料の表面に前記ビームを照射し、
前記試料の表面で反射された前記ビームの散乱強度データを取得し、
前記パターンの三次元形状をパラメータを用いて表した形状モデルに基づいて、前記ビームの予想散乱強度データを算出し、
前記形状モデルのパラメータを調整して前記散乱強度データと前記予想散乱強度データとをフィッティングすることで得られた計測値と、前記二次元情報とに基づいて、前記パターンの三次元形状を計測する、
ことを含む形状計測方法。
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JP2017179416A JP6871833B2 (ja) | 2017-09-19 | 2017-09-19 | 形状計測装置および形状計測方法 |
US15/896,194 US10156435B1 (en) | 2017-09-19 | 2018-02-14 | Shape measuring apparatus and shape measuring method |
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JP2017179416A JP6871833B2 (ja) | 2017-09-19 | 2017-09-19 | 形状計測装置および形状計測方法 |
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JP2019056568A JP2019056568A (ja) | 2019-04-11 |
JP6871833B2 true JP6871833B2 (ja) | 2021-05-12 |
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JP7149532B2 (ja) * | 2019-04-26 | 2022-10-07 | 株式会社日立製作所 | 粒子線実験データ解析装置 |
JP7475905B2 (ja) | 2020-03-12 | 2024-04-30 | キオクシア株式会社 | 形状算出プログラム、形状算出方法、及び形状算出装置 |
JP2023012227A (ja) | 2021-07-13 | 2023-01-25 | キオクシア株式会社 | 形状計測方法、形状計測装置、及びプログラム |
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JP2005291859A (ja) * | 2004-03-31 | 2005-10-20 | Nec Compound Semiconductor Devices Ltd | 微細構造測定方法、微細構造測定装置、および、微細構造解析システム |
US8908830B2 (en) * | 2009-04-14 | 2014-12-09 | Rigaku Corporation | Surface microstructure measurement method, surface microstructure measurement data analysis method and X-ray scattering measurement device |
JP2011203061A (ja) * | 2010-03-25 | 2011-10-13 | Toshiba Corp | パターン計測方法およびパターン計測装置 |
KR101930913B1 (ko) | 2010-06-17 | 2018-12-19 | 노바 메주어링 인스트루먼츠 엘티디. | 패턴 구조들의 광학적 정밀 검사를 최적화하는 방법 및 시스템 |
JP2013068419A (ja) | 2011-09-20 | 2013-04-18 | Toshiba Corp | パターン計測装置、ステージ高さ調整方法およびパターン計測方法 |
US20140067316A1 (en) * | 2012-08-30 | 2014-03-06 | Kabushiki Kaisha Toshiba | Measuring apparatus, detector deviation monitoring method and measuring method |
JP2014130077A (ja) * | 2012-12-28 | 2014-07-10 | Hitachi High-Technologies Corp | パターン形状評価方法、半導体装置の製造方法及びパターン形状評価装置 |
JP6090593B2 (ja) | 2014-06-24 | 2017-03-08 | トヨタ自動車株式会社 | 内燃機関の燃料噴射システム |
JP2016217816A (ja) | 2015-05-18 | 2016-12-22 | 凸版印刷株式会社 | パターン計測装置、パターン計測方法およびパターン計測プログラム |
JP2017032365A (ja) * | 2015-07-31 | 2017-02-09 | 株式会社日立ハイテクノロジーズ | パターンの計測方法および計測装置 |
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