JP2021192403A - ウエーハの加工方法、及び加工装置 - Google Patents
ウエーハの加工方法、及び加工装置 Download PDFInfo
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- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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- H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
1a 表面
1b 裏面
1c マーク
1d 中心
3 分割予定ライン
5 デバイス
7 テープ
9 リングフレーム
9a 開口部
9b,9c 切り欠き
11 フレームユニット
13 カセット
2 切削装置(加工装置)
4 基台
6 カセットテーブル
8 ガイドレール
10 仮置きテーブル
12 搬出ユニット
14,40 搬送ユニット
16 X軸移動テーブル
18 テーブルベース
20 チャックテーブル
22 保持面
24 クランプ
26 防塵防滴カバー
28 支持構造
30 撮像ユニット
32 切削ユニット(加工ユニット)
34 切削ブレード
36 スピンドル
38 洗浄ユニット
42 表示ユニット
44 制御ユニット
46 記憶部
48 表示制御部
50 参照画像表示画面
52 加工条件に関する情報
54 代表画像
Claims (4)
- マークが外周に形成されたウエーハを加工ユニット及び表示ユニットを備える加工装置で加工するウエーハの加工方法であって、
該ウエーハと、該ウエーハの表面または裏面に貼着され該ウエーハの径よりも大きい径のテープと、該ウエーハの径よりも大きい径の開口部を有し内周部に該テープの外周部が貼着されたリングフレームと、を有するフレームユニットを準備する準備ステップと、
該加工装置に登録された複数の加工条件から該ウエーハを該加工ユニットで加工する際の加工条件を選択する加工条件選択ステップと、
該加工条件選択ステップで選択された該加工条件に紐付けられて該加工装置に登録された代表画像を該表示ユニットに表示させる代表画像表示ステップと、を備え、
該リングフレームは、外周に切り欠きが形成されており、
該フレームユニットでは、該ウエーハを該加工ユニットで加工する際の該加工条件に従って該ウエーハの該外周部に形成された該マークと、該リングフレームの該切り欠きと、の位置関係が決定されており、
該準備ステップで準備される該フレームユニットは、該リングフレームの該切り欠きと、該ウエーハの該マークと、が該位置関係となるように該リングフレームと、該ウエーハと、該テープと、が一体化されて形成されており、
該代表画像表示ステップで該表示ユニットに表示される該代表画像には、該リングフレームの該切り欠きと、該ウエーハの該マークと、が該位置関係である該フレームユニットの代表例が写ることを特徴とするウエーハの加工方法。 - 該代表画像表示ステップの後、該代表画像に写る該代表例と、該準備ステップで準備された該フレームユニットと、を比較して該加工条件の適否を判定する判定ステップをさらに備え、
該判定ステップで該加工条件が適切であると判定される場合、該ウエーハを該加工ユニットにより該加工条件で加工する加工ステップを実施し、
該判定ステップで該加工条件が不適切であると判定される場合、該フレームユニットを該加工装置から搬出する搬出ステップを実施することを特徴とする請求項1記載のウエーハの加工方法。 - 該加工ステップで実施される該加工は、該ウエーハを分割する分割加工であり、
該加工条件は、該ウエーハの大きさ、該ウエーハに設定される分割予定ラインの間隔、該加工ユニット及び該ウエーハの加工送り速度、該ウエーハの該表面または該裏面に形成されるべきキーパターンと、を含むことを特徴とする請求項2記載のウエーハの加工方法。 - リングフレーム及びテープと一体化されフレームユニットの一部となったウエーハを加工する加工装置であって、
加工される該ウエーハを保持できるチャックテーブルと、
該チャックテーブルで保持された該ウエーハを加工する加工ユニットと、
表示ユニットと、
各構成要素を制御する制御ユニットと、を備え、
該制御ユニットは、
該ウエーハを該加工ユニットで加工するための複数の加工条件と、それぞれの該加工条件の加工対象となるウエーハを含むフレームユニットが写る複数の代表画像と、が記憶される記憶部と、
該記憶部に記憶された複数の加工条件から一つの加工条件が選択されたとき、選択された該加工条件の加工対象となるウエーハを含むフレームユニットが写る該代表画像を該表示ユニットに表示させる表示制御部と、を備え、
該フレームユニットでは、該ウエーハを該加工ユニットで加工する際の該加工条件に従って該ウエーハの外周部に形成されたマークと、該リングフレームの切り欠きと、の位置関係が決定されていることを特徴とする加工装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
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JP2020098381A JP7442938B2 (ja) | 2020-06-05 | 2020-06-05 | ウエーハの加工方法、及び加工装置 |
TW110116795A TW202147418A (zh) | 2020-06-05 | 2021-05-10 | 晶圓的加工方法及加工裝置 |
US17/323,252 US20210384076A1 (en) | 2020-06-05 | 2021-05-18 | Wafer processing method and machine |
KR1020210064604A KR20210151682A (ko) | 2020-06-05 | 2021-05-20 | 웨이퍼의 가공 방법 및 가공 장치 |
CN202110590878.5A CN113764338A (zh) | 2020-06-05 | 2021-05-28 | 晶片的加工方法和加工装置 |
DE102021205568.0A DE102021205568A1 (de) | 2020-06-05 | 2021-06-01 | Wafer-bearbeitungsverfahren und -maschine |
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JP2020098381A JP7442938B2 (ja) | 2020-06-05 | 2020-06-05 | ウエーハの加工方法、及び加工装置 |
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JP2021192403A true JP2021192403A (ja) | 2021-12-16 |
JP7442938B2 JP7442938B2 (ja) | 2024-03-05 |
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JP (1) | JP7442938B2 (ja) |
KR (1) | KR20210151682A (ja) |
CN (1) | CN113764338A (ja) |
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JPH10305420A (ja) | 1997-03-04 | 1998-11-17 | Ngk Insulators Ltd | 酸化物単結晶からなる母材の加工方法、機能性デバイスの製造方法 |
JP2000331962A (ja) | 1999-05-18 | 2000-11-30 | Lintec Corp | 半導体ウエハの加工方法および半導体ウエハ支持部材 |
JP2003068619A (ja) | 2001-08-28 | 2003-03-07 | Canon Inc | 製造装置、デバイス製造方法、半導体製造工場および製造装置の保守方法 |
JP4313162B2 (ja) | 2002-11-21 | 2009-08-12 | 株式会社日立国際電気 | アライメントマーク検出方法及び検査装置 |
JP5026825B2 (ja) | 2007-03-14 | 2012-09-19 | リンテック株式会社 | 搬送装置 |
JP2009194326A (ja) | 2008-02-18 | 2009-08-27 | Disco Abrasive Syst Ltd | 加工装置 |
JP6189208B2 (ja) | 2013-12-26 | 2017-08-30 | 株式会社ディスコ | ウエーハの加工方法 |
JP6385131B2 (ja) * | 2014-05-13 | 2018-09-05 | 株式会社ディスコ | ウェーハの加工方法 |
JP6695102B2 (ja) * | 2015-05-26 | 2020-05-20 | 株式会社ディスコ | 加工システム |
JP2018187707A (ja) | 2017-05-01 | 2018-11-29 | 株式会社ディスコ | 切削装置 |
JP7242144B2 (ja) | 2019-07-31 | 2023-03-20 | 株式会社ディスコ | 加工装置 |
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