CN116504601A - X射线源以及用于产生x射线辐射的方法 - Google Patents
X射线源以及用于产生x射线辐射的方法 Download PDFInfo
- Publication number
- CN116504601A CN116504601A CN202310689884.5A CN202310689884A CN116504601A CN 116504601 A CN116504601 A CN 116504601A CN 202310689884 A CN202310689884 A CN 202310689884A CN 116504601 A CN116504601 A CN 116504601A
- Authority
- CN
- China
- Prior art keywords
- liquid target
- width
- electron beam
- liquid
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
- H01J35/153—Spot position control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/002—Supply of the plasma generating material
- H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/081—Target material
- H01J2235/082—Fluids, e.g. liquids, gases
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17204949.6 | 2017-12-01 | ||
| EP17204949.6A EP3493239A1 (en) | 2017-12-01 | 2017-12-01 | X-ray source and method for generating x-ray radiation |
| CN201880077013.5A CN111542906B (zh) | 2017-12-01 | 2018-11-30 | X射线源以及用于产生x射线辐射的方法 |
| PCT/EP2018/083138 WO2019106145A1 (en) | 2017-12-01 | 2018-11-30 | X-ray source and method for generating x-ray radiation |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880077013.5A Division CN111542906B (zh) | 2017-12-01 | 2018-11-30 | X射线源以及用于产生x射线辐射的方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116504601A true CN116504601A (zh) | 2023-07-28 |
Family
ID=60569730
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310689884.5A Pending CN116504601A (zh) | 2017-12-01 | 2018-11-30 | X射线源以及用于产生x射线辐射的方法 |
| CN201880077013.5A Active CN111542906B (zh) | 2017-12-01 | 2018-11-30 | X射线源以及用于产生x射线辐射的方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880077013.5A Active CN111542906B (zh) | 2017-12-01 | 2018-11-30 | X射线源以及用于产生x射线辐射的方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11342154B2 (enExample) |
| EP (2) | EP3493239A1 (enExample) |
| JP (2) | JP7195648B2 (enExample) |
| KR (2) | KR20240150529A (enExample) |
| CN (2) | CN116504601A (enExample) |
| AU (1) | AU2018374514B2 (enExample) |
| TW (1) | TWI687959B (enExample) |
| WO (1) | WO2019106145A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3493239A1 (en) | 2017-12-01 | 2019-06-05 | Excillum AB | X-ray source and method for generating x-ray radiation |
| EP3579664A1 (en) * | 2018-06-08 | 2019-12-11 | Excillum AB | Method for controlling an x-ray source |
| EP3648135A1 (en) | 2018-11-05 | 2020-05-06 | Excillum AB | Mechanical alignment of x-ray sources |
| JPWO2021199563A1 (enExample) * | 2020-04-03 | 2021-10-07 | ||
| EP4075474A1 (en) * | 2021-04-15 | 2022-10-19 | Excillum AB | Liquid jet target x-ray source |
| JP7337312B1 (ja) * | 2022-03-31 | 2023-09-01 | キヤノンアネルバ株式会社 | X線発生装置、x線撮像装置、および、x線発生装置の調整方法 |
| CN114945237B (zh) * | 2022-04-25 | 2025-12-05 | 上海科技大学 | 桌面型飞秒硬x射线脉冲源装置及脉冲产生方法 |
| SE2351080A1 (en) * | 2023-09-18 | 2025-03-19 | Northvolt Ab | A battery cell imaging apparatus |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4608543A (en) | 1984-12-17 | 1986-08-26 | Advanced Micro Devices, Inc. | Controllable effective resistance and phase lock loop with controllable filter |
| US4953191A (en) * | 1989-07-24 | 1990-08-28 | The United States Of America As Represented By The United States Department Of Energy | High intensity x-ray source using liquid gallium target |
| US5052034A (en) * | 1989-10-30 | 1991-09-24 | Siemens Aktiengesellschaft | X-ray generator |
| JPH05258692A (ja) | 1992-03-10 | 1993-10-08 | Nikon Corp | X線発生方法およびx線発生装置 |
| US6324255B1 (en) * | 1998-08-13 | 2001-11-27 | Nikon Technologies, Inc. | X-ray irradiation apparatus and x-ray exposure apparatus |
| DE60033374T2 (de) * | 1999-12-20 | 2007-11-29 | Koninklijke Philips Electronics N.V. | Röntgenmikroskop mit einer röntgenstrahlungsquelle für weiche röntgenstrahlungen |
| EP1305984B1 (en) * | 2000-07-28 | 2010-11-24 | Jettec AB | Method and apparatus for generating x-ray radiation |
| EP1573774A2 (en) * | 2002-12-11 | 2005-09-14 | Koninklijke Philips Electronics N.V. | X-ray source for generating monochromatic x-rays |
| DE10326279A1 (de) * | 2003-06-11 | 2005-01-05 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Plasma-basierte Erzeugung von Röntgenstrahlung mit einem schichtförmigen Targetmaterial |
| DE102004013620B4 (de) * | 2004-03-19 | 2008-12-04 | GE Homeland Protection, Inc., Newark | Elektronenfenster für eine Flüssigmetallanode, Flüssigmetallanode, Röntgenstrahler und Verfahren zum Betrieb eines solchen Röntgenstrahlers |
| US7208746B2 (en) * | 2004-07-14 | 2007-04-24 | Asml Netherlands B.V. | Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| US8213576B2 (en) * | 2007-08-09 | 2012-07-03 | Shimadzu Corporation | X-ray tube apparatus |
| DE102008026938A1 (de) * | 2008-06-05 | 2009-12-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Strahlungsquelle und Verfahren zum Erzeugen von Röntgenstrahlung |
| US8681943B2 (en) * | 2009-01-26 | 2014-03-25 | Excillum Ab | X-ray window |
| EP2743963B8 (en) * | 2009-04-03 | 2015-10-28 | Excillum AB | Supply of a liquid-metal target in x-ray generation |
| HUP1000635A2 (en) * | 2010-11-26 | 2012-05-29 | Ge Hungary Kft | Liquid anode x-ray source |
| EP3089192B1 (en) * | 2010-12-22 | 2018-05-09 | Excillum AB | Focusing an electron beam in an x-ray source |
| WO2013020130A1 (en) | 2011-08-04 | 2013-02-07 | John Lewellen | Bremstrahlung target for intensity modulated x-ray radiation therapy and stereotactic x-ray therapy |
| NL2009359A (en) * | 2011-09-23 | 2013-03-26 | Asml Netherlands Bv | Radiation source. |
| WO2013185829A1 (en) * | 2012-06-14 | 2013-12-19 | Excillum Ab | Limiting migration of target material |
| EP2837016B1 (de) * | 2012-06-15 | 2016-08-17 | Siemens Aktiengesellschaft | Röntgenstrahlungsquelle und deren verwendung und verfahren zum erzeugen von röntgenstrahlung |
| CN103543298B (zh) | 2012-07-13 | 2016-03-23 | 旺矽科技股份有限公司 | 探针固持结构及其光学检测装置 |
| US20140161233A1 (en) | 2012-12-06 | 2014-06-12 | Bruker Axs Gmbh | X-ray apparatus with deflectable electron beam |
| US20140219424A1 (en) * | 2013-02-04 | 2014-08-07 | Moxtek, Inc. | Electron Beam Focusing and Centering |
| US9232623B2 (en) * | 2014-01-22 | 2016-01-05 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| EP3493239A1 (en) | 2017-12-01 | 2019-06-05 | Excillum AB | X-ray source and method for generating x-ray radiation |
-
2017
- 2017-12-01 EP EP17204949.6A patent/EP3493239A1/en not_active Withdrawn
-
2018
- 2018-11-30 KR KR1020247032952A patent/KR20240150529A/ko active Pending
- 2018-11-30 AU AU2018374514A patent/AU2018374514B2/en active Active
- 2018-11-30 WO PCT/EP2018/083138 patent/WO2019106145A1/en not_active Ceased
- 2018-11-30 EP EP18807657.4A patent/EP3718127B1/en active Active
- 2018-11-30 CN CN202310689884.5A patent/CN116504601A/zh active Pending
- 2018-11-30 JP JP2020529216A patent/JP7195648B2/ja active Active
- 2018-11-30 TW TW107143134A patent/TWI687959B/zh active
- 2018-11-30 CN CN201880077013.5A patent/CN111542906B/zh active Active
- 2018-11-30 US US16/766,935 patent/US11342154B2/en active Active
- 2018-11-30 KR KR1020207018445A patent/KR102714936B1/ko active Active
-
2022
- 2022-04-20 US US17/725,152 patent/US11963286B2/en active Active
- 2022-12-07 JP JP2022195465A patent/JP7488600B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US11342154B2 (en) | 2022-05-24 |
| JP7488600B2 (ja) | 2024-05-22 |
| KR102714936B1 (ko) | 2024-10-07 |
| JP2023027189A (ja) | 2023-03-01 |
| EP3718127B1 (en) | 2023-12-20 |
| CN111542906A (zh) | 2020-08-14 |
| CN111542906B (zh) | 2023-06-30 |
| TWI687959B (zh) | 2020-03-11 |
| KR20200090885A (ko) | 2020-07-29 |
| US20220254595A1 (en) | 2022-08-11 |
| EP3493239A1 (en) | 2019-06-05 |
| TW201926396A (zh) | 2019-07-01 |
| US11963286B2 (en) | 2024-04-16 |
| JP7195648B2 (ja) | 2022-12-26 |
| WO2019106145A1 (en) | 2019-06-06 |
| JP2021504906A (ja) | 2021-02-15 |
| AU2018374514A1 (en) | 2020-07-16 |
| EP3718127A1 (en) | 2020-10-07 |
| KR20240150529A (ko) | 2024-10-15 |
| US20210027974A1 (en) | 2021-01-28 |
| AU2018374514B2 (en) | 2021-11-11 |
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| PB01 | Publication | ||
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